This radiation-sensitive composition comprises a polymer having an acid dissociable group and a compound represented by formula (1). In formula (1), X is *-SO-NH- or *-NH-SO-. * denotes an atomic bond with R. With respect to R and A, R is a monovalent organic group and A is a divalent organic group, or alternatively, R and A are combined with each other to form a group having a ring structure that contains -SO-NH- in the ring skeleton. M is a substituted or unsubstituted iodonium cation or a sulfonium cation that has at least one group selected from the group consisting of a fluoro group, a bromo group, an iodo group, a haloalkyl group, a cyano group, a carbonyl group and a sulfonyl group. However, in cases where M is an unsubstituted iodonium cation, A has an aromatic ring.
- 출원번호 : JP2025/029777
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C07C-025/18(2006.01);C07C-311/08(2006.01);C07C-311/11(2006.01);C07C-311/48(2006.01);C07C-311/51(2006.01);C07C-381/12(2006.01);C07D-275/06(2006.01);C07D-317/24(2006.01);C07D-317/70(2006.01);G03F-007/20(2006.01);G03F-007/039(2006.01);