Disclosed in the present application are an antenna assembly and an antenna array. The antenna assembly comprises a radiation unit and a metal member, wherein the radiation unit comprises a radiation sheet; and the metal member is arranged on the periphery of the radiation sheet and is configured to be excited by the radiation sheet. The present application aims to provide a wide-beam antenna.

• 출원번호 : CN2024/107007
• 출원인 : ZTE CORPORATION
• 특허번호 :
• IPC : H01Q-003/00(2006.01)

A radiation facility including a radiation assembly, preferably for irradiating a patient is provided. The radiation assembly includes a radiation device and a moveable radiation device gantry whereupon the radiation device is mounted. The radiation device includes an accelerator and a projector for irradiating patients. The radiation assembly is movable relative to multiple patient preparation rooms.

• 출원번호 : 18781768
• 출원인 : ITREC B.V.
• 특허번호 :
• IPC : A61N-005/10(2006.01)

A system includes a wedge and an optical unit mounted on the wedge such that the optical unit is directed obliquely upward. The optical unit includes a radiation source. A controller is configured to treat an eye of a patient by causing the radiation source to irradiate respective target regions of the eye with a plurality of treatment beams while the eye gazes obliquely downward toward the optical unit.

• 출원번호 : 18780546
• 출원인 : Sacks, Zachary
• 특허번호 :
• IPC : A61F-009/008(2006.01);A61B-090/00(2006.01);A61F-009/007(2006.01);

A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.

• 출원번호 : 18781567
• 출원인 : CHEN, Tai-Yu
• 특허번호 :
• IPC : G03F-007/00(2006.01);G21K-001/06(2006.01);H05G-002/00(2006.01);

A dry storage systems for radioactive nuclear waste materials may include a double-walled canister system. The canister system may include a canister having a tubular inner shell defining an internal cavity for storing nuclear waste material, a first lid sealably welded to a first end of the inner shell, a primary base plate defining a peripheral edge portion and having an annular closure flange, and an annular full thickness butt weld formed at an abutment joint between the annular closure flange and a second end of the inner shell. The inner shell, first lid, and first end closure may collectively define a sealed primary pressure retention barrier. A tubular outer shell may adjoin the inner shell. The outer shell may be welded to the canister to form a hermetically sealed secondary pressure retention barrier.

• 출원번호 : 18780814
• 출원인 : SINGH, Krishna P.
• 특허번호 :
• IPC : G21F-005/12(2006.01);B23K-005/02(2006.01);G21F-005/005(2006.01);G21F-005/012(2006.01);G21F-005/10(2006.01);G21F-009/34(2006.01);G21F-009/36(2006.01);

Dioptric projection lens for imaging a pattern in an object plane into an image plane via electromagnetic radiation at an operating wavelength in the ultraviolet range of longer than 280 nm comprises a multiplicity of lens elements between the object plane and the image plane along an optical axis configured so that a pattern in the object plane is able to be imaged into the image plane via the lens elements, with a stop plane suitable for attaching an aperture stop between the object plane and the image plane, a chief ray of the imaging intersecting the optical axis in the stop plane. The projection lens is designed as a large field lens with an object field radius of at least 52 mm and has a structure with an imaging scale of 1:1 which is mirror symmetric with respect to the stop plane.

• 출원번호 : 18781500
• 출원인 : Epple, Alexander
• 특허번호 :
• IPC : G03F-007/00(2006.01)

A phantom for radiotherapy and/or medical imaging systems. The phantom includes one or more simulated anatomical structures including a tissue mimicking soft material. The phantom further includes a radiosensitive inclusion configured to form a bubble when exposed to radiation. The bubble is detectable via imaging with the medical imaging system.

• 출원번호 : US2024/039182
• 출원인 : ACOUSTIC RANGE ESTIMATES, LLC
• 특허번호 :
• IPC : A61N-005/10(2006.01)

A lithographic apparatus comprising a support structure configured to support a patterning device such that the patterning device is positionable in an illumination region; an illumination system operable to receive radiation and direct at least a portion of the received radiation to the illumination region; a substrate table configured to support a substrate; a projection system operable to form an image of a portion of a patterning device supported by the support structure on a substrate supported by the substrate table; a scanning system operable to move the support structure relative to the illumination region along a scanning trajectory so as to move the patterning device supported by the support structure through the illumination region along the scanning trajectory; wherein the illumination system is configured to control a shape of the illumination region based on an overlay error or a focus error.

• 출원번호 : EP2024/070813
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/00(2006.01)

Provided are: a resist underlayer film-forming composition that is capable of forming a resist underlayer film that can impart excellent pattern rectangularity to a resist pattern; and a method for producing a semiconductor substrate. The method for producing a semiconductor substrate comprises: a step for directly or indirectly coating a substrate with a resist underlayer film-forming composition; a step for forming a resist film on the resist underlayer film formed by the aforementioned step for coating a resist underlayer film-forming composition; a step for exposing the resist film to radiation; and a step for developing at least the exposed resist film. The resist underlayer film-forming composition contains a polymer and a solvent. The polymer contains a repeating unit (1) having an organosulfonate anion moiety and an onium cation moiety, a repeating unit (2) represented by formula (2), and a repeating unit (3) represented by formula (3). (In formula (2), R is a group selected from the group consisting of groups represented by any of formulas (2-1) to (2-8).) (In formula (3), R is a group that contains a substructure represented by formula (3-1) or (3-2).) (In formulas (3-1) and (3-2), X and X are each independently an oxygen atom, a sulfur atom, or a nitrogen atom. A formula in which a solid line and a broken line are combined indicates a single bond or a double bond each independently.)

• 출원번호 : JP2024/026067
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/11(2006.01);C08F-220/38(2006.01);C08F-228/02(2006.01);G03F-007/095(2006.01);H01L-021/027(2006.01);

The present invention relates to a device (99) for applying electromagnetic radiation to a human or animal body in a spectral range of between 280 nm and 2500 nm, in particular a spectral range of UV-B to far infrared. The device comprises an arrangement of a plurality of light-emitting diodes (12), said arrangement being designed to generate electromagnetic radiation in the desired spectral range and being arranged on a carrier medium (10). The device furthermore comprises an intermediate space (Z1) between the arrangement of a plurality of light-emitting diodes (12) and the human or animal body (100) to be irradiated. The device furthermore comprises an elastomer (13, 14) which substantially fills the intermediate space. The elastomer (13, 14) which substantially fills the intermediate space forms a contact surface (3) for the human or animal body (100) to be irradiated. The invention furthermore comprises a method for producing a device according to the invention, and to a solarium having at least one device according to the invention.

• 출원번호 : IB2024/057113
• 출원인 : JK-HOLDING GMBH
• 특허번호 :
• IPC : A61N-005/06(2006.01)