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  • 510120

    us

    An information processing device according to an embodiment of the present disclosure includes one or more memories storing instructions and one or more processors that, upon execution of the stored instructions, are configured to operate as: a display control unit configured to, upon receiving an instruction for acquiring a first radiation image, control a display unit such that a second radiation image is displayed first and then the first radiation image is displayed. The first radiation image is obtained by performing first image processing upon a radiation image obtained by detecting a radiation. The second radiation image is obtained by performing second image processing requiring a shorter processing time than the first image processing upon the radiation image.
    • 출원번호 : 18778253
    • 출원인 : YAMADA, DAISUKE
    • 특허번호 :
    • IPC : A61B-006/46(2006.01);A61B-006/00(2006.01);A61B-006/42(2006.01);G01T-001/24(2006.01);G06T-003/40(2006.01);G06T-005/60(2006.01);G06T-005/70(2006.01);G06T-007/00(2006.01);
  • 510119

    wo

    The present invention addresses the problem of providing an agent for the treatment of cancer, in particular, an agent which can be used in combination with boron neutron capture therapy and photodynamic therapy for the treatment of cancer. The present invention solves the problem by providing an agent for the treatment of cancer, the agent containing a carrier that is accumulating in cancer cells, and a boron-containing compound and/or a photosensitizer covalently bonded and/or non-covalently bonded to the carrier, and being used for cancer therapy in which a subject administered with the agent is irradiated with radiation.
    • 출원번호 : JP2024/026054
    • 출원인 : NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY;NIHON FUKUSHI FUIIN HOLDINGS LIMITED;
    • 특허번호 :
    • IPC : A61K-031/403(2006.01);A61K-031/69(2006.01);A61K-041/00(2020.01);A61K-047/34(2017.01);A61K-047/59(2017.01);A61N-005/10(2006.01);A61P-035/00(2006.01);A61P-043/00(2006.01);
  • 510118

    wo

    The invention relates to a device for texturing the surface of a strip moving at a line speed V, the device comprising a strip path P, a frame adjacent to the strip path P, a plurality of inkjet print heads H, H… H distributed along and above the path P, a plurality of radiation-curing modules M, M… Mn distributed along and above the path P, each radiation-curing module Mi being positioned at a distance Li downstream of the inkjet print head Hi so that the radiation-curing modules and the inkjet print heads alternate, the plurality of inkjet print heads and the plurality of radiation-curing modules being connected to the frame so that a plurality of distances L can be adjusted by linear translation, along the path P, of the inkjet print head H and/or of the radiation-curing module Mi. The invention also relates to the processes thereof.
    • 출원번호 : IB2024/057034
    • 출원인 : ARCELORMITTAL
    • 특허번호 :
    • IPC : B41J-003/54(2006.01);B41J-002/515(2006.01);B41J-011/00(2006.01);B41J-025/308(2006.01);
  • 510117

    us

    In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Methods are provided for improved filtering for particle removal from radiation patternable organometallic resist compositions.
    • 출원번호 : 18778388
    • 출원인 : Clark, Benjamin L.
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);G03F-007/16(2006.01);
  • 510116

    wo

    The present invention relates to a security seal with closure means (4, 5 or 4', 5') that comprises in at least a first portion (1a) of said body a material that allows identification and/or tracing and in at least a second portion (1b) of said body at least a second type of tracing material. The second portion (1b) is located close to the first portion (1a) when the security seal is in a closed position, the first and second tracing material being a mixture of one or more chemical components in different amounts and proportions that are, in and of themselves, detectable and identifiable by using instruments for detecting emitted fluorescent or non-fluorescent radiation with an electromagnetic spectrum range between 100 and 2000 nanometres of electromagnetic excitation range and/or by using laser light to measure the decay time of the luminosity of photoluminescent materials, using techniques such as photon upconversion.
    • 출원번호 : ES2024/070466
    • 출원인 : COSTA BOTEY, Jose Maria;HERZOG, Tobias;
    • 특허번호 :
    • IPC : B65D-055/02(2006.01);G01J-003/28(2006.01);G09F-003/03(2006.01);G01N-021/64(2006.01);
  • 510115

    wo


    • 출원번호 : EP2024/070546
    • 출원인 : SANGLE-FERRIERE, Bruno
    • 특허번호 :
    • IPC : G21G-001/06(2006.01);G21G-004/02(2006.01);
  • 510114

    ep

    The present invention relates to a method for applying an image onto a receiving medium, wherein the image is applied onto the recording medium by depositing a UV-curable ink and the ink is irradiated with radiation. The present invention further relates to a scanning printer and a software product.
    • 출원번호 : 24189858.4
    • 출원인 : Canon Production Printing Holding B.V.
    • 특허번호 :
    • IPC : B41J-011/00(2006.01)
  • 510113

    wo

    A curable composition includes an ethylenically unsaturated polydiorganosiloxane, a radical curable siloxane – urethane/urea copolymer, a reactive diluent, a crosslinker, and a photoinitiator. The composition can be cured by exposure to UV radiation. The composition can be used to form a transparent film with a Shore M hardness ≥ 35.
    • 출원번호 : US2024/038634
    • 출원인 : DOW GLOBAL TECHNOLOGIES LLC;DOW SILICONES CORPORATION;
    • 특허번호 :
    • IPC : C08L-083/04(2006.01);C08L-083/08(2006.01);
  • 510112

    us

    An information processing apparatus includes at least one memory storing instructions and at least one processor. The at least one processor is configured to execute the instructions to generate a first integrated image by integrating a plurality of radiation images obtained by image capturing using a radiation generating apparatus that generates radiation and a radiation imaging apparatus, and generate a second integrated image different from the first integrated image using the plurality of radiation images and at least one radiation image obtained by the image capturing after the plurality of radiation images are obtained; and control a display device to change a display based on a determination regarding an image quality of the first integrated image to a display based on a determination regarding an image quality of the second integrated image.
    • 출원번호 : 18778776
    • 출원인 : KUBOTA, HIROFUMI
    • 특허번호 :
    • IPC : G16H-030/20(2006.01);G06F-003/14(2006.01);G06T-007/00(2006.01);
  • 510111

    ko

    활성제를 저용량으로 포함하는 방법, 조성물, 및 키트를 포함한, 개체에서 방사선 요법 및/또는 화학요법 노출과 연관된 하나 이상의 부작용을 치료 및/또는 예방하기 위한 방법, 조성물, 및 키트가 개시된다. 일부 구체예에서, 활성제를 저용량으로 포함하는 방법, 조성물, 및 키트를 포함한, 개체에서 조직 손상을 치료 및/또는 예방하기 위한 방법, 조성물, 및 키트가 제공된다.
    • 출원번호 : 10-2024-7024244
    • 출원인 : 바이오미매틱스 제이브이, 엘엘씨;듀크 유니버시티;
    • 특허번호 :
    • IPC : A61K-031/555;A61K-031/495;A61K-033/243;A61K-045/06;A61P-001/02;A61P-017/00;A61P-017/14;A61P-025/28;A61P-035/00;A61P-043/00;