Provided are: a radiation-sensitive composition which is capable of exhibiting sufficient levels of sensitivity, LWR performance, CDU performance and MEEF performance during formation of a resist pattern, and has satisfactory storage stability; a pattern formation method; and an onium salt compound. The radiation-sensitive composition comprises: an onium salt compound represented by formula (1); a polymer containing a structural unit having an acid-dissociable group; and a solvent. (In formula (1), A represents a monovalent organic group having 1 to 40 carbon atoms. R and R each independently represent a hydrogen atom, a cyano group, a nitro group, a hydroxy group, an alkoxy group, an alkylthio group, an amino group, a mercapto group, a monovalent hydrocarbon group having 1 to 20 carbon atoms, or a monovalent hydrocarbon group having 1 to 20 carbon atoms and substituted by at least one of a cyano group, a nitro group, a hydroxy group, an alkoxy group, an alkylthio group, an amino group, a mercapto group, a chlorine atom, a bromine atom and an iodine atom. When a plurality of R's and a plurality of R's are present, the plurality of R's and the plurality of R's are respectively identical or different from each other. At least one of R and R is a cyano group or a nitro group. m represents an integer of 1 to 8. L represents -COO-, -OCO-, -CO- or -OCOO-, and represents an A-side bonding hand. However, when m is 1, L is -COO-, -CO- or -OCOO-. Z represents a monovalent radiation-sensitive onium cation.)
- 출원번호 : JP2024/015136
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);