A transportable, resilient, high frequency system with a compact footprint is provided. The system may include a plurality of antenna elements arranged around a circle. A circular array provides a resilient radiation pattern that does not change based on the number of antennas in the array and is tolerant of errors in antenna placement. The gain of the system may be increased by increasing the number of antenna elements in the array to compensate for reduced efficiency of antenna elements having a radiating element with a length of less than half the wavelength of an operating frequency of the array.

• 출원번호 : 18782920
• 출원인 : The MITRE Corporation
• 특허번호 :
• IPC : H01Q-021/20(2006.01);H01Q-003/28(2006.01);H01Q-021/26(2006.01);H01Q-021/29(2006.01);

A method of forming a semiconductor device includes removing a light-sensitive material from a workpiece utilizing polarized electromagnetic radiation and annealing features on the workpiece utilizing electromagnetic radiation polarized in a different direction than the polarized electromagnetic radiation utilized to remove the light-sensitive material. In some embodiments, the electromagnetic radiation used to anneal the features on the workpiece is not polarized. In some described embodiments, light-sensitive material removed from the workpiece is exhausted from the chamber in which the light-sensitive removal process is carried out before it can deposit on surfaces of the chamber.

• 출원번호 : 18783347
• 출원인 : CHEN, Tz-Shian
• 특허번호 :
• IPC : H01L-021/027(2006.01)

A semiconductor arrangement is provided. The semiconductor arrangement includes a first photodiode in a substrate. The semiconductor arrangement includes a lens array over the substrate. A first plurality of lenses of the lens array overlies the first photodiode. Radiation incident upon the first plurality of lenses is directed by the first plurality of lenses to the first photodiode.

• 출원번호 : 18782107
• 출원인 : HSIEH, Feng-Chien
• 특허번호 :
• IPC : H01L-027/146(2006.01)

A wearable electronic device (1), having a first radiation source (10) configured to emit a radiation beam (11) to a surface of skin of a user, the radiation beam having a peak emission wavelength between 610-1400nm; a driver circuit (20) configured to provide a driving current (15) to the radiation source (10) to control an irradiation intensity of the radiation beam on said surface; and an antenna (40) and/or a sensor circuit (30) having one or more sensors. The driver circuit (20) is configured to receive one or more inputs from the sensor circuit (30) and/or from the antenna (40) and is configured to control the first radiation source (10) on the basis of said one or more inputs.

• 출원번호 : EP2024/071060
• 출원인 : SEABOROUGH LIFE SCIENCE B.V.
• 특허번호 :
• IPC : A61N-005/06(2006.01)

A radiation-sensitive resin composition includes: a polymer including a first structural unit represented by formula (1), solubility of the polymer in a developer solution capable of being altered by an acid; and a compound represented by formula (2). R1 represents a hydrogen atom, or the like; R2 represents a group obtained by removing, from a substituted or unsubstituted aliphatic hydrocarbon ring having 3 to 30 ring atoms, two hydrogen atoms; and Ar1 represents a group obtained by removing one hydrogen atom from a substituted or unsubstituted aromatic hydrocarbon ring having 6 to 30 ring atoms. Z represents an acid-labile group; L1 represents *—O—CO— or —O—; Y represents an organic group having 1 to 30 carbon atoms, the organic group not comprising a cyclic acetal structure; A− represents a monovalent anion group; n is an integer of 1 to 5; and X+ represents a monovalent radiation-sensitive onium cation.

• 출원번호 : 18782428
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);G03F-007/004(2006.01);G03F-007/16(2006.01);

A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.

• 출원번호 : 18782565
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/038(2006.01);C08L-025/08(2006.01);C08L-033/10(2006.01);C08L-033/16(2006.01);G03F-007/004(2006.01);G03F-007/027(2006.01);G03F-007/16(2006.01);G03F-007/20(2006.01);G03F-007/40(2006.01);

A testing device for testing an antenna is provided. The testing device includes a housing, an antenna module for holding the antenna and disposed under the housing, and a receiving module disposed on the housing. The receiving module includes a substrate, a coupling radiation element disposed on the substrate, and a support disposed on the substrate. The coupling radiation element includes a coupling portion and a first branch connecting to the coupling portion.

• 출원번호 : 18782753
• 출원인 : LAI, Chi-Chang
• 특허번호 :
• IPC : G01R-029/10(2006.01);G01R-031/28(2006.01);

A computer-implemented method for scattered radiation correction, comprising the steps: obtaining projection images, optimizing a measure of quality by variation of correction parameters depending on the projection images, wherein a determination algorithm, which serves to determine the measure of quality, is an algorithm trained by machine learning and processes as its input data a reconstructed three-dimensional image dataset or processing data that is chosen from the image dataset, wherein the image dataset is based on corrected projection images, wherein a respective corrected projection image results from application of a correction algorithm, wherein the correction algorithm is parameterized by the correction parameters, provision of radiation scatter-corrected projection images and/or of a radiation scatter-corrected reconstructed three-dimensional image dataset.

• 출원번호 : 18782407
• 출원인 : Roser, Philipp
• 특허번호 :
• IPC : A61B-006/00(2006.01);G06N-020/00(2006.01);

A THz measuring method and a THz device for measuring a container with a joint, in particular, a blow mold container with a pinch-off seam, where a THZ sensor is adjusted relative to a container region in multiple positions with different orientations of the optical axis, THz radiation is emitted as a non-parallel beam bundle from the THz sensor towards the container region, and THz radiation partially reflected on the interior surface and the exterior surface of the container area is received, and one or more of the characteristics of the joint are determined.

• 출원번호 : 18782387
• 출원인 : BECKMANN, Jan Hendrik
• 특허번호 :
• IPC : G01B-015/02(2006.01);B25J-015/00(2006.01);

A phantom for radiotherapy and/or medical imaging systems. The phantom includes one or more simulated anatomical structures including a tissue mimicking soft material. The phantom further includes a radiosensitive inclusion configured to form a bubble when exposed to radiation. The bubble is detectable via imaging with the medical imaging system.

• 출원번호 : US2024/039182
• 출원인 : ACOUSTIC RANGE ESTIMATES, LLC
• 특허번호 :
• IPC : A61N-005/10(2006.01)