An example of a kit for 3D printing includes a build material composition and a fusing agent to be applied to at least a portion of the build material composition during 3D printing. The build material composition of the kit includes a polyamide 6,13 material, a phosphorus-containing antioxidant, and a sulfur-containing antioxidant, or a polyamide 6 material, the sulfur-containing antioxidant, and a phenolic antioxidant. The fusing agent includes a radiation absorber to absorb radiation to melt or fuse the build material composition in the at least the portion.

• 출원번호 : 19264591
• 출원인 : Woodruff, Shannon Reuben
• 특허번호 :
• IPC : B29C-064/165(2017.01);B29K-077/00(2006.01);B29K-105/00(2006.01);B33Y-010/00(2015.01);B33Y-030/00(2015.01);

본 발명은 원자력 발전소의 설비에 대한 정비작업대상의 도출 방법에 관한 것으로, 원자력 발전소의 설비 중 정비를 위한 대상설비를 선정하는 단계; 상기 대상설비에 대해 유지보수품목을 생성하는 단계; 상기 대상설비를 복수의 기능적설비그룹으로 나누는 단계; 상기 각 기능적설비그룹에 대해 주요기기와 주변기기로 나누는 단계; 상기 주요기기 및 주변기기 별로 상기 유지보수품목을 할당하는 단계; 및 상기 주요기기 및 주변기기의 해당 여부를 고려하여 상기 유지보수품목으로부터 정비작업대상을 도출하는 단계를 포함한다.

• 출원번호 : 10-2025-0092436
• 출원인 : 한국수력원자력 주식회사
• 특허번호 :
• IPC : G06Q-010/20;G06Q-010/0631;G06Q-010/0639;G21C-017/00;

The present invention provides: a composition for forming a resist underlayer film with which a resist underlayer film having excellent resist pattern rectangularity can be formed; a method for producing a semiconductor substrate; and a polymer. This composition for forming a resist underlayer film contains a polymer having a group that generates radicals upon irradiation with radiation, and a solvent. The polymer preferably has at least one group that generates radicals upon irradiation with radiation, the group being selected from the group consisting of formulae (A1) to (A8).

• 출원번호 : JP2025/024638
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/11(2006.01);G03F-007/20(2006.01);H01L-021/027(2006.01);

A method for off-focal correction applied to x-ray measurement data, e.g. to CT projection data. The method is based on performing a first pass material decomposition to derive material decomposition data for two or more materials in the imaged body followed by performing a virtual attenuation of a known emission spectrum of the off-focal radiation along an estimated material path from the off-focal emission area of the x-ray source to each pixel of the detector using the material decomposition data derived in the first pass.

• 출원번호 : EP2025/069502
• 출원인 : KONINKLIJKE PHILIPS N.V.
• 특허번호 :
• IPC : G06T-011/00(2006.01);A61B-006/00(2024.01);

A method comprising obtaining at least two signals based on scattered radiation from a metrology target and detected by a radiation sensor of a metrology system obtaining a first data set comprising the phases of the at least two signals calculating from the first data set a correction of an intensity value of a signal as detected by a radiation sensor.

• 출원번호 : EP2025/069526
• 출원인 : STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN;STICHTING VU;UNIVERSITEIT VAN AMSTERDAM;ASML NETHERLANDS B.V.;
• 특허번호 :
• IPC : G03F-007/20(2006.01);G03H-001/04(2006.01);

The invention relates to a system (2) for forming at least one annular bead (9) on a cylindrical component (1), the forming system (2) comprising at least one mould (3) configured to extend over the circumference of the cylindrical component (1) and including at least one annular groove (31), formed on an inner surface and intended to receive the annular bead (9), the mould (3) being made of a material which is transparent to laser radiation; at least one laser radiation device (4) extending circumferentially around the mould (3) and configured to emit circumferential laser radiation towards the cylindrical component (1) so as to heat it; and an injection device (5) configured to inject a pressurised fluid (P) against an inner radial surface (11) of the cylindrical component (1), at least facing the annular groove (31), so as to form the annular bead (9) in the annular groove (31).

• 출원번호 : EP2025/069569
• 출원인 : AIRBUS ATLANTIC
• 특허번호 :
• IPC : B29C-057/02(2006.01);B29D-023/18(2006.01);

Disclosed herein are a reflector apparatus for a heating assembly, and a method for operating the heating assembly. The reflector apparatus includes a base that has a first side having openings for radiation to pass through, a second side opposite to the first side, and a side wall extending between the first side and the second side. The reflector apparatus further includes a first reflector pocket disposed between the first side and the second side of the base and having a first reflector portion. The first reflector portion may include a wavy section having a Fresnel shape. A first reflector cooling chamber encases the first reflector portion and the wavy section. The method includes operating a heating lamp disposed in a reflector pocket at a power of at least 600 W and circulating a coolant within a reflector cooling chamber to cool the heating lamp.

• 출원번호 : US2025/036941
• 출원인 : APPLIED MATERIALS, INC.
• 특허번호 :
• IPC : H01L-021/67(2006.01)

Disclosed herein are a warpage control method and system for warpage control included in a processing chamber. The warpage control method includes heating a substrate by a heating assembly comprising a plurality of independently controllable heating zones, measuring a backside temperature of a susceptor based on radiation at a first wavelength, measuring a topside temperature of the substrate based on radiation at a second wavelength, measuring a curvature of the substrate based on radiation at a third wavelength, and controlling the heating assembly based on the backside temperature, the topside temperature, and the curvature. The warpage control system includes a first thermal sensor and an warp sensor disposed above a substrate, a second thermal sensor disposed below the substrate, a heating assembly, and a controller coupled with the heating assembly, the first thermal sensor, the second thermal sensor, and the warp sensor for controlling the warpage of the substrate.

• 출원번호 : US2025/036985
• 출원인 : APPLIED MATERIALS, INC.
• 특허번호 :
• IPC : H01L-021/67(2006.01);H01L-021/687(2006.01);C30B-025/10(2006.01);C30B-025/12(2006.01);C30B-025/16(2006.01);

A radiation source includes a vessel, a frame configured at an exterior of the vessel, a plenum structure inside the frame, and a thermally-conductive element between the frame and the plenum structure. The thermally-conductive element defines a first gap maintained between the plenum structure and the thermally-conductive element and a second gap maintained between the thermally-conductive element and the frame.

• 출원번호 : EP2025/069636
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : H05G-002/00(2006.01)

The present disclosure relates to an antenna device, comprising a first antenna patch panel configured to radiate an operating frequency of a first frequency band; and at least one second antenna patch panel configured to radiate an operating frequency greater than the first frequency band; wherein the first antenna patch panel is provided with a frequency selective transmission pattern part for transmitting a beam of an operating frequency radiated from the second antenna patch panel (hereinafter referred to as a ‘middle beam’); and wherein the frequency selective transmission pattern part is provided in a conductive pattern form on a portion of the first antenna patch panel that entirely or at least partially overlaps the radiation direction of the middle beam of the second antenna patch panel, thereby providing advantages such as preventing product size expansion and improving signal quality.

• 출원번호 : 19263545
• 출원인 : KMW INC.
• 특허번호 :
• IPC : H01Q-001/52(2006.01);H01Q-005/307(2015.01);H01Q-009/04(2006.01);