Provided is a fusing fluid for the print and fuse manufacture of three-dimensional objects from particulate build material, wherein the fusing fluid comprises or consists of a non-aqueous carrier liquid; a radiation absorber; and optionally a dispersant and/or one or more further additives; wherein the fusing fluid has a boiling range lying within a temperature window of 150 to 350 °C at normal pressure of 101.3 kPa with a boiling range width of less than or equal to 70 °C, wherein the boiling range is defined by a boiling onset temperature Tb_onset and a boiling endset temperature Tb_endset determined according to the method described in the specification, and wherein the boiling range width is Tb_endset minus Tb_onset. Further provided are: a materials kit comprising the fusing fluid and a particulate build material, optionally wherein the particulate build material comprises a flame retardant component; a method and apparatus for the print and fuse manufacture of a three-dimensional object utilizing the materials kit; use of the fusing fluid or of the materials kit in a print and fuse method; and a resulting object having improved flame retardancy.

• 출원번호 : EP2025/073563
• 출원인 : STRATASYS POWDER PRODUCTION LTD.
• 특허번호 :
• IPC : B29C-064/165(2017.01);B33Y-070/00(2020.01);B33Y-070/10(2020.01);

A far infrared radiation (FIR) yarn composition that may be used to create various textiles having multiple benefits for the human body and created from fiber made using a masterbatch and an extrusion process, wherein the FIR yarn includes one or more FIR fibers including copper, graphene, and a first textile material; and one or more textile fibers containing a second textile material; wherein the one or more FIR fibers are interwoven with the one or more textile fibers to form the FIR yarn.

• 출원번호 : US2025/042487
• 출원인 : IDEAVILLAGE PRODUCTS CORP.;GULINO, David;
• 특허번호 :
• IPC : D02G-003/44(2006.01);D01F-001/10(2006.01);

A resist composition comprising a hypervalent bismuth compound having formula (1) and a solvent is provided. When processed by photolithography using high-energy radiation, the resist composition exhibits a high sensitivity and resolution. The non-chemically-amplified resist composition exhibits a high sensitivity and resolution when processed by photolithography using high-energy radiation, typically EB and EUV lithography.

• 출원번호 : 19302493
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07F-009/94(2006.01);G03F-007/00(2006.01);G03F-007/32(2006.01);

A control device used in a CT scan that acquires a plurality of pieces of projection data of a subject by a photon counting type radiation detector, the control device includes at least one processor configured to specify a scan region and an examination purpose of the subject, acquire a scan parameter based on the specified scan region and examination purpose, and present the acquired scan parameter as part of a scan condition.

• 출원번호 : 19303325
• 출원인 : FUJIFILM Corporation
• 특허번호 :
• IPC : A61B-006/00(2024.01);A61B-006/03(2006.01);A61B-006/42(2024.01);

The disclosure relates to a 5th generation (5G) or pre-5G communication system for supporting higher data transfer rates than 4th generation (4G) communication systems, such as long term evolution (LTE). An antenna device is provided. The antenna device includes a first feeding line for a first polarization, and an antenna. The antenna includes a radiation face and at least one corresponding face on which the first polarization is formed. An angle formed by the at least one corresponding face and a direction of the first polarization may be smaller than an angle formed by the at least one corresponding face and a direction of a polarization perpendicular to the first polarization.

• 출원번호 : 19302856
• 출원인 : CHOI, Dabin
• 특허번호 :
• IPC : H01Q-021/24(2006.01);H01Q-001/24(2006.01);H01Q-009/04(2006.01);

A radiation detection device and medical imaging equipment. The radiation detection device includes a lifting module. The lifting module includes a base, a first lifting unit, and a second lifting unit. The first lifting unit includes a first lifting component extending along a Z-axis, which is movably connected to the base along the Z-axis. The second lifting unit includes a driving component extending along the Z-axis and a second lifting component connected to the driving component, which is configured to drive the second lifting component to move along the Z-axis. The direction of the Z-axis is perpendicular to the connection surface of the base, wherein the connection surface of the base is the surface of the base connected to the first lifting component and the driving component.

• 출원번호 : 19302269
• 출원인 : Zhang, Chengzhe
• 특허번호 :
• IPC : A61B-006/00(2024.01)

A resist composition comprising a hypervalent iodine compound, a carboxylic acid derivative, and a solvent is provided. When processed by photolithography using high-energy radiation, the resist composition exhibits a high sensitivity and improved maximum resolution. The non-chemically-amplified resist composition exhibits a high sensitivity and improved maximum resolution when processed by photolithography using high-energy radiation, typically EB and EUV lithography.

• 출원번호 : 19302461
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C08F-020/22(2006.01);G03F-007/00(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);G03F-007/09(2006.01);

PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition that can form a film excelling in development adhesion and curing adhesion.SOLUTION: A radiation-sensitive composition comprising (A-1) a polymer including a structural unit having a group represented by the formula (1) or an acid-dissociable group, (B-1) a photoacid generator, (C-1) a solvent, and (E) a compound having at least one functional group (X) selected from the group consisting of an alkoxysilyl group, an oxetanyl group, a mercapto group, a (meth)acryloyl group, a vinyl group, and an amino group, and having a cardo structure, wherein in the formula (1), R1, R2, and R3 each represent a hydrogen atom, a halogen atom, a hydroxy group, a C1-6 alkoxy group, a C1-10 alkyl group, or a phenyl group, provided that at least one of R1, R2, and R3 is a C1-6 alkoxy group.SELECTED DRAWING: None

• 출원번호 : 2025135947
• 출원인 : JSR CORP
• 특허번호 :
• IPC : G03F-007/027(2006.01);G03F-007/075(2006.01);G03F-007/039(2006.01);G03F-007/038(2006.01);G03F-007/004(2006.01);G03F-007/023(2006.01);C08F-020/10(2006.01);C08F-012/02(2006.01);C08F-020/04(2006.01);C07F-007/18(2006.01);

Apparatus and methods are described for treating an occlusion in a blood vessel. A catheter is inserted into the blood vessel. An irradiation unit is driven to emit probing radiation such that the probing radiation is directed toward the occlusion, and returning radiation which is returned in response to the probing radiation impacting the occlusion, is detected. A composition of at least a portion of the occlusion is derived based on a signature that is indicative of the composition within the returning radiation. The irradiation unit is driven to irradiate the portion of the occlusion by emitting treatment radiation having a set of irradiation parameters. The set of irradiation parameters is determined to modulate between a photoacoustic effect of the treatment radiation and a photothermal effect of the treatment radiation, based on the composition of the portion of the occlusion. Other applications are also described.

• 출원번호 : 19302375
• 출원인 : PREISS, Assaf
• 특허번호 :
• IPC : A61B-018/26(2006.01);A61B-017/00(2006.01);A61B-018/00(2006.01);A61B-018/22(2006.01);

A method includes determining whether a variation in probe radiation intensity meets a stability criterion; directing the probe radiation through a probe, when the probe is disposed at a first position, defining a first path length L1 of the probe radiation through the fluid sample; measuring a transmitted intensity I1 of the probe radiation after passing through the fluid sample when the probe is disposed at the first position; directing the probe radiation through the probe when the probe is disposed at a second position, defining a second path length L2 of the probe radiation through the fluid sample; measuring a transmitted intensity I2 of the probe radiation after passing through the fluid sample when the probe is disposed at the second position; and determining a concentration C of a material in the fluid sample based upon L1, I1, L2, and I2, when the stability criterion is met.

• 출원번호 : 19302645
• 출원인 : Repligen Corporation
• 특허번호 :
• IPC : G01J-003/42(2006.01);G01J-003/10(2006.01);G01N-021/25(2006.01);G01N-021/31(2006.01);