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  • 504984

    us

    The present invention falls within the area of well logging to evaluate formations in oil and gas producing fields. Particularly, the present invention describes a method for generating synthetic T1-T2 maps from marginal distributions of nuclear magnetic resonance logging tools, wherein the method comprises: decomposing marginal distributions of T1 and T2 relaxation times into an initial sum of log-normal functions with the same amplitudes and different means and standard deviations; setting the initial amplitudes, means and standard deviations so that the sum of log-normal functions corresponds to the marginal distributions of T1 and T2; and using the amplitudes, means and standard deviations set in a sum of two-dimensional log-normal functions to generate a synthetic T1-T2 map.
    • 출원번호 : 18644857
    • 출원인 : de Oliveira, Lucas Abreu Blanes
    • 특허번호 :
    • IPC : G01V-003/38(2006.01);G01V-003/32(2006.01);
  • 504983

    us

    An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has improved lithography properties including sensitivity, acid diffusion control, MEF, and LWR when processed by photolithography using high-energy radiation. The resist composition having a high solvent solubility and a high sensitivity and being improved in lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV; and a pattern forming process using the resist composition.
    • 출원번호 : 18644731
    • 출원인 : Shin-Etsu Chemical Co., Ltd.
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);C07C-025/18(2006.01);C07C-043/225(2006.01);C07C-309/12(2006.01);C07C-381/12(2006.01);C07D-311/86(2006.01);C07D-317/72(2006.01);C07D-319/08(2006.01);C07D-321/12(2006.01);C07D-323/00(2006.01);C07D-327/06(2006.01);C07D-327/08(2006.01);C07D-333/54(2006.01);C07D-333/76(2006.01);C07D-411/12(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);
  • 504982

    us

    An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.
    • 출원번호 : 18644458
    • 출원인 : TRUMPF Lasersystems for Semiconductor Manufacturing SE
    • 특허번호 : 12171054
    • IPC : H05G-002/00(2006.01);G03F-007/00(2006.01);
  • 504981

    us

    Systems may include a heater including a plurality of heating elements that may include a first heating element configured to generate heat based on a first current, and a second heating element configured to generate heat based on a second current. Systems may further include an electromagnetic (EM) radiation reducing device configured to cancel electromagnetic emissions from the heater. The EM radiation reducing device may include a first EM radiation reduction element positioned adjacent to a first side of the heater, and a second EM radiation reduction element positioned adjacent to a second side of the heater, where the first and second EM radiation reduction elements have geometries configured based, at least in part, on the heater.
    • 출원번호 : 18645007
    • 출원인 : Sauna Works Inc. (aka Far Infrared Sauna Technology Co.)
    • 특허번호 :
    • IPC : H05B-006/44(2006.01);A61H-033/06(2006.01);H01F-027/36(2006.01);H05B-003/26(2006.01);H05B-006/10(2006.01);
  • 504980

    us

    Targetry coupled separation refers to enhancing the production of a predetermined radiation product through the selection of a target (including selection of the target material and the material's physical structure) and separation chemistry in order to optimize the recovery of the predetermined radiation product. This disclosure describes systems and methods for creating (through irradiation) and removing one or more desired radioisotopes from a target and further describes systems and methods that allow the same target to undergo multiple irradiations and separation operations without damage to the target. In contrast with the prior art that requires complete dissolution or destruction of a target before recovery of any irradiation products, the repeated reuse of the same physical target allowed by targetry coupled separation represents a significant increase in efficiency and decrease in cost over the prior art.
    • 출원번호 : 18644443
    • 출원인 : Czerwinski, Ken
    • 특허번호 :
    • IPC : G21G-001/02(2006.01);B01D-011/02(2006.01);B01D-011/04(2006.01);B01D-015/40(2006.01);G21C-019/42(2006.01);G21G-001/00(2006.01);G21G-001/08(2006.01);
  • 504979

    us

    A radiation effects testing system that includes a sample test housing comprising a housing body and a sample chamber within the housing body and a neutron generator comprising a beam accelerator configured to generate an ion beam, a target chamber, and a beamline extending from the beam accelerator to the target chamber. The sample test housing and target chamber are each housed in a bunker comprising a bunker floor and one or more bunker walls, water is positioned in the bunker forming a water pool, and the sample test housing and the target chamber are positioned in the water pool.
    • 출원번호 : 18645058
    • 출원인 : SHINE Technologies, LLC
    • 특허번호 :
    • IPC : G01N-023/222(2006.01);G01N-023/2204(2006.01);
  • 504978

    us

    An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.
    • 출원번호 : 18644458
    • 출원인 : Lambert, Martin
    • 특허번호 :
    • IPC : H05G-002/00(2006.01);G03F-007/00(2006.01);
  • 504977

    us

    A wearable device includes a radio-frequency identification (RFID) tag having a memory that stores identification information. The wearable device also has a power harvesting circuit configured to harness power from electromagnetic radiation. Further, the wearable device has a sensor coupled to the power harvesting circuit and configured to utilize the power to monitor a condition of the wearable device. Even further, the wearable device has a microcontroller coupled to the sensor and configured to write data indicative of the condition to the memory of the RFID tag, wherein the RFID tag is configured to transmit the identification information and the data in response to receipt of the electromagnetic radiation from an RFID reader.
    • 출원번호 : 18645185
    • 출원인 : Yeh, Wei Cheng
    • 특허번호 :
    • IPC : G06K-007/10(2006.01);G06K-019/07(2006.01);
  • 504976

    us

    A radiation imaging apparatus includes a radiation detector configured to be subjected to an incident radiation to obtain a radiation image, and controllers configured to acquire radiation dose information, acquire imaging condition information for radiation imaging for subjecting the radiation detector to the incident radiation for up to a target radiation dose to acquire a radiation image, and issue, in a case where, after a start of the radiation imaging based on the imaging condition information, radiation dose information acquired by a predetermined timing does not satisfy a predetermined condition, a notification for stopping the radiation irradiation by a radiation generation apparatus so that the radiation irradiation by the radiation generation apparatus stops before the incident radiation dose reaches the target radiation dose, wherein the predetermined timing is a timing determined based on radiation irradiation time set in the radiation generation apparatus.
    • 출원번호 : 18645123
    • 출원인 : MIURA, RYOSUKE
    • 특허번호 :
    • IPC : G01T-001/02(2006.01);G01T-001/24(2006.01);G01T-001/29(2006.01);
  • 504975

    wo

    The invention relates to a detection device configured to detect infrared radiation at a predetermined operating temperature, comprising at least one pixel produced by a stack of layers on a substrate in a first direction normal to said substrate, said pixel comprising an absorption heterostructure comprising at least: a first planar absorption structure having a first maximum valence band value; and a second planar absorption structure adjacent to the first planar absorption structure, said second planar absorption structure having a second maximum valence band value distinct from the first maximum valence band value. The thickness of each of the first and second planar absorption structures is selected so as to create at least one interface electric field at the interface between the second planar absorption structure and the first planar absorption structure, said interface electric field being oriented in the first direction.
    • 출원번호 : EP2024/061202
    • 출원인 : COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES;LYNRED;
    • 특허번호 :
    • IPC : G01J-005/20(2006.01);H01L-027/146(2006.01);H01L-031/0352(2006.01);H01L-031/101(2006.01);