According to an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (C) represented by a formula (Q1) below and an acid-decomposable resin (A), in the formula (Q1), Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of —O—, —S—, —C(═O)—, —S(═O)—, and —S(═O)2—, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, each of k1 and k2 represents an integer of 1 or more, and the group represented by —X1—W1— does not include *1—O—C(═O)—*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1, formation of a pattern excellent in CDU in ultrafine pattern formation even after a lapse of time from the preparation is enabled.

• 출원번호 : 18813980
• 출원인 : FUJIFILM Corporation
• 특허번호 :
• IPC : G03F-007/039(2006.01);G03F-007/004(2006.01);

A method for manufacturing and applying a metal oxide coating for shielding an object from particle radiation includes heating a quantity of a resin of a polyurethane system and mixing a metal oxide with the quantity of the resin of the polyurethane system to form a mixture. The method further includes mixing a quantity of a hardener of the polyurethane system with the mixture to form a metal oxide infused conformal coating (MOICC). The method further includes applying the MOICC to an object to shield the object from particle radiation and curing the MOICC.

• 출원번호 : 18814002
• 출원인 : Hayes, Robert Bruce
• 특허번호 :
• IPC : C08K-003/22(2006.01);C09D-005/32(2006.01);C09D-007/61(2006.01);C09D-175/04(2006.01);

The present application discloses an indoor optical wireless communications-oriented general geometry-based stochastic channel modeling method, which belongs to the field of wireless communication channel modeling. The method includes: setting scenario layout and frequency band related parameters; generating an object reflection cluster birth-death process matrix and random numbers for controlling a blocking effect and propagation component classification; initializing a scattering cluster and intra-cluster scatterers; updating and calculating model parameters varying with space and time; calculating a light source radiation intensity, the power distributions of object reflection and particle scattering, and an equivalent reflection coefficient; and calculating a subchannel impulse response, and determining whether a propagation component exists, to generate a final channel impulse response. The general geometry-based stochastic channel modeling method for indoor optical wireless communications of the present invention can utilize the common characteristics of the wireless frequency bands of light and the unique characteristics of the frequency bands of infrared light, visible light and ultraviolet light. By setting corresponding parameters, the established model can support different frequency bands to be flexibly applied to the simulation and performance evaluation of 6G indoor optical wireless communication systems.

• 출원번호 : 18813519
• 출원인 : WANG, Chengxiang
• 특허번호 :
• IPC : H04B-010/073(2006.01);H04B-010/114(2006.01);H04B-010/50(2006.01);H04B-017/391(2006.01);

PROBLEM TO BE SOLVED: To provide an illumination system for photodynamic therapy.SOLUTION: An illumination system 1 for photodynamic therapy includes an illumination source 2 configured to irradiate electromagnetic radiation 3 to irradiate a target surface 4 during operation, and an electronic control unit 5. The illumination source is configured to allow intensity of emitted electromagnetic radiation to change. The control unit is operably coupled to the illumination source and is configured to control operation of the illumination source according to an illumination protocol during an illumination session. The illumination protocol includes an instruction to operate the illumination source, and a mode includes a) a first mode, b) a second mode, and c) a third mode. Strength of the emitted electromagnetic radiation is lower during a dark period than during an illumination period, or the illumination source does not emit electromagnetic radiation during the dark period, while the illumination source emits electromagnetic radiation during the illumination period.SELECTED DRAWING: Figure 1

• 출원번호 : 2024142021
• 출원인 : MARUHO CO LTD
• 특허번호 :
• IPC : A61N-005/06(2006.01)

The present invention relates to radiation-curable polyurethane dispersions having a particularly high double-bond density. These polyurethane dispersions can be used independently as coating agents, or especially advantageously added to conventional polyacrylate dispersions or to radiation-curing polyurethane dispersions in order to improve the properties in use thereof.

• 출원번호 : EP2024/073645
• 출원인 : COVESTRO DEUTSCHLAND AG
• 특허번호 :
• IPC : C08G-018/22(2006.01);C08G-018/24(2006.01);C08G-018/34(2006.01);C08G-018/73(2006.01);C08G-018/75(2006.01);C08G-018/79(2006.01);C08G-018/81(2006.01);C09D-175/14(2006.01);

The invention relates to a device for determining the refractive index and/or wall thickness of an object, preferably a planar object, comprising a first transmitter for terahertz radiation and a first receiver for terahertz radiation, the first transmitter being designed to transmit terahertz radiation to the object in a first main beam direction and the first receiver being designed to receive the terahertz radiation transmitted by the first transmitter after said radiation has passed through the object. The invention also relates to a corresponding method.

• 출원번호 : EP2024/073735
• 출원인 : SIKORA AG
• 특허번호 :
• IPC : G01B-011/06(2006.01)

The present invention provides an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) which comprises: a repeating unit (a-1) that contains at least a phenolic hydroxyl group and an aromatic ring in which two or more aromatic rings are fused together or an aromatic ring in which two or more aromatic rings are linked via a single bond; and a repeating unit (a-2) that contains at least an aromatic ring in which two or more aromatic rings are fused together or an aromatic ring in which two or more aromatic rings are linked via a single bond, and a structure which is protected by a group from which a phenolic hydroxyl group or a carboxyl group is detachable by the action of acid. In the resin (A), the sum of the repeating units (a-1) and the repeating units (a-2) is not less than 80 mol% of the sum of all repeating units. The resin (A) has a weight-average molecular weight of 5000 or less.

• 출원번호 : JP2024/030065
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);C08F-212/04(2006.01);C08F-234/00(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);

• 출원번호 : JP2024/030066
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-025/18(2006.01);C07C-309/64(2006.01);C07C-309/73(2006.01);C07C-381/12(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);

A product having ultraviolet radiation protection and antimicrobial protection has a quantity of synthetic material, a quantity of zinc oxide particles with each particle having a surface, the quantity of zinc oxide particles in the range of 0.05 percent to 0.10 percent, and a quantity of a reactive group for modifying each surface of each zinc oxide particle, the quantity of the reactive group for incorporating the quantity of zinc oxide particles into the quantity of synthetic material prior to the quantity of synthetic material being formed into a fiber.

• 출원번호 : 18813445
• 출원인 : Kramer, Robert B.
• 특허번호 :
• IPC : C09C-001/04(2006.01);C01G-009/02(2006.01);C01G-009/03(2006.01);C08K-003/22(2006.01);C08K-009/02(2006.01);C08K-009/04(2006.01);C08K-009/06(2006.01);C09C-003/12(2006.01);C11D-003/12(2006.01);D01F-001/10(2006.01);D06M-011/44(2006.01);D06M-011/46(2006.01);D06M-011/50(2006.01);D06M-011/70(2006.01);D06M-013/288(2006.01);D06M-013/325(2006.01);D06M-013/368(2006.01);D06M-013/432(2006.01);D06M-013/51(2006.01);D06M-023/08(2006.01);D06M-101/06(2006.01);D06M-101/32(2006.01);D06M-101/34(2006.01);

Vertical semiconductor devices with deep wells and associated fabrication methods are disclosed herein. A disclosed process for forming a semiconductor device includes forming, on a drift region having a first conductivity type, a deep well region for the semiconductor device. The deep well region can be formed by an implant. The deep well region has a second conductivity type. The deep well region of the second conductivity type leaves a portion of the surface of the drift region exposed. The process also includes epitaxially forming a semiconductor region that extends from the surface of the drift region to above the deep well region for the semiconductor device. The semiconductor region can be used as at least a part of the main operational current path of the semiconductor device when the semiconductor device is finished and is devoid of implant damage from the implant.

• 출원번호 : 18813547
• 출원인 : Snyder, David Lee
• 특허번호 :
• IPC : H01L-023/552(2006.01);H01L-029/06(2006.01);H01L-029/66(2006.01);H01L-029/78(2006.01);