The present invention relates to a process for shaping keratin fibres, notably the hair, comprising steps with the aim of subjecting a tensioned lock of hair to illumination: exposing said keratin fibres to light radiation having an emission maximum in a wavelength range of between 280 nm and 650 nm, the process being characterized in that the keratin fibres to be treated receive an irradiance of greater than or equal to 1 W/cm and less than or equal to 50 W/cm2.

• 출원번호 : EP2024/064043
• 출원인 : L'OREAL
• 특허번호 :
• IPC : A45D-002/00(2006.01);A45D-007/00(2006.01);

An optical fiber-based sensing membrane includes at least one optical fiber, and a substrate. The at least one optical fiber is integrated in the substrate. The substrate includes a thickness and a material property that are specified to ascertain, via the at least one optical fiber and for a device that is contiguously engaged with a surface of the substrate, includes the substrate embedded in the device, or includes the surface of the substrate at a predetermined distance from the device, a thermal property or a mechanical property associated with the device, or a radiation level associated with a device environment.

• 출원번호 : 18671411
• 출원인 : VIAVI SOLUTIONS INC.
• 특허번호 :
• IPC : G01H-009/00(2006.01);B60L-058/18(2006.01);G01D-021/02(2006.01);G01K-011/32(2006.01);G01K-011/3206(2006.01);G01K-011/322(2006.01);G01K-011/324(2006.01);G01K-015/00(2006.01);G01L-001/24(2006.01);G01L-025/00(2006.01);G02B-006/12(2006.01);G02B-006/13(2006.01);

An optical fiber-based sensing membrane includes at least one optical fiber and a substrate. The at least one optical fiber is integrated in the substrate. The optical fiber-based sensing membrane includes, based on a specified geometric pattern of the at least one optical fiber, an optical fiber-based sensing membrane layout. The substrate includes a thickness and a material property that are specified to ascertain, via the at least one optical fiber and based on the optical fiber-based sensing membrane layout, a thermal property or a mechanical property associated with a device, or a radiation level associated with a device environment.

• 출원번호 : 18671384
• 출원인 : VIAVI SOLUTIONS INC.
• 특허번호 :
• IPC : G01H-009/00(2006.01);B60L-058/18(2006.01);G01D-021/02(2006.01);G01K-011/32(2006.01);G01K-011/3206(2006.01);G01K-011/322(2006.01);G01K-011/324(2006.01);G01K-015/00(2006.01);G01L-001/24(2006.01);G01L-025/00(2006.01);G02B-006/12(2006.01);G02B-006/13(2006.01);

An example system for molding a photocurable material into a planar object includes a first mold structure having a first mold surface, a second mold structure having a second mold surface, and one or more protrusions disposed along at least one of the first mold surface or the second mold surface. During operation, the system is configured to position the first and second mold structures such that the first and second mold surfaces face each other with the one or more protrusions contacting the opposite mold surface, and a volume having a total thickness variation (TTV) of 500 nm or less is defined between the first and second mold surfaces. The system is further configured to receive the photocurable material in the volume, and direct radiation at the one or more wavelengths into the volume.

• 출원번호 : 18671622
• 출원인 : Chang, Chieh
• 특허번호 :
• IPC : B29D-011/00(2006.01);B29C-035/08(2006.01);B29C-039/02(2006.01);B29C-039/26(2006.01);B29C-039/38(2006.01);B29C-071/02(2006.01);

An apparatus for reducing hydrogen permeation of a mask is provided when generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage configured to hold the mask, a hydrogen dispensing nozzle configured to eject hydrogen below the mask, and a trajectory correcting assembly. The trajectory correcting assembly includes a correcting nozzle and a gas flow detector. The correcting nozzle is configured to dispense at least one flow adjusting gas to adjust a trajectory of the hydrogen away from the mask to reduce hydrogen permeation at an edge of the mask. The gas flow detector is configured to measure a variation of an airflow of the hydrogen adjusted by the at least one flow adjusting gas.

• 출원번호 : 18671187
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/00(2006.01);G03F-001/22(2006.01);

A sensor for detecting the surroundings, comprising a signal exchange unit, a power supply, a sensor housing, a transmitter, and a receiver, wherein the transmitter and the receiver are arranged in the sensor housing, wherein the transmitter is designed to emit a measuring radiation into the surroundings, wherein the receiver is designed to receive a reflection radiation from the surroundings, wherein the power supply is arranged to supply the transmitter and the receiver with power, wherein the signal exchange unit is connected to the receiver and the transmitter for signal exchange, wherein the signal exchange unit is arranged to exchange signals with a counter-signal exchange unit, and the sensor housing can be mechanically connected to a receiving unit in a tool-free, non-destructive and detachable manner.

• 출원번호 : 18671101
• 출원인 : Schaeuble, Michael
• 특허번호 :
• IPC : G01S-007/02(2006.01);G01S-007/40(2006.01);G01S-013/931(2006.01);

Back-illuminated DUV/VUV/EUV radiation or charged particle image sensors are fabricated using a method that utilizes a plasma atomic layer deposition (plasma ALD) process to generate a thin pinhole-free pure boron layer over active sensor areas. Circuit elements are formed on a semiconductor membrane's frontside surface, and then an optional preliminary hydrogen plasma cleaning process is performed on the membrane's backside surface. The plasma ALD process includes performing multiple plasma ALD cycles, with each cycle including forming an adsorbed boron precursor layer during a first cycle phase, and then generating a hydrogen plasma to convert the precursor layer into an associated boron nanolayer during a second cycle phase. Gasses are purged from the plasma ALD process chamber after each cycle phase. The plasma ALD cycles are repeated until the resulting stack of boron nanolayers has a cumulative stack height (thickness) that is equal to a selected target thickness.

• 출원번호 : 18671172
• 출원인 : KLA Corporation
• 특허번호 :
• IPC : H01L-027/146(2006.01);G03F-007/00(2006.01);

The disclosure features methods of analyzing a fluid extracted from a reservoir, the methods including introducing a first composition featuring a first complexing agent into a reservoir at a first location, extracting a fluid from the reservoir at a second location different from the first location, combining the fluid with a second composition featuring a concentration of a lanthanide ion to form a third composition featuring a concentration of a complex formed by the first complexing agent and the lanthanide ion, exposing a quantity of the complex to electromagnetic radiation for a first time period ending at a time t0, detecting fluorescence emission from the quantity of the complex for a second time period starting at a time t1t0, where t1−t0 is greater than 2 microseconds, and determining information about a fluid flow path between the first location and the second location.

• 출원번호 : 18671211
• 출원인 : Ow, Hooisweng
• 특허번호 :
• IPC : C07D-213/55(2006.01);C07D-213/79(2006.01);C07D-213/89(2006.01);C07D-401/04(2006.01);C07D-471/04(2006.01);C09K-008/03(2006.01);C09K-011/07(2006.01);E21B-043/16(2006.01);E21B-047/11(2006.01);E21B-049/08(2006.01);G01N-021/64(2006.01);

A laser scanner and a system with a laser scanner for measuring an environment. The laser scanner includes an optical distance measuring device, a support, a beam steering unit rotatably fixed to the support which rotates around a beam axis of rotation. The beam steering unit includes a mirrored surface which deflects radiation used in the optical distance measurement and an angle encoder for recording angle data. The optical distance measurement is performed by a progressive rotation of the beam steering unit about the beam axis of rotation and the continuous emission of a distance measurement radiation, the emission being made through an outlet area arranged in the direction of the mirrored surface on the support, the receiving optics for receiving radiation are 10 arranged on the support, and wherein the outlet area has a lateral offset with respect to the optical axis of the receiving optics.

• 출원번호 : 18671823
• 출원인 : LEICA GEOSYSTEMS AG
• 특허번호 :
• IPC : G01S-017/89(2006.01);G01B-011/00(2006.01);G01B-011/02(2006.01);G01B-011/22(2006.01);G01S-007/48(2006.01);G01S-007/481(2006.01);G01S-007/497(2006.01);G01S-017/42(2006.01);G01S-017/894(2006.01);G06T-011/00(2006.01);

Methods for reducing an amount of calcium carbonate deposited on a surface of an offline condenser in a cooling system of a nuclear power plant, which include filling the offline condenser with a mixture comprising water and acetic acid and pumping the mixture through the offline condenser so as to contact the deposited calcium carbonate with the acetic acid. An amount of the acetic acid in the mixture is 1 to 25 wt %, and a temperature of the mixture is in a range of 10 to 50° C.

• 출원번호 : 18671057
• 출원인 : CHEMTREAT, INC.
• 특허번호 :
• IPC : F28G-009/00(2006.01);C11D-001/75(2006.01);C11D-003/20(2006.01);