A method for detecting a component including a concealed pattern includes: detecting infrared electromagnetic radiation reflected or emitted by a component including a first pattern, the component including: a substrate; the first pattern disposed over at least a portion of the substrate; an optional primer layer disposed between at least a portion of the substrate and at least a portion of the first pattern; and a first visibly opaque layer including an infrared transparent pigment, the first visibly opaque layer disposed over at least a portion of the first pattern; and comparing the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength to the reflectivity and/or absorbance by the primer layer and/or the substrate at the same wavelength.

• 출원번호 : 19288775
• 출원인 : Duarte, Nicolas B.
• 특허번호 :
• IPC : G06K-019/06(2006.01);B05D-005/06(2006.01);B05D-007/00(2006.01);G06K-007/12(2006.01);

An extreme ultraviolet (EUV) mask includes a substrate, a reflective multilayer stack on the substrate, and a multi-layer capping feature on the reflective multilayer stack. The multi-layer capping feature includes a first capping layer including a material containing an element having a first carbon solubility and a second capping layer including a material containing an element having a second carbon solubility. The first carbon solubility is different from the second carbon solubility. An element of the material of the first capping layer and an element of the material of the second capping layer have extinction coefficients for EUV radiation having a wavelength of 13.5 nm that are different.

• 출원번호 : 19288643
• 출원인 : LEE, Wei-Hao
• 특허번호 :
• IPC : G03F-001/24(2012.01);G03F-007/00(2006.01);H01L-021/033(2006.01);

The present invention is applicable to the technical field of nuclear reactors, and discloses a filtering device and filtering method for a lead-bismuth cooled pool-type reactor. The filtering device comprises a fixed assembly, a branch pipe, and a filtering assembly; the fixed assembly is arranged on the side surface of a main channel, and the filtering assembly is detachably mounted in the branch pipe; and the branch pipe is connected to the side surface of the main channel by means of the fixed assembly, and the filtering assembly performs filtration and purification in the branch pipe, without requiring the filtering assembly itself to provide filtering power. The filtering device as a whole can be arranged in the pool-type reactor, ensuring the integrity of the reactor body boundary; and the filtering assembly has a simple structure, is convenient to mount and replace, can operate for a long time in the reactor, ensures a long service life of the filtering device, and reduces the replacement cycle of the filtering device.

• 출원번호 : CN2025/112277
• 출원인 : CHINA NUCLEAR POWER TECHNOLOGY RESEARCH INSTITUTE CO.,LTD;CGN POWER CO.,LTD.;
• 특허번호 :
• IPC : B01D-035/00(2006.01);B01D-037/00(2006.01);B01D-035/30(2006.01);G21C-015/14(2006.01);G21C-019/31(2006.01);

A method for providing control data for an additive manufacturing device has: a first step (S1) of accessing model data of at least one section of the object; a second step (S2) of generating at least one data model, the beam being moved along a trajectory, in each case without interrupting the supply of radiation energy to the layer, each of the trajectories having a number of first sub-trajectories (74a, 84) and a number of second sub-trajectories (75, 85), the angle formed between a sub-trajectory and the sub-trajectory following said sub-trajectory being greater than 90° and less than or equal to 180°, the beam being moved alternatingly along first and second sub-trajectories, a respective transition trajectory being specified between pairs of sub-trajectories, a value for the movement speed of the beam being specified for the transition trajectories, said value differing from the average value along the sub-trajectory connected to the respective transition trajectory; and a third step (S3) of providing control data for the manufacturing process.

• 출원번호 : EP2025/072280
• 출원인 : EOS GMBH ELECTRO OPTICAL SYSTEMS
• 특허번호 :
• IPC : B22F-010/28(2021.01);B22F-010/36(2021.01);B22F-010/366(2021.01);B29C-064/393(2017.01);B33Y-030/00(2015.01);B33Y-050/02(2015.01);B33Y-010/00(2015.01);G05B-019/4097(2006.01);

An imaging sensor includes a radiation sensor. An imaging controller is configured to: (i) generate an imaging-datastream based on the sensed phenomena and (ii) transmit, to a central controller, the imaging-datastream. The central controller is configured to: receive the imaging-datastream; generate, from the imaging-datastream, a high-contrast videostream in which surgical tools and vascular tissue is represented with a dark color and in which surrounding tissue is represented with a light color, the dark color being darker than the light color; and transmit, to an augmented-reality controller, the high-contrast videostream. The augmented-reality controller is configured to: (i) receive the high-contrast videostream and (ii) instruct a head-worn display to render the high-contrast videostream such that the surgical tools and vascular tissue is rendered with the dark color. The head-worn display is configured to render the high-contrast videostream such that the surgical tools and vascular tissue is rendered with the dark color.

• 출원번호 : 19288009
• 출원인 : Gurevich, Sergey
• 특허번호 :
• IPC : A61B-034/10(2016.01);A61B-034/00(2016.01);A61B-034/20(2016.01);A61B-090/00(2016.01);

Coated nanotubes and bundles of nanotubes are formed into membranes useful in optical assemblies in EUV photolithography systems. These optical assemblies are useful in methods for patterning materials on a semiconductor substrate. Such methods involve generating, in a UV lithography system, UV radiation. The UV radiation is passed through a coating layer of the optical assembly, e.g., a pellicle assembly. The UV radiation that has passed through the coating layer is passed through a matrix of individual nanotubes or matrix of nanotube bundles. UV radiation that passes through the matrix of individual nanotubes or matrix of nanotube bundles is reflected from a mask and received at a semiconductor substrate.

• 출원번호 : 19288869
• 출원인 : LEE, Wei-Hao
• 특허번호 :
• IPC : G03F-007/00(2006.01);G03F-001/62(2012.01);

Infrared radiation, and specifically short-wave infrared radiation, may be used as a heat source for an active thermography process in the context semiconductor inspection. Ultrasonic acoustic waves may also be used as a heat source for an active thermography process in the context of semiconductor inspection. Short-wave infrared interference may be used to detect dynamic temperature changes at internal surfaces of a semiconductor, and specifically near a semiconductor direct-bond interface. Either of the short-wave infrared radiation as the heat source or the ultrasonic acoustic waves as the heat source may be combined with the use of short-wave infrared interference to detect dynamic temperature changes, which allows for improved detection resolution. Short-wave infrared interference may also be used to directly detect subsurface voids at the semiconductor direct-bond interface. The short-wave infrared interference may or may not require thermal perturbation.

• 출원번호 : IB2025/057842
• 출원인 : ORBOTECH LTD.
• 특허번호 :
• IPC : G01N-025/72(2006.01);G01N-025/18(2006.01);G01N-033/00(2006.01);H01L-021/66(2006.01);

The invention relates to a window having a first pane (2; 3) and a second pane (3; 20) spaced apart therefrom, wherein the first pane (2) has a first side (4) facing the second pane (3) and the second pane (3) has a second side (5) facing the first pane (2), wherein a cavity (6; 22) is present between the two mutually facing sides (4, 5), which cavity is closed by means of an edge composite (7) and is filled with a gaseous medium (5), wherein the two panes (2, 3; 20) are transparent for radiation from the visible wavelength range and radiation from the infrared range, wherein the edge composite (7; 21) has a photovoltaic cell (8; 25) which converts IR radiation at a predefined wavelength from the infrared range into electrical energy, wherein the first pane (2) has a first hologram (10) and the second pane (3) has a second hologram (11), wherein the two holograms (10, 11) are designed such that the IR radiation (L1) which has the predefined wavelength and is incident on the first pane (2) at a predefined first angle of incidence (α1) is first deflected at one of the two holograms (10, 11) to the other hologram (10, 11) in such a way that the deflected IR radiation (L2) is incident on the other of the two holograms (10, 11) at a second angle of incidence (α3) which is greater than the first angle of incidence (α1) and is deflected from said hologram in such a way that it is incident in the cavity (6) at a first angle of reflection (β3) which is greater than the second angle of incidence (α3), and propagates in the cavity to the photovoltaic cell (8; 25).

• 출원번호 : EP2025/072222
• 출원인 : CARL ZEISS JENA GMBH
• 특허번호 :
• IPC : E06B-003/66(2006.01);E06B-009/24(2006.01);H02S-020/26(2014.01);H10F-019/80(2025.01);H10F-077/42(2025.01);G03H-001/22(2006.01);

A reactor for sterilizing a stream of fluid comprises of a frame structure having a longitudinal dimension and a plurality of UV plate reactors that are removably insertable into the frame structure in a series extending along the longitudinal dimension of the frame structure, each of the plurality of UV plate reactors including a single channel or a plurality of multiple channels of a selected diameter into which the stream of fluid is transported, and at least one ultraviolet light source having a selected radiant flux is coupled to one or more of the channels. The diameter of the plurality of channels and the radiant flux of the ultraviolet light source are selected so as to provide a precise dosage of ultraviolet radiation to the stream of fluid in a confined space of the plurality of channels so as to obtain sterilization of the stream of fluid.

• 출원번호 : 19288111
• 출원인 : Dover Brook Associates
• 특허번호 :
• IPC : A61L-002/10(2006.01)

An RF infrastructure sentry system includes one or more sensors configured to detect that an object has entered an area of concern proximate to an RF radiation source and an RF mitigation system operatively connected to the one or more sensors. The RF mitigation system includes an electrical input operatively connected to a power supply for the RF radiation source; an electrical output operatively connected to the RF radiation source; a relay disposed on an electrical path between the electrical input and the electrical output and configured to selectively connect or disconnect the electrical input and the electrical output through the electrical path; and a processor operatively connected to the relay and configured, at least in response to detection by the one or more sensors that the object has entered the area of concern, to open the relay to temporarily interrupt power to the RF radiation source.

• 출원번호 : 19288623
• 출원인 : Waterford Consultants, LLC
• 특허번호 :
• IPC : G08C-017/02(2006.01)