The present disclosure relates to an integrated chip including a substrate and a pixel. The pixel includes a photodetector. The photodetector is in the substrate. The integrated chip further includes a first inner trench isolation structure and an outer trench isolation structure that extend into the substrate. The first inner trench isolation structure laterally surrounds the photodetector in a first closed loop. The outer trench isolation structure laterally surrounds the first inner trench isolation structure along a boundary of the pixel in a second closed loop and is laterally separated from the first inner trench isolation structure. Further, the integrated chip includes a scattering structure that is defined, at least in part, by the first inner trench isolation structure and that is configured to increase an angle at which radiation impinges on the outer trench isolation structure.

• 출원번호 : 18778992
• 출원인 : Huang, Cheng Yu
• 특허번호 :
• IPC : H01L-027/146(2006.01);H01L-031/107(2006.01);

The disclosure relates to a multi-probe NMR rock soil in-situ monitoring method, which includes: placing a multi-probe component to a target layer in a soil drill hole, where the multi-probe component includes NMR probes respectively located at the soils at different depths and having different measurement frequencies; performing in-situ NMR measurement on soils at different depths at the same time; by using a spectrometer component, receiving measurement signals from all NMR probes and performing frequency mapping analysis to distinguish NMR raw measurement data collected by each NMR probe; by using the spectrometer component, transmitting the raw measurement data to an industrial control computer to perform an inversion processing on the measurement data of the NMR probes and obtain T2 distribution mapping of the soils at different positions; based on the T2 distribution mapping, obtaining a water ratio of soil, a soil-water characteristics curve, soil non-homogeneity information and oil pollutant information.

• 출원번호 : 18779050
• 출원인 : Institute of Rock and Soil Mechanics, Chinese Academy of Sciences
• 특허번호 : 12253647
• IPC : G01V-003/32(2006.01);G01N-024/08(2006.01);G01R-033/38(2006.01);G01R-033/44(2006.01);G01R-033/50(2006.01);G01V-003/34(2006.01);

An optoelectronic device includes a first semiconductor die, having first and second surfaces and including a first array of transceiver elements. Each transceiver element includes an optical transducer, which directs outgoing coherent optical radiation through the first surface toward a target and to receive incoming optical radiation that has been reflected from the target. A single-photon optical detector outputs electrical pulses in response to photons of the incoming optical radiation. A waveguide conveys the incoming optical radiation from the optical transducer to the single-photon optical detector. A second semiconductor die is bonded to the second surface of the first semiconductor die and includes a second array of logic circuits, which are coupled to receive and process the electrical pulses output by the single-photon optical detectors in corresponding ones of the transceiver elements.

• 출원번호 : 18778986
• 출원인 : Mandai, Shingo
• 특허번호 :
• IPC : H01L-025/16(2006.01);G01S-017/34(2006.01);G02B-006/12(2006.01);G02B-006/42(2006.01);G02B-006/43(2006.01);H01L-023/00(2006.01);H01L-027/144(2006.01);H01L-031/02(2006.01);H01L-031/0232(2006.01);H01L-031/107(2006.01);H01S-005/026(2006.01);H01S-005/183(2006.01);

An electrokinetic device is configured as a dynamic lens cover and/or filter for an imaging assembly, e.g., of a mobile device, to selectively allow electromagnetic radiation to pass through a lens of the imaging assembly when the dynamic lens cover is in a first operating state or to prevent electromagnetic radiation from reaching the lens of the imaging assembly when the dynamic lens cover is in a second operating state. The electrokinetic device includes transparent first and second substrates, and a compaction trench surrounding the lens of the imaging assembly. The compaction trench stores pigment when the dynamic lens cover is in the first operating state. In the second operating state pigment is dispersed within a carrier fluid between the first and second substrates.

• 출원번호 : 18779070
• 출원인 : Abbott, James E.
• 특허번호 :
• IPC : G02F-001/17(2006.01);H04M-001/02(2006.01);H04N-023/55(2006.01);H04N-023/57(2006.01);

The present invention addresses the problem of providing an agent for the treatment of cancer, in particular, an agent which can be used in combination with boron neutron capture therapy and photodynamic therapy for the treatment of cancer. The present invention solves the problem by providing an agent for the treatment of cancer, the agent containing a carrier that is accumulating in cancer cells, and a boron-containing compound and/or a photosensitizer covalently bonded and/or non-covalently bonded to the carrier, and being used for cancer therapy in which a subject administered with the agent is irradiated with radiation.

• 출원번호 : JP2024/026054
• 출원인 : NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY;NIHON FUKUSHI FUIIN HOLDINGS LIMITED;
• 특허번호 :
• IPC : A61K-031/403(2006.01);A61K-031/69(2006.01);A61K-041/00(2020.01);A61K-047/34(2017.01);A61K-047/59(2017.01);A61N-005/10(2006.01);A61P-035/00(2006.01);A61P-043/00(2006.01);

The invention relates to a device for texturing the surface of a strip moving at a line speed V, the device comprising a strip path P, a frame adjacent to the strip path P, a plurality of inkjet print heads H, H… H distributed along and above the path P, a plurality of radiation-curing modules M, M… Mn distributed along and above the path P, each radiation-curing module Mi being positioned at a distance Li downstream of the inkjet print head Hi so that the radiation-curing modules and the inkjet print heads alternate, the plurality of inkjet print heads and the plurality of radiation-curing modules being connected to the frame so that a plurality of distances L can be adjusted by linear translation, along the path P, of the inkjet print head H and/or of the radiation-curing module Mi. The invention also relates to the processes thereof.

• 출원번호 : IB2024/057034
• 출원인 : ARCELORMITTAL
• 특허번호 :
• IPC : B41J-003/54(2006.01);B41J-002/515(2006.01);B41J-011/00(2006.01);B41J-025/308(2006.01);

• 출원번호 : JP2024/025965
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/004(2006.01);C08F-212/14(2006.01);C08F-220/18(2006.01);G03F-007/20(2006.01);G03F-007/039(2006.01);

The invention relates to a method for controlling a forming unit of a facility for manufacturing containers by forming, in particular by stretch blow-moulding, preforms made of thermoplastic material. The preforms pass through a thermal conditioning unit in which the preforms are exposed to heating electromagnetic radiation, and a forming unit in which each preform is placed in a mould of a blow-moulding station. The preform is then subjected to a stretching force by an elongation rod and to at least one pressure of a forming fluid. The method comprises at least the following steps: a first step (E1) of measuring the absorption spectrum and/or the emission spectrum of a wall of the preform before entering the forming unit; a second step (E2) of determining at least one blow-moulding parameter based on the measurement of the absorption spectrum and/or the emission spectrum from the first step (E1); a third step (E3) of application, in which the blow-moulding parameter is applied to the blow-moulding station.

• 출원번호 : EP2024/070630
• 출원인 : SIDEL PARTICIPATIONS
• 특허번호 :
• IPC : B29C-049/78(2006.01);B29C-049/64(2006.01);B29C-049/12(2006.01);B29C-049/36(2006.01);B29C-049/02(2006.01);B29K-067/00(2006.01);B29K-105/00(2006.01);B29K-105/26(2006.01);B29L-031/40(2006.01);B29L-031/00(2006.01);B29C-049/68(2006.01);

An organotin photoresist composition and a method of forming photolithography pattern are described. The organotin photoresist composition comprises a bridged-(stannocenyl)tin compound, a solvent, and/or an additive. Stannocenyl comprises bis(cyclopentadienyl)tin, or substituted bis(cyclopentadienyl)tin, wherein cyclopentadienyl is cyclopentadienyl CH group, or substituted cyclopentadienyl CHR, CHR, CHR, or CR group. A method of forming the pattern comprises: depositing bridged-(stannocenyl)tin compound photoresist over a substrate to form a photoresist layer, exposing the photoresist layer to actinic radiation to form a latent pattern, and then developing to form photolithography pattern.

• 출원번호 : US2024/038785
• 출원인 : LU, Feng
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/20(2006.01);G03F-007/32(2006.01);C07F-007/22(2006.01);

The present invention relates to silicon- and carbon-based composite particles, wherein each of the silicon-based composite particles is composed of a bulk material having a plurality of nanoscaled silicon domains embedded therein, and where the bulk material comprises carbon in a total amount of from 1 to 40 wt%, 5 based on the total mass of the silicon-based composite particles, where the bulk material comprises a plurality of nanoscaled silicon domains embedded in a first matrix comprising nanoscale silicon carbide domains, and the particles, when subjected to XRD analysis applying unmonochromated CuKα radiation, exhibit one peak at around 28° having a Full Width at Half Maximum (FWHM) in the range 10 from 0.5° to 8° and one peak around 36° having a FWHM in the range from 1° to 10°.

• 출원번호 : EP2024/070569
• 출원인 : CENATE AS
• 특허번호 :
• IPC : H01M-004/13(2010.01);H01M-004/134(2010.01);H01M-004/36(2006.01);H01M-004/38(2006.01);H01M-004/48(2010.01);H01M-004/485(2010.01);H01M-004/587(2010.01);