A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.

• 출원번호 : 18621218
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/00(2006.01);G03F-007/20(2006.01);G06T-007/00(2006.01);

A lithographic method comprises forming an image of a reticle on a substrate a plurality of times. Each such image formation process comprises: illuminating a first portion of a reticle and pellicle assembly with a radiation beam; and collecting radiation scattered by the reticle and projecting it onto a target region of a substrate using projection optics. The lithographic method further comprises periodically illuminating a second portion of the reticle and pellicle assembly with a radiation beam, the second portion of the reticle and pellicle assembly at least partially surrounding the first portion. Some pellicles are susceptible to hydrogen etching and such pellicles tend to fail in a region surrounding a central portion. Advantageously, by periodically illuminating a second portion of the reticle and pellicle assembly with a radiation beam, hydrogen etching of the second portion of the reticle and pellicle assembly can be suppressed.

• 출원번호 : EP2024/058797
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/20(2006.01)

Disclosed are a collimator mounting device and mounting system. The collimator mounting device comprises: a first mounting assembly, arranged on a collimator unit; and a second mounting assembly, arranged on a mounting surface. The first mounting assembly cooperates with the second mounting assembly, so that the collimator unit is locked to the mounting surface after being arranged at a predetermined position. According to the present invention, it can be guaranteed that the determined position of the collimator unit after being disassembled and assembled each time is unchanged, so that the whole disassembling and assembling process is simple and convenient, and the time for replacing the collimator unit by the replacement personnel is shortened, and thus the staying time of the replacement personnel at a beam outlet of a beam shaping body assembly and the weight bearing time of the replacement personnel are shortened, thereby reducing the health risk of radiation borne by the replacement personnel. Moreover, after frequent disassembly operation, the collimator unit and the beam shaping body assembly are not prone to wear, so that the device precision is improved, and the beam quality and the therapeutic effect are ensured.

• 출원번호 : CN2024/084895
• 출원인 : NEUBORON THERAPY SYSTEM LTD.
• 특허번호 :
• IPC : B23P-019/00(2006.01);A61N-005/10(2006.01);G02B-027/30(2006.01);

The invention relates to a method for producing an edging strip comprising at least one first layer with a pretreated, in particular roughened, connecting surface, with said method comprising the steps of a) providing a first layer containing a plastic and comprising a surface, b) applying the surface of the first layer with electromagnetic radiation in order to obtain a pretreated, in particular roughened, connecting surface. The invention also relates to an edging strip that can be obtained using the method, a furniture part comprising the edging strip, and the use of the edging strip for producing a panel-type furniture part.

• 출원번호 : EP2024/058492
• 출원인 : FRITZ EGGER GMBH &CO. OG;
• 특허번호 :
• IPC : C09J-007/22(2018.01);C09J-005/02(2006.01);A47B-096/20(2006.01);B27D-005/00(2006.01);B29C-063/00(2006.01);

Disclosed in the present invention are crystal forms of a nitrogen-containing spiro compound, a preparation method therefor and the use thereof. Provided in the present invention is a crystal form I of a nitrogen-containing spiro compound as shown in formula A, which crystal form I has an X-ray powder diffraction pattern comprising diffraction peaks at 5.67±0.20°, 11.37±0.20°, 16.69±0.20°, 17.32±0.20° and 19.73±0.20° 2θ, as determined by using Cu-Kα radiation. Provided in the present invention is a crystal form II of the nitrogen-containing spiro compound as shown in formula A, which crystal form II has an X-ray powder diffraction pattern comprising diffraction peaks at 11.32±0.20°, 11.70±0.20°, 11.93±0.20°, 18.03±0.20°, 18.81±0.20° and 19.17±0.20° 2θ, as determined by using Cu-Kα radiation. The crystal forms of the nitrogen-containing spiro compound of the present invention have good stability, an inhibitory activity on complement factor D, a good inhibitory effect on rabbit erythrocyte hemolysis, and relatively high in-vivo exposure and relatively high oral bioavailability.

• 출원번호 : CN2024/084387
• 출원인 : WUHAN CREATERNA SCIENCE AND TECHNOLOGY CO., LTD.
• 특허번호 :
• IPC : C07D-221/20(2006.01);C07D-471/10(2006.01);C07D-209/54(2006.01);C07C-069/734(2006.01);A61P-007/00(2006.01);A61P-009/00(2006.01);A61P-037/02(2006.01);A61P-025/28(2006.01);A61P-011/00(2006.01);A61P-013/00(2006.01);A61P-013/12(2006.01);A61P-027/02(2006.01);A61P-029/00(2006.01);A61P-019/02(2006.01);A61P-017/06(2006.01);A61P-021/04(2006.01);A61P-031/14(2006.01);A61K-031/438(2006.01);A61K-031/395(2006.01);

A radiation emitting assembly (10), in particular for use in a semiconductor sensing device, comprising a radiation emitting element (12) arranged on a substrate (2) and encapsulated by an overmold (20), should be provided that helps to provide simple and straightforward means for beam tailoring at low costs. According to the present invention, this object is achieved in that said overmold (20) comprises a beam-tailoring section (24) doped with scattering particles (26).

• 출원번호 : EP2024/058458
• 출원인 : AMS-OSRAM AG
• 특허번호 :
• IPC : G01S-007/481(2006.01);H01L-033/48(2010.01);

A fuel rack for wet storage of nuclear fuel in a fuel pool in one embodiment comprises a baseplate and a cellular body formed of interlocked stacked slotted plates coupled to the baseplate. The body comprises tightly-packed upwardly open cells which each hold a nuclear fuel assembly. Open flux traps are formed between at least some cells which fill with water when the rack is submerged to act as a neutron moderator to control reactivity in the rack. In one embodiment, a flux trap is interspersed between adjacent cells running in a first direction along a first horizontal axis of the rack. However, a flux trap is not interspersed between adjacent cells running in a perpendicular second direction along a second horizontal axis. Other flux trap and cell arrangements are provided. Tension elements extend through some flux traps which compress the stack of plates together for stability.

• 출원번호 : US2024/022081
• 출원인 : HOLTEC INTERNATIONAL
• 특허번호 :
• IPC : G21C-019/07(2006.01);G21F-001/02(2006.01);G21F-009/34(2006.01);

The present invention relates to a detection system for an X-ray imaging system. The detection system comprises a first detector a second detector, each detector comprising a detector area and being configured for detecting X-ray radiation emitted by an X-ray source of the X-ray imaging system impinging onto the respective detection area. The detection system is configured to adjust a position of at least one of the first detector and the second detector with respect to the other of the first detector and the second detector. The first detection area of the first detector and the second detection area of the second detector can be positioned at least partially one behind the other with respect to a direction of X-ray radiation emitted from the X-ray source of the X-ray imaging system.

• 출원번호 : EP2024/058721
• 출원인 : KONINKLIJKE PHILIPS N.V.
• 특허번호 :
• IPC : G01T-001/16(2006.01);G01T-001/29(2006.01);A61B-006/03(2006.01);

The present invention comprises: a polymer (A) which contains a structural unit (U1) having an acid-dissociable group, and has a carboxy group; and a radiation-sensitive acid generator (B) (excluding the polymer (A)). At least one compound that is selected from the group consisting of the polymer (A) and the radiation-sensitive acid generator (B) has an iodine group. The polymer (A) contains a structural unit (U2) having a carboxy group. In the radiation-sensitive composition, the carboxy group in the structural unit (U2) is bonded to a carbon atom that constitutes the main chain of the polymer (A), or the structural unit (U2) has a chain structure and the carboxy group is bonded to the chain structure, or the structural unit (U2) has an aromatic ring which is bonded to a carbon atom that constitutes the main chain of the polymer (A) and the carboxy group is bonded to the aromatic ring.

• 출원번호 : JP2024/012734
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);C08F-212/14(2006.01);C08F-220/30(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);

Provided are a nuclear power plant, a control device for the nuclear power plant, and a control method for the nuclear power plant that can be utilized for power supply-demand balance adjustment when a large amount of renewable energy is connected to a system. This nuclear power plant is configured to supply steam generated in a nuclear reactor to a high-pressure turbine through a main steam control valve and supply a portion of the steam generated in the nuclear reactor to a moisture separation heater through an adjustment valve to heat exhaust steam from the high-pressure turbine. The nuclear power plant is characterized in that the reactor pressure is controlled by adjusting the amount of steam to the moisture separation heater.

• 출원번호 : JP2024/012679
• 출원인 : HITACHI-GE NUCLEAR ENERGY, LTD.
• 특허번호 :
• IPC : G21D-003/08(2006.01);G21D-003/12(2006.01);