The invention relates to a lithography apparatus (1) having a radiation source (3) for creating a radiation (S) with a specific repetition frequency, a MEMS mirror (30) which is displaceable through a tilt angle (W) in at least two tilt axes (A, A) and serves to guide the radiation (S) in the lithography apparatus (1), which mirror comprises a capacitive sensor (35) having a number of electrodes (36, 37) for capturing the tilt angle (W), wherein four sensor units (41-44) are provided per tilt axis (A, A) for the purpose of capturing a respective measurement signal (I-I) from the capacitive sensor (35), wherein a first pair (41, 43) of the four sensor units (41-44) is configured to excite the capacitive sensor (35) by means of a first excitation signal (V) and receive as a response a respective measurement signal (I, I), wherein a second pair (42, 44) of the four sensor units (41-44) is configured to excite the capacitive sensor (35) by means of a second excitation signal (V) and receive as a response a respective measurement signal (I, I), wherein the first excitation signal (V) and the second excitation signal (V) have opposite polarities, and an evaluation unit (50) configured to determine the position (P) of the MEMS mirror (30) by means of the measurement signals (I-I) of the four sensor units (41-44).
- 출원번호 : EP2024/059827
- 출원인 : CARL ZEISS SMT GMBH
- 특허번호 :
- IPC : G03F-007/00(2006.01);G01D-005/24(2006.01);G02B-005/08(2006.01);G02B-026/08(2006.01);