A nonwoven textile can be treated with a laser to construct bonding structures between fibers of the nonwoven textile. In examples, the nonwoven textile can have fibers including a material that absorbs electromagnetic radiation emitted by a laser. In addition, based on absorbing the electromagnetic radiation, the fibers can soften, and the softened portions of the fibers can contact one or more other fibers of the nonwoven textile. When the softened portions re-solidify (e.g., after removal of the electromagnetic radiation), the re-solidified portions of the fiber can at least partially encapsulate the other fiber(s) to form the bonding structure between the re-solidified portions and the other fiber(s). In some examples, the bonding structure can reduce the likelihood of the fibers that are associated with the bonding structure from migrating through a face of the nonwoven textile and forming pills.

• 출원번호 : US2024/027139
• 출원인 : NIKE INNOVATE C.V.;NIKE, INC.;
• 특허번호 :
• IPC : D04H-001/485(2012.01);A43B-001/028(2022.01);D04H-001/541(2012.01);D04H-001/556(2012.01);B32B-005/02(2006.01);B32B-005/22(2006.01);B32B-005/26(2006.01);

According to certain embodiments of the present disclosure, an electronic device comprises: a display panel; a first housing in which the display panel is disposed; an input module; a second housing in which the input module is disposed, wherein the first housing is configured to be rotatable with respect to the second housing via a hinge module. The hinge module is fixably coupled to the second housing to rotate the first housing along a rotation axis of the first housing. An antenna unit is connected to at least a part of the rotation axis of the hinge module, wherein the antenna unit may include: a connector connected to the at least one part of the rotation axis; an antenna module connected to the connector and rotatable with respect to the connector on the rotation axis; and a weight connected to at least a portion of the antenna module and to maintain a radiation surface of the antenna module level substantially vertical with respect to the ground.

• 출원번호 : 18651727
• 출원인 : LIM, Gunbae
• 특허번호 :
• IPC : H01Q-001/22(2006.01);H01Q-001/18(2006.01);

The present provides for a stimuli-responsive switches, circuits including a stimuli-responsive switch, systems include the circuit, method of switching frequencies in a nuclear magnetic resonance system, and the like. The stimuli-responsive switch can be made of a stimuli-responsive material, where a conductive material can be moved and brought in contact with disconnected conductive paths by the stimuli-responsive material so that upon stimulation a conductive path can be achieved.

• 출원번호 : 18651795
• 출원인 : Touchet-Valle, Edith
• 특허번호 :
• IPC : G01R-033/36(2006.01);H01H-036/00(2006.01);

Apparatuses and methods of X-ray fluorescence (XRF) imaging use a radiation source to stimulate XRF from only a slice of an object by projecting a radiation beam through only the slice. An X-ray detector having a plurality of pixels is provided. A collimator having a plurality of parallel collimator plates is positioned between the object and the X-ray detector. The radiation beam is not parallel to the collimator plates. Neighboring pairs of the collimator plates allow XRF from only respective portions of the slice to reach respective subsets of the pixels. For each of the respective pixel subsets the X-ray detector sums signals generated in the pixel or pixels of the respective subset. The radiation beam is a fan beam or a pencil beam. A pixel pitch of the X-ray detector is an integer multiple of a plate pitch of the collimator.

• 출원번호 : 18652757
• 출원인 : SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
• 특허번호 :
• IPC : G01N-023/223(2006.01);G01N-023/2204(2006.01);

The resist composition exhibits excellent sensitivity, resolution, and LWR when processed by photolithography using high-energy radiation, typically EB and EUV lithography, and a patterning process using the same. The resist composition comprises a specific tin compound and an organic solvent exhibits excellent sensitivity, resolution, and LWR when processed by photolithography using high-energy radiation.

• 출원번호 : 18651856
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/20(2006.01);

The present disclosure relate to a method. The method includes accessing segmented digitized pathology imaging data from a cancer patient. The segmented digitized pathology imaging data identifies segmented nuclei, segmented mitosis, and segmented tubule regions. A plurality of nuclear features are extracted using the segmented nuclei. A plurality of mitosis features are extracted using the segmented mitosis. A plurality of tubule features are extracted using the segmented tubule regions. A risk score is generated by operating a machine learning model on the plurality of nuclear features, the plurality of mitosis features, and the plurality of tubule features. The risk score correlates to a risk of recurrence of cancer for the cancer patient.

• 출원번호 : 18651738
• 출원인 : Chen, Yuli
• 특허번호 :
• IPC : G16H-010/40(2006.01);G16H-050/30(2006.01);

A controlling apparatus capable of controlling radiation imaging by using auto exposure control of a radiation, the controlling apparatus comprising an estimating unit that estimates a radiation dose to be irradiated before the radiation is irradiated from a radiation generating apparatus, and a output unit that outputs information on an estimated radiation dose based on an output from estimating unit, wherein the information on the estimated radiation dose includes: in a case where the auto exposure control is used, information indicating that the auto exposure control is used; and, in a case where the auto exposure control is not used, at least one of the estimated radiation dose and a warning about the radiation.

• 출원번호 : 18651914
• 출원인 : NIIBE, YUSUKE
• 특허번호 :
• IPC : G01T-001/17(2006.01);G01T-001/02(2006.01);G01T-001/161(2006.01);

Disclosed herein are systems, methods, and devices for rapid synthesis of materials. In some embodiments, a system may comprise a material processing apparatus for processing a material, the material processing apparatus comprising a material passage structure in communication with a material feeding inlet, the material passage structure located within a reaction chamber, and the material feeding inlet configured to receive a material and transfer the material to the material passage structure; and a heat source in communication with the reaction chamber, the heat source comprising one or more of: plasma, flame, combustion sources, resistive heaters, heated liquid baths, electromagnetic radiation, and/or induction heaters, wherein the material passage structure is located within, surrounding, or adjacent to the heat source, such that the material passage structure is heated by the heat source and the material is converted to a product within the material passage structure.

• 출원번호 : US2024/027277
• 출원인 : 6K INC.
• 특허번호 :
• IPC : H05H-001/46(2006.01)

A germicidal verification system might comprise a dispersing unit for dispersing a tag composition, wherein the tag composition comprises two or more tags, a tag comprising a nonpathogenic portion having a particular range of sensitivity to exposure to ultraviolet (UV) radiation, wherein not all tags of the two or more tags have the same range of sensitivity. A dispersed tag composition, dispersed into an environment, can be collected after being exposed at least in part to some UV radiation in the environment. By measuring amounts of the two or more tags in the collected tag composition, wherein measurements of the measurement unit of a given tag depend on an amount of sensitivity to UV exposure of the given tag, effectiveness of UV radiation as a germicide could be measured. Relative degradation among tags can be measured and used as a proxy for, among other things, pathogens in the environment.

• 출원번호 : US2024/027281
• 출원인 : SAFETRACES, INC.
• 특허번호 :
• IPC : C12Q-001/689(2018.01)

A beam-modifying assembly for an ultra-high dose rate (UHDR) electron linear accelerator that generally includes a beam modifier formed of a first material that defines a first layer and a second material that defines a second layer, the second material being different from the first material, wherein the first layer is provided on top of the second layer such that a first surface of the beam modifier comprises the first material and a second surface of the beam modifier comprises the second material, the second surface being on an opposite side of the beam modifier from the first surface; and a mounting assembly configured to retain the beam modifier, wherein the mounting assembly is adapted to be installed at an exit window of the linear accelerator such that the beam modifier is positioned at the exit window of the linear accelerator, wherein the first surface of the beam modifier faces the exit window and the second surface faces a subject to be irradiated.

• 출원번호 : US2024/027137
• 출원인 : OHIO STATE INNOVATION FOUNDATION
• 특허번호 :
• IPC : H05H-007/22(2006.01);G21K-001/10(2006.01);H01J-033/04(2006.01);H05H-009/00(2006.01);A61N-005/10(2006.01);