A sulfonium salt monomer having the formula (A). The sulfonium salt monomer can be used for a chemically amplified resist composition having a high solvent solubility, a high sensitivity, and a high contrast, and being improved in lithography properties such as EL, LWR, CDU, and DOF, particularly when processed by photolithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, an electron beam (EB), or EUV.

• 출원번호 : 19285684
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-381/12(2006.01);C08F-020/10(2006.01);G03F-007/00(2006.01);G03F-007/039(2006.01);

Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and/or to improve the patterning performance of organometallic photoresist coatings.

• 출원번호 : US2025/039851
• 출원인 : INPRIA CORPORATION
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07F-009/40(2006.01);C07F-007/22(2006.01);G03F-007/20(2006.01);

A method for fabricating semiconductor devices is disclosed. In one aspect, a method for fabricating semiconductor devices comprises subsequently to exposing a first substrate placed on a holder with a radiation source, unloading the first substrate from the holder, exposing the holder with the radiation source to generate a reference signal; determining a level of the reference signal that is substantially proportional to an intensity of the radiation source, and prior to loading a second substrate, adjusting the intensity of the radiation source in response to determining that the level of the reference signal does not satisfy a predefined condition.

• 출원번호 : 19285534
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/00(2006.01);H01L-021/027(2006.01);H01L-021/66(2006.01);

A method for constructing an artificial water-conducting channel through pulse hydraulic fracturing of drainage boreholes in a roof aquifer includes constructing an artificial water-conducting channel in a sandstone fissure aquifer through arrangement of drainage boreholes and pulse hydraulic fracturing, which improves the permeability of dense and intact sandstone rock masses. The artificial water-conducting channel formed through arrangement of drainage boreholes is connected to discontinuous water-bearing areas and water-rich areas, and water from roof sandstone fissures is diverted to the drainage boreholes through the artificial water-conducting channel, thereby achieving effective drainage of the boreholes and expanding a radiation range of single-borehole drainage. The method not only avoids the arrangement of excessive drainage boreholes and significantly improves the drainage efficiency of prospecting and drainage boreholes, but also facilitates advance drainage during the mining process. The method enables effective control of mine water hazards, thereby ensuring safe production of the mine.

• 출원번호 : 19285524
• 출원인 : CHINA UNIVERSITY OF MINING AND TECHNOLOGY
• 특허번호 :
• IPC : E21C-037/12(2006.01);E21C-045/04(2006.01);E21F-016/02(2006.01);

The onium salt consists of a cation having the formula (1A) and an anion having the formula (1B). The chemically amplified resist composition comprises the onium salt. The resist composition exhibits a high sensitivity, high resolution, improved lithography properties including EL, LWR, CDU and DOF, and collapse resistance, when processed by lithography using high-energy radiation such as deep UV, EB, or EUV.

• 출원번호 : 19285183
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : C07C-381/12(2006.01);G03F-007/00(2006.01);G03F-007/004(2006.01);G03F-007/039(2006.01);

A heat treatment system (100) for solid bulk material in pieces having a tower configuration and mainly comprising: - a plurality of belt conveyors (11-15) for the dry transportation of the bulk material, which belt conveyors have a stacked arrangement one above the other and thermally in series, each of said belt conveyors being configured to transport the bulk material transversely to the stacking direction; - one or more heater devices (31-35) arranged at each belt conveyor of said series to heat, e.g. by radiation, the bulk material transported thereupon; - a plurality of material discharging conduits (21-25), each interposed between an upstream belt conveyor and a downstream belt conveyor adjacent thereto in said series arrangement.

• 출원번호 : IB2025/057737
• 출원인 : MAGALDI POWER S.P.A.
• 특허번호 :
• IPC : C21B-013/00(2006.01);C22B-001/16(2006.01);C22B-001/212(2006.01);F26B-017/04(2006.01);F27B-009/06(2006.01);F27B-009/10(2006.01);F27B-009/14(2006.01);F27B-009/18(2006.01);F27B-009/24(2006.01);F27B-009/36(2006.01);

A sulfonium salt monomer having the formula (A). The sulfonium salt monomer can be used for a chemically amplified resist composition having a high solvent solubility, a high sensitivity, and a high contrast, and being improved in lithography properties such as EL, LWR, CDU, and DOF, particularly when processed by photolithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, an electron beam (EB), or EUV.

• 출원번호 : 19285660
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : C08F-220/22(2006.01);C08F-212/14(2006.01);C08F-212/32(2006.01);C08F-220/18(2006.01);C08F-220/26(2006.01);G03F-007/004(2006.01);G03F-007/039(2006.01);

A system may be configured to extract useful products from raw materials. Some systems include (1) a wet-grinding apparatus that includes (a) a conveyance for receiving and directing a slurry containing carrier liquids with suspended raw materials, (b) a high torque motor, (c) a motor drive operably coupled to be driven by the high torque motor (d) a set of flat grinding disks that include at least one rotor disk that is operably coupled to be driven by the motor drive, the set configured, when the at least one rotor disk is driven by the motor drive, to accept the slurry from the conveyance, to grind the suspended raw materials, and to discharge the slurry, and (2) a microwave with a microwave emitter configured to emit microwave radiation toward the slurry at least one of before, while, or after the slurry is ground by the wet-grinding apparatus.

• 출원번호 : 19285278
• 출원인 : ROUSE, Michael W.
• 특허번호 :
• IPC : B01D-011/02(2006.01);A01N-065/08(2009.01);A01N-065/12(2009.01);A01N-065/20(2009.01);A61L-002/10(2006.01);A61L-002/26(2006.01);B01D-021/26(2006.01);B01D-021/28(2006.01);B02C-007/02(2006.01);B02C-007/12(2006.01);B02C-021/00(2006.01);B02C-023/10(2006.01);B02C-023/36(2006.01);C10G-001/04(2006.01);

Embodiments pertain to an antenna arrangement configured to transmit electromagnetic (EM) radiation towards a scene and/or configured to receive EM radiation from the scene. The antenna apparatus may comprise a first antenna arranged at a first location and configured to emit first EM radiation in a first main beam direction that lies within a first plane and within an azimuth plane that is perpendicular to the first plane; and a second antenna arranged at a second location spatially separated from the first location and configured to emit second EM radiation in a second main beam direction such that, during EM emission, the first EM radiation and the second EM radiation propagate towards each to result in a radiation pattern comprising radiation energy that extends in the azimuth plane in a direction that is orthogonal to the first and the second beam directions.

• 출원번호 : IB2025/057697
• 출원인 : ELBIT SYSTEMS EW AND SIGINT- ELISRA LTD
• 특허번호 :
• IPC : H01Q-021/28(2006.01);H01Q-001/36(2006.01);H01Q-001/38(2006.01);H01Q-009/04(2006.01);

The present application provides an electronic device. The electronic device comprises a first housing and a second housing which are foldable, and an antenna. The antenna uses a conductive portion of a frame of a housing as a radiator. When the electronic device is in a closed state, a cavity is formed between a first metal layer located on the first housing and a second metal layer located on the second housing. Resonance generated in the cavity by coupling of the antenna has little impact on radiation of the antenna, and the antenna still has good radiation characteristics.

• 출원번호 : CN2025/111106
• 출원인 : HUAWEI TECHNOLOGIES CO., LTD.
• 특허번호 :
• IPC : H04M-001/02(2006.01);H01Q-001/36(2006.01);