In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Methods are provided for improved filtering for particle removal from radiation patternable organometallic resist compositions.

• 출원번호 : 18778388
• 출원인 : Clark, Benjamin L.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/16(2006.01);

An information processing apparatus includes at least one memory storing instructions and at least one processor. The at least one processor is configured to execute the instructions to generate a first integrated image by integrating a plurality of radiation images obtained by image capturing using a radiation generating apparatus that generates radiation and a radiation imaging apparatus, and generate a second integrated image different from the first integrated image using the plurality of radiation images and at least one radiation image obtained by the image capturing after the plurality of radiation images are obtained; and control a display device to change a display based on a determination regarding an image quality of the first integrated image to a display based on a determination regarding an image quality of the second integrated image.

• 출원번호 : 18778776
• 출원인 : KUBOTA, HIROFUMI
• 특허번호 :
• IPC : G16H-030/20(2006.01);G06F-003/14(2006.01);G06T-007/00(2006.01);

A method of additive manufacturing of a three-dimensional object, comprises: dispensing from a first array of nozzles a modeling material formulation containing a polyimide precursor to form a layer in a configured pattern corresponding to a shape of a slice of the object; applying to the layer ultraviolet radiation and infrared radiation from two different radiation sources; and repeating the dispensing and the application of radiation to form a plurality of layers in configured patterns corresponding to shapes of other slices of the object. Optionally, an additional modeling material formulation or a support material formulation is dispensed from a second array of nozzles.

• 출원번호 : 18777593
• 출원인 : Stratasys Ltd.
• 특허번호 :
• IPC : B29C-064/129(2006.01);B29C-064/209(2006.01);B29C-064/277(2006.01);B29C-064/393(2006.01);B29K-079/00(2006.01);B33Y-010/00(2006.01);B33Y-030/00(2006.01);B33Y-050/02(2006.01);C08G-073/12(2006.01);

Described are devices, systems and methods for thermographic imaging of conditions of the ear, nose, and throat (ENT). An example device for thermographic ENT imaging includes an endoscope and a thermal imaging camera that can be either integrated or added as an attachment to the endoscope. The device may also include a mirror configured to direct thermal radiation emitted by a target area to the thermal imaging camera.

• 출원번호 : 18778057
• 출원인 : Capriotti, Margherita
• 특허번호 :
• IPC : G02B-013/14(2006.01);A61B-001/04(2006.01);A61B-001/06(2006.01);G02B-013/00(2006.01);G02B-023/24(2006.01);G02B-027/10(2006.01);

The present invention relates to a security seal with closure means (4, 5 or 4', 5') that comprises in at least a first portion (1a) of said body a material that allows identification and/or tracing and in at least a second portion (1b) of said body at least a second type of tracing material. The second portion (1b) is located close to the first portion (1a) when the security seal is in a closed position, the first and second tracing material being a mixture of one or more chemical components in different amounts and proportions that are, in and of themselves, detectable and identifiable by using instruments for detecting emitted fluorescent or non-fluorescent radiation with an electromagnetic spectrum range between 100 and 2000 nanometres of electromagnetic excitation range and/or by using laser light to measure the decay time of the luminosity of photoluminescent materials, using techniques such as photon upconversion.

• 출원번호 : ES2024/070466
• 출원인 : COSTA BOTEY, Jose Maria;HERZOG, Tobias;
• 특허번호 :
• IPC : B65D-055/02(2006.01);G01J-003/28(2006.01);G09F-003/03(2006.01);G01N-021/64(2006.01);

• 출원번호 : EP2024/070546
• 출원인 : SANGLE-FERRIERE, Bruno
• 특허번호 :
• IPC : G21G-001/06(2006.01);G21G-004/02(2006.01);

The present invention relates to a method for applying an image onto a receiving medium, wherein the image is applied onto the recording medium by depositing a UV-curable ink and the ink is irradiated with radiation. The present invention further relates to a scanning printer and a software product.

• 출원번호 : 24189858.4
• 출원인 : Canon Production Printing Holding B.V.
• 특허번호 :
• IPC : B41J-011/00(2006.01)

A curable composition includes an ethylenically unsaturated polydiorganosiloxane, a radical curable siloxane – urethane/urea copolymer, a reactive diluent, a crosslinker, and a photoinitiator. The composition can be cured by exposure to UV radiation. The composition can be used to form a transparent film with a Shore M hardness ≥ 35.

• 출원번호 : US2024/038634
• 출원인 : DOW GLOBAL TECHNOLOGIES LLC;DOW SILICONES CORPORATION;
• 특허번호 :
• IPC : C08L-083/04(2006.01);C08L-083/08(2006.01);

An information processing device according to an embodiment of the present disclosure includes one or more memories storing instructions and one or more processors that, upon execution of the stored instructions, are configured to operate as: a display control unit configured to, upon receiving an instruction for acquiring a first radiation image, control a display unit such that a second radiation image is displayed first and then the first radiation image is displayed. The first radiation image is obtained by performing first image processing upon a radiation image obtained by detecting a radiation. The second radiation image is obtained by performing second image processing requiring a shorter processing time than the first image processing upon the radiation image.

• 출원번호 : 18778253
• 출원인 : YAMADA, DAISUKE
• 특허번호 :
• IPC : A61B-006/46(2006.01);A61B-006/00(2006.01);A61B-006/42(2006.01);G01T-001/24(2006.01);G06T-003/40(2006.01);G06T-005/60(2006.01);G06T-005/70(2006.01);G06T-007/00(2006.01);

A hyperspectral imaging apparatus based on a monolithic or free space optical spatial heterodyne spectrometer (SHS) design, array detector, electromagnetic radiation source, and optical collection element is described. The apparatus enables the simultaneous acquisition of spatially isolated Fizeau fringe patterns, each having an encoded light product that is decoded to produce a spectral fingerprint of the interrogated object. Features specific to the SHS, such as a large entrance aperture, large acceptance angle, and no moving parts, enable a variety of optical collection schemes including lens arrays, solid-core and hollow core waveguides, and others. In one example, a microlens array (MLA) is configured with the hyperspectral imaging apparatus to simultaneously image many hundred spatially isolated Fizeau fringe patterns while interrogating an object using an electromagnetic radiation source. Each Fizeau fringe pattern recorded by the array detector is decoded to produce a full Raman or laser-induced breakdown spectroscopy (LIBS) spectrum. Compared to prior art, the hyperspectral imaging apparatus overcomes the primary limitations of needing to trade time resolution for both spectral and spatial data density because the imaging apparatus simultaneously acquires both spectral and special information. Based on the selection and configuration of diffraction gratings, the grating aperture size, Littrow wavelength (i.e., heterodyne wavelength), and optical collection configuration, the apparatus can be tailored to produced low or high spectral resolution with a spectral bandpass that covers a portion or the entire Raman spectral range (up to 4200 cm−1) and for LIBS as well.

• 출원번호 : 18778560
• 출원인 : ANGEL, STANLEY MICHAEL
• 특허번호 :
• IPC : G01N-021/65(2006.01)