차세대 노광 기술을 적용한 경우에 노광 공정에 있어서의 감도나 해상도 등에 있어서 우수한 성능을 갖는 레지스트 패턴의 형성 방법 및 감방사선성 수지 조성물을 제공한다.(C) 감방사선성 산 발생제의 함유량이 0.1질량％ 이하인 레지스트막을 형성하는 공정 (1), 상기 레지스트막을 EUV, 또는 전자선(EB) 노광하는 공정 (2), 및 상기 공정 (2)에서 노광된 레지스트막을 현상하는 공정 (3)을 포함하는, 레지스트 패턴의 형성 방법.

• 출원번호 : 10-2024-7040554
• 출원인 : 제이에스알 가부시끼가이샤
• 특허번호 :
• IPC : G03F-007/004;C08F-212/14;C08F-220/10;G03F-007/038;G03F-007/039;G03F-007/20;

개시된 주제의 구체예는 발광층을 포함하는 하나 이상의 유기층, 하나 이상의 유기층 상에 배치된 제1 전극층, 제1 전극층의 일부로서 형성된 복수의 나노구조체, 기판 및 제2 전극층을 포함하는 디바이스로서, 제2 전극층은 기판 상에 배치되고, 하나 이상의 유기층은 제2 전극층 상에 배치되고, 복수의 나노구조체를 포함하는 제1 전극층은 하나 이상의 유기층 상에 그리고 발광층의 소정의 임계 거리 이내에 배치되는 디바이스를 제공한다.

• 출원번호 : 10-2024-0175449
• 출원인 : 유니버셜 디스플레이 코포레이션
• 특허번호 :
• IPC : H10K-050/805;H10K-102/00;

본 출원은 방사선 치료의 적어도 하나의 선량 및 적어도 하나의 PD-1 및/또는 PD-L1 길항제를 투여하는 단계를 포함하는, 환자에서의 암 치료 방법을 제공하며, 여기서 적어도 하나의 PD-1 및/또는 PD-L1 길항제는 방사선 치료 선량투여와 동일한 날 또는 이후 최대 4일까지를 포함해서 투여된다.

• 출원번호 : 10-2024-7037128
• 출원인 : 메디뮨 리미티드
• 특허번호 :
• IPC : A61K-039/395;A61K-039/00;A61N-005/10;A61P-035/00;A61P-035/02;C07K-016/28;

An augmented reality interventional system which provides contextual overlays (116) to assist or guide a user (101) or enhance the performance of the interventional procedure by the user that uses an interactive medical device (102) to perform the interventional procedure. The system includes a graphic processing module (110) that is configured to generate at least one contextual overlay on an augmented reality display device system (106). The contextual overlays may identify a component (104) or control of the interactive medical device. The contextual overlays may also identify steps of a procedure to be performed by the user and provide instructions for performance of the procedure. The contextual overlays may also identify a specific region of the environment to assist or guide the user or enhance the performance of the interventional procedure by identifying paths or protocols to reduce radiation exposure.

• 출원번호 : 18939982
• 출원인 : FLEXMAN, MOLLY LARA
• 특허번호 :
• IPC : G06T-011/00(2006.01);A61B-034/00(2006.01);A61B-090/00(2006.01);G09B-005/02(2006.01);G09B-019/00(2006.01);G16H-030/20(2006.01);G16H-040/63(2006.01);

A radiation source device includes at least one membrane layer, a radiation source structure to emit electromagnetic or infrared radiation, a substrate and a spacer structure, wherein the substrate and the at least one membrane form a chamber, wherein a pressure in the chamber is lower than or equal to a pressure outside of the chamber, and wherein the radiation source structure is arranged between the at least one membrane layer and the substrate.

• 출원번호 : 18939121
• 출원인 : Debie, Derek
• 특허번호 :
• IPC : G01N-029/22(2006.01);G01N-025/00(2006.01);G01N-029/02(2006.01);G01N-029/24(2006.01);

A milking system includes a device to sample and analyse a milk sample, a sample supply line connected to the milk line, a pump to control the sample flow, an optical radiation source, and an optical sensor device to detect and analyse optical radiation coming from the reagent pad with said sample, to provide an indication of a substance in the sample, a tape mover to move and unwind the tape from the tape reel, and a pump drive releasably operably connected to the pump device for driving the pump device. The sampling and analysis device also includes a cassette with a sample receiving line to receive the sample from the sample supply line, a tape reel with a tape that includes a base tape layer and a series of separate reagent pads, and a dosing device to provide a droplet of the sample onto a reagent pad.

• 출원번호 : 18938476
• 출원인 : LELY PATENT N.V.
• 특허번호 :
• IPC : A01J-005/013(2006.01);G01N-001/10(2006.01);G01N-001/18(2006.01);G01N-021/77(2006.01);G01N-021/85(2006.01);G01N-033/04(2006.01);G01N-035/00(2006.01);

This application discloses a cryopump, including a pump housing, a radiation shield in the pump housing, a first-stage cold storage component in the pump housing, a second-stage cold storage component in the holding space of the radiation shield, a connector connecting the first-stage cold storage component and the radiation shield, and a cryopanel assembly in the holding space and connected to the second-stage cold storage component.

• 출원번호 : 18937019
• 출원인 : VACREE TECHNOLOGIES CO., LTD.
• 특허번호 :
• IPC : F04B-037/08(2006.01);F04B-049/22(2006.01);

A determination method of a machining condition includes detecting, by using an optical sensor, at least one component of heat radiation, visible light, and reflected light generated at a welded portion provided on a surface of a workpiece by emission of a laser beam on the workpiece, acquiring a signal indicating a change in the at least one component in a time section from a start of welding to an end of welding of the workpiece, calculating a feature quantity based on a signal intensity of the signal in a predetermined section in the time section, determining, as the machining condition, presence or absence of a gap generated between superposed surfaces of the workpiece in an irradiation direction of the laser beam by inputting the calculated feature quantity to a determination model for determining the machining condition, and outputting the determined presence or absence of the gap as a determination result. The determination model is constructed based on training data including the feature quantity calculated under a plurality of conditions in which the machining condition changes and observed presence or absence of the gap in association with each other.

• 출원번호 : 18935667
• 출원인 : FUJIWARA, KAZUKI
• 특허번호 :
• IPC : B23K-026/03(2006.01);B23K-026/21(2006.01);

An image processing system includes a processor configured to receive heat radiation from a scene by a spectropolarimetric imaging system adapted to generate a plurality of spectral frames, generate the plurality of spectral frames associated with the scene, each frame having a plurality of pixels, for each pixel from the generated plurality of spectral frames, extract scene associated spectral information, including pixel-specific temperature representing an object's temperature, and thermal texture factor representing the object's texture, for each of a plurality of materials having a specific emissivity in a library, generate reference spectral information as a function of temperature and thermal texture, match the extracted spectral information for each pixel from the generated plurality of spectral frames to the generated reference spectral information using a statistical method to minimize the associated variation, and extract spectral metadata from the matched reference spectral information for the associated material based on the match.

• 출원번호 : 18935719
• 출원인 : Purdue Research Foundation
• 특허번호 :
• IPC : G01J-003/28(2006.01);G01J-003/00(2006.01);G01J-003/10(2006.01);G01J-003/447(2006.01);G01J-004/00(2006.01);G01J-004/04(2006.01);G01J-005/00(2006.01);G01J-005/48(2006.01);G01J-005/59(2006.01);G01N-021/21(2006.01);G01N-021/25(2006.01);G01N-021/35(2006.01);G06F-018/22(2006.01);G06V-010/143(2006.01);G06V-010/30(2006.01);G06V-010/40(2006.01);G06V-010/54(2006.01);G06V-010/75(2006.01);

The invention relates to a method for machining a transparent workpiece (4) by generating non-linear absorption of laser radiation in a laser beam focus located in a volume of the workpiece (4). The object of the invention is that of providing a method of improved precision and quality, and a corresponding device, for laser machining of workpieces. In particular, it is also intended for it to be possible for workpieces made of composite materials or of other special materials, such as filter glass, to be machined at an improved level of quality. For this purpose, the method according to the invention comprises the following steps: spectroscopic measurement of the linear absorption of the laser radiation in the workpiece (4),selecting a working wavelength at which the linear absorption is low, andmachining the workpiece (4) by means of the application laser radiation at the working wavelength. The invention furthermore relates to a corresponding device for machining a transparent workpiece (4).

• 출원번호 : 18936774
• 출원인 : Bergner, Klaus
• 특허번호 :
• IPC : B23K-026/00(2006.01);B23K-026/03(2006.01);B23K-026/06(2006.01);B23K-026/062(2006.01);B23K-026/0622(2006.01);B23K-026/064(2006.01);B23K-026/50(2006.01);B23K-026/53(2006.01);B23K-103/00(2006.01);C03C-015/00(2006.01);G01N-021/39(2006.01);