Wideband antenna elements exhibit strong coupling when formed into an array, which normally degrades the impedance bandwidth, radiation pattern, and efficiency of the feed antennas. Various methods are provided herein to mitigate or reduce this coupling. For example, designing an array such that not all antennas support the lower frequency operation mitigates coupling at low frequencies where coupling is most significant. Alternatively, embedding the feeds into a high-refractive-index medium increases the electrical distance between feeds while the physical separation is kept constant.

• 출원번호 : US2025/043545
• 출원인 : CHESHIR INDUSTRIES INC.
• 특허번호 :
• IPC : H01Q-003/46(2006.01);H01Q-003/30(2006.01);H01Q-001/28(2006.01);H01Q-021/00(2006.01);H01Q-003/14(2006.01);H01Q-003/24(2006.01);H01Q-019/06(2006.01);H01Q-001/24(2006.01);

Methods of producing a product, such as methods that include irradiating a susceptor material with electromagnetic radiation, and contacting the susceptor material and a fluid to produce the product. The irradiating of the susceptor material may produce an electric current, a field, and/or generate heat, which can effect a chemical reaction of the fluid or a component thereof. Apparatuses and systems, which include a susceptor material disposed in a container.

• 출원번호 : US2025/043536
• 출원인 : QWAVE SOLUTIONS, INC.
• 특허번호 :
• IPC : B01J-019/00(2006.01);B01J-019/08(2006.01);B01J-019/12(2006.01);C25B-001/04(2021.01);B01J-008/02(2006.01);

Wideband antenna elements exhibit strong coupling when formed into an array, which normally degrades the impedance bandwidth, radiation pattern, and efficiency of the feed antennas. Various methods are provided herein to mitigate or reduce this coupling. For example, designing an array such that not all antennas support the lower frequency operation mitigates coupling at low frequencies where coupling is most significant. Alternatively, embedding the feeds into a high-refractive-index medium increases the electrical distance between feeds while the physical separation is kept constant.

• 출원번호 : 19310439
• 출원인 : Garcia, Nicolas
• 특허번호 :
• IPC : H01Q-001/52(2006.01);H01Q-015/02(2006.01);H01Q-015/14(2006.01);

A laser induced ultrasonic inspection apparatus including: a head including a light source configured to irradiates an object with pulse-shaped first laser light, a first signal generator configured to generate a pulse control signal, and a laser interferometer configured to detect vibration induced by the radiation of the first laser light; a moving stage at which the object is placed; and a second signal generator configured to generate a stage control signal, the laser interferometer including a light source configured to irradiate the object with second laser light, a light modulator, and a light receiver configured to receive the second laser light traveling via the light modulator and the object.

• 출원번호 : 19309650
• 출원인 : YAMADA, Kohei
• 특허번호 :
• IPC : G01N-029/24(2006.01);G01N-029/06(2006.01);G01N-029/12(2006.01);G01N-029/34(2006.01);G01N-029/44(2006.01);

A first problem addressed by the present invention is to provide an actinic light-sensitive or radiation-sensitive resin composition that can form patterns having excellent LWR and defect suppression. A second problem addressed by the present invention is to provide a resist film, a pattern formation method, and a method for manufacturing a device.　This actinic light-sensitive or radiation-sensitive resin composition contains a resin and a salt that contains an anion moiety represented by formula (1) and a cation moiety represented by formula (X-1) or formula (X-2).

• 출원번호 : JP2025/029931
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-025/18(2006.01);C07C-311/48(2006.01);C07C-311/53(2006.01);C07C-381/12(2006.01);C07D-211/44(2006.01);C07D-235/08(2006.01);C07D-265/06(2006.01);C07D-295/088(2006.01);C07D-307/00(2006.01);C07D-307/12(2006.01);C07D-307/33(2006.01);C07D-307/94(2006.01);C07D-309/10(2006.01);C07D-317/36(2006.01);C07D-319/20(2006.01);C07D-327/04(2006.01);C07D-327/06(2006.01);C07D-327/08(2006.01);C07D-333/46(2006.01);C07D-333/48(2006.01);C07D-333/76(2006.01);C07D-409/04(2006.01);C07D-411/06(2006.01);C08F-220/10(2006.01);C09K-003/00(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);

The invention relates to a cast film obtained from a polypropylene composition comprising a) at least 95 wt.-% (based on the overall weight of the polyolefin composition) of at least one polypropylene homopolymer PPH having a molecular weight distribution Mw/Mn measured by GPC (according to ISO 16014-4:2003 and ASTM D 6474-99) in the range of 2.8 to 3.5, a MFR2 (ISO1133, 2.16 kg load at 230 °C) between 2.5 and 5.0 g/10 min, and a sum of 2,1-insertion in the range of 0.3 to 1.5 mol% as determined by 13C nuclear magnetic resonance (NMR) spectroscopy, a melting temperature (Tm) (measured according to ISO 11357/part 3/method C2) in the range of 145°C to 160°C, a xylene cold soluble (XCS) content determined according to ISO 16152 based on the overall weight of polypropylene homopolymer of less than 1.5 wt.-%, and b) up to 5 wt.-% of one or more additives, wherein the sum of all ingredients always adds up to 100 wt.-%. The invention relates also to the use of said cast film in pharmaceutical packaging systems.

• 출원번호 : 25198129.6
• 출원인 : Borealis GmbH
• 특허번호 :
• IPC : C08F-110/06(2006.01);C08L-023/12(2006.01);B65D-075/00(2006.01);

The present invention relates to the field of gene transfer, in particular, targeted gene transfer and enzymes for use in targeted gene transfer. In particular, the present invention provides a nucleic acid encoding a fusion protein having serine integrase activity, wherein the fusion protein comprises a serine integrase consisting of a protein having at least 80% sequence identity to the large serine integrase Pa01 and a nuclear localization sequence at the C-terminus of the serine integrase. The invention further provides a fusion protein encoded by said nucleic acid as well as methods of preparing an engineered cell using the nucleic acids and/or fusion proteins of the invention. Finally, the present invention provides various pharmaceutical compositions and their use in treating a disease or disorder.

• 출원번호 : EP2025/074241
• 출원인 : CHARITÉ- UNIVERSITÄTSMEDIZIN BERLIN KÖRPERSCHAFT DES ÖFFENTLICHEN RECHTS;
• 특허번호 :
• IPC : C12N-009/22(2006.01);A61K-040/11(2025.01);A61K-048/00(2006.01);C12N-015/90(2006.01);A61K-040/10(2025.01);A61K-040/31(2025.01);C12N-005/0783(2010.01);

SOLUTION: This disclosure relates generally to a patterning structure including an underlayer and an imaging layer, as well as methods and apparatuses thereof. In particular embodiments, the underlayer enhances radiation absorptivity and/or patterning performance of the imaging layer.SELECTED DRAWING: Figure 2D

• 출원번호 : 2025140090
• 출원인 : LAM RESEARCH CORPORATION
• 특허번호 :
• IPC : G03F-007/11(2006.01);G03F-007/004(2006.01);G03F-007/09(2006.01);C23C-016/26(2006.01);

A method includes providing an ophthalmic lens having a prescribed optical power, the ophthalmic lens having a surface having a base curvature corresponding to the prescribed optical power, and exposing a material at the surface to laser radiation sufficient to locally reshape the material to form a plurality of lenslets on the surface. The lenslets each have a corresponding optical power that differs from the prescribed optical power of the ophthalmic lens.

• 출원번호 : 19310796
• 출원인 : Hones, Peter
• 특허번호 :
• IPC : G02C-007/02(2006.01);B29D-011/00(2006.01);

The present disclosure relates to a dose measurement system for a lithographic apparatus. The dose measurement system comprises: a target having a diffraction grating formed thereon, wherein the target is configured to undergo thermal expansion when illuminate irradiated with radiation, and a pitch of the diffraction grating increases with the thermal expansion of the target; a sensor configured to measure a parameter of the diffraction grating that is dependent on the pitch of the diffraction grating; and a processor configured to determine the dose of the radiation based on one or more measurements of the parameter of the diffraction grating made by the sensor.

• 출원번호 : EP2025/074295
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/00(2006.01)