The present disclosure relates to an oncolytic virus and methods of using such to treat cancer. The methods may advantageously involve further treating with at least a first DNA damaging agent, such as radiation or a chemotherapeutic agent. In some embodiments, the oncolytic virus is an oncolytic herpes simplex virus (oHSV) that optionally has been engineered to expression a portion of CD44, in particular the extracellular domain of CD44.

• 출원번호 : 18653847
• 출원인 : Kaur, Balveen
• 특허번호 :
• IPC : A61K-035/763(2006.01);A61K-045/06(2006.01);A61P-035/00(2006.01);C07K-014/705(2006.01);C12N-015/86(2006.01);

Disclosed herein are systems, methods, and devices for rapid synthesis of materials. In some embodiments, a system may comprise a material processing apparatus for processing a material, the material processing apparatus comprising a material passage structure in communication with a material feeding inlet, the material passage structure located within a reaction chamber, and the material feeding inlet configured to receive a material and transfer the material to the material passage structure; and a heat source in communication with the reaction chamber, the heat source comprising one or more of: plasma, flame, combustion sources, resistive heaters, heated liquid baths, electromagnetic radiation, and/or induction heaters, wherein the material passage structure is located within, surrounding, or adjacent to the heat source, such that the material passage structure is heated by the heat source and the material is converted to a product within the material passage structure.

• 출원번호 : 18653434
• 출원인 : Wrobel, Gregory M.
• 특허번호 :
• IPC : B01J-019/20(2006.01);C01G-049/00(2006.01);

A device includes a radiating system comprising: at least one of a radiation booster or a radiating element; a ground plane layer having at least two connecting points; a radiofrequency system electrically connected to the radiation booster and/or the radiating element and comprising at least one matching network; at least one external port electrically connected to the radiofrequency system; and at least first and second electrically conductive elements each comprising one or more components and being adapted to electrically connect first and second connecting points, respectively, of the at least two connecting points to an electrically conductive body of an apparatus at a distance from the ground plane layer, the distance being less than λ/15, wherein λ is a free-space wavelength at a lowest frequency of operation of the radiating system.

• 출원번호 : 18653579
• 출원인 : ANGUERA, Jaume
• 특허번호 :
• IPC : H01Q-001/48(2006.01);H01Q-001/52(2006.01);H01Q-009/04(2006.01);

The turnstile antenna (A) of the present invention comprises a casing (1); two identical radiating elements (2) mounted on the casing (1) with a first gap (G1) between them; a balun and a reflector (3) located below said radiating elements (2); wherein each of the radiating elements (2) comprises an upper part (2a) mounted on the casing (1) and two radiation arms (K3, K4) of different lengths, bending from the said upper part (2a) at a 90° right angle and extending towards the said reflector (6); and the reflector (3) comprises a lower part (3a); four reflector arms (K5) of equal length, bending from the lower part (3a) at a 90° right angle and extending towards the radiating elements (2), each are arranged to mutually align with a radiation arm (K3, K4) with a gap between them.

• 출원번호 : TR2024/050431
• 출원인 : PLAN S UYDU VE UZAY TEKNOLOJİLERİA.Ş.;
• 특허번호 :
• IPC : H01Q-021/26(2006.01);H01Q-001/52(2006.01);

The present disclosure generally relates to a sterilization device (200) for sterilizing a fluidic connector (300) for use with a dialysis apparatus. The sterilization device (200) comprises: a housing (210) for holding the fluidic connector (300); an adaptor (220) for connecting the fluidic connector (300) to enable fluid communication between the fluidic connector (300) and the dialysis apparatus while the adaptor (220) and fluidic connector (300) remain inside the housing (210); and broadband ultraviolet chip units (400) disposed in the housing (210), the broadband ultraviolet chip units (400) configured for emitting broadband ultraviolet radiation towards the adaptor (220) in the housing (210). The adaptor (220) is transmissive to the broadband ultraviolet radiation such that the broadband ultraviolet radiation enables sterilization of external and internal surfaces of the adaptor (220) and sterilization of the fluidic connector (300) that is connected into the adaptor (220).

• 출원번호 : SG2024/050287
• 출원인 : AWAK TECHNOLOGIES PTE LTD
• 특허번호 :
• IPC : A61M-001/16(2006.01);A61L-002/10(2006.01);A61M-039/16(2006.01);A61M-001/28(2006.01);A61M-001/36(2006.01);A61M-039/18(2006.01);

In at least one embodiment the optoelectronic semiconductor device (1) comprises an insert (4) and an optoelectronic semiconductor chip (2) configured to emit electromagnetic radiation and arranged in at least one cavity (30) of a housing (3). The cavity (30) comprises at least one side surface (31) at least partially laterally surrounding the optoelectronic semiconductor chip (2). The insert (4) is arranged between the optoelectronic semiconductor chip (2) and the side surface (31) of the cavity (30) at a distance (20) from the optoelectronic semiconductor chip (2). For example, the optoelectronic semiconductor chip (2) is a micro-LED.

• 출원번호 : EP2024/062062
• 출원인 : AMS-OSRAM INTERNATIONAL GMBH
• 특허번호 :
• IPC : H01L-033/58(2010.01);H01L-033/60(2010.01);H01L-033/50(2010.01);H01L-033/48(2010.01);

Shown and described is a method for adjusting the telecentricity in a projection exposure system (1) for microlithography comprising the following steps: a) providing a projection exposure system (1), wherein the projection exposure system (1) has an illumination system (3), a projection system (4), a mask (6), a radiation source (2) and/or an aperture stop (23), wherein the projection exposure system (1) is configured to guide radiation (R, R', R''), b) adjusting the telecentricity in the projection exposure system (1), wherein, preferably, in step b) the telecentricity is adjusted by adjusting the optical path of the projection exposure system, by adjusting the optical axis (OA, OAIL, OAPR) of the projection exposure system (1) and/or by adjusting radiation (R, R', R'') guided by the projection exposure system, b1) conducting a pupil measurement and wherein, preferably, in step b) the telecentricity is adjusted based on the pupil measurement. In order to provide a method that can reduce the deviation of a sidewall angle of a profile to be created in the radiation-sensitive layer from the intended sidewall angle, the described method is proposed.

• 출원번호 : EP2024/062067
• 출원인 : CARL ZEISS SMT GMBH
• 특허번호 :
• IPC : G03F-007/00(2006.01)

The present invention relates to a radiation protection material comprising a substrate material on which a protective coating is formed which is made of a matrix material having barite powder incorporated therein. The invention also relates to a radiation protection suit which has a base suit formed of a radiation protection material. According to the invention, the radiation protection material has a layer construction having a plurality of shielding plies lying one above the other, each of which is formed by the substrate material having the protective coating, the layer construction comprising at least one silicon-powder-containing layer. Also according to the invention, the radiation protection suit comprises a base suit made of the radiation protection material according to the invention, and an airtight single-use suit to be worn over the base suit, the suit parts of which single-use suit are formed by a single-use material made of a yellow transparent polyethylene or polyester film and an aluminium foil which is arranged over the extent of this film and is fixedly joined thereto.

• 출원번호 : IB2024/054231
• 출원인 : RGENAU INDUSTRIES GMBH &CO. KG;R.A.D.T LUX DISTRIBUTION S.ÀR.L.;
• 특허번호 :
• IPC : G21F-001/10(2006.01);G21F-001/12(2006.01);G21F-003/02(2006.01);

The present disclosure demonstrates that a newly discovered long interspersed nuclear element (LINE) R2 of medaka fish Oryzias latipes, R2Ol, can integrate into the 28S rDNA gene of a human cell in a target sequence-specific manner. With modification and/or addition of various non-coding sequences in the retrotransposon, its retrotransposition efficiency in human cells can be greatly improved. Further, additional exogenous genes can be included in the R2Ol retrotransposon, enabling the exogenous genes to be inserted into the target genome, achieving target sequence-specific gene delivery. Accordingly, the R2Ol retrotransposon systems of the present disclosure provide new and improved gene delivery approaches.

• 출원번호 : IB2024/054205
• 출원인 : THE UNIVERSITY OF TOKYO
• 특허번호 :
• IPC : C12N-005/10(2006.01)

An apparatus and method to compensate for under-corrected aberrations computationally is disclosed. The system includes an excitation radiation source that emits an excitation beam that is focused on a flow cell surface. More specifically, the excitation beam is focused on either an upper surface, a lower surface, or in a channel between the upper and lower surfaces of the flow cell. As imaging both the upper and lower surfaces simultaneously will result in aberration in at least one of the upper and lower surfaces, aberration correction is useful for dual surface imaging. A processor is configured to determine base calls of irradiated sites that fluoresce within the flow cell. An aberration compensation model is trained to compensate for aberrations in at least one image or image data corresponding to the upper surface, the lower surface, or the channel between the upper and lower surfaces.

• 출원번호 : US2024/027152
• 출원인 : ILLUMINA, INC.
• 특허번호 :
• IPC : G06T-007/11(2017.01);G06V-020/00(2022.01);