The invention relates to a protective label for a container (200), having: - a flat barrier layer (103) which produces a barrier function against the passage of a fluid and/or electromagnetic radiation, - a first label section (101) which is designed to be secured to a first container section (201) of the container (200), and - a second label section (102) which adjoins the first label section (101) along a first direction (104) and which is designed to be secured to a second container section (202) of the container (200), wherein the first container section (201) and the second container section (202) are oriented at an angle to each other, and the second label section (102) has a plurality of label fingers (106, 107, 108) which can be tilted relative to one another. Each of the label fingers (106, 107, 108) has an adhesive region (111) at least at one end (109) which faces away from the first label section (101) along the first direction (104), and the label fingers (106, 107, 108) are designed to cover the second container section (102) when the label fingers are applied.

• 출원번호 : EP2024/064157
• 출원인 : SCHREINER GROUP GMBH &CO. KG;
• 특허번호 :
• IPC : G09F-003/02(2006.01);G09F-003/10(2006.01);

The invention relates to a substrate with a mark consisting of microscopic metallurgical structures (3) arranged randomly on the surface of the substrate and having at least one physical and/or chemical property different from the rest of the substrate. At least one structure comprises an element such that exposing the mark to radiation or to an external electrical or magnetic field or to a chemical attack or to mechanical, thermal or electrical stress induces a temporary or permanent change of at least one physical or chemical property of the structure. The structures may be a different first alloy (31) and second alloy (32). The alloy 31 changes colour in a stable and definitive manner after exposure to laser radiation while the alloy 32 has a high reflectivity and is therefore stable to laser exposure.

• 출원번호 : IB2024/055025
• 출원인 : UNIVERSITÉDE GENEVE;
• 특허번호 :
• IPC : B42D-025/305(2014.01);B42D-025/36(2014.01);B42D-025/373(2014.01);B42D-025/41(2014.01);B42D-025/445(2014.01);

Described herein, are methods of determining an absolute risk reduction (AAR) of disease progression in a subject. Specifically, the present disclosure provides, among other things, methods for determining AAR in a subject receiving androgen deprivation therapy (ADT) and radiotherapy (RT) compared to RT alone where the absolute risk reduction is a measure of the likelihood of metastasis.

• 출원번호 : US2024/030876
• 출원인 : MYRIAD GENETICS, INC.
• 특허번호 :
• IPC : G16B-020/00(2019.01);C12Q-001/6886(2018.01);

A far field radiation pattern is determined for a multi-element antenna array (1) comprising a plurality of antenna elements (2a, 2b) disposed in a first plane (6) using test apparatus comprising a support member (4) for holding the multi-element array (1) and a movable probe (3) having an aperture configured to be movable in a second plane (5) parallel to the first plane (6). A distance between the first plane (6) and the second plane (5) is less than a quarter of a wavelength at an operating frequency of the multi-element antenna array. The movable probe tis caused to radiate electromagnetic energy from the aperture and is moved in a determined trajectory in the second plane (5). A respective measurement of amplitude and phase of electromagnetic energy received by the multi-element antenna array is taken at each of a plurality of positions on the determined trajectory. The far field radiation pattern is determined from the respective measurements and from a pre-determined radiation pattern for at least one antenna element of the plurality of antenna elements.

• 출원번호 : 24177807.5
• 출원인 : Cambium Networks Ltd
• 특허번호 :
• IPC : G01R-029/10(2006.01)

• 출원번호 : 24177724.2
• 출원인 : Sidel Participations
• 특허번호 :
• IPC : B29C-049/42(2006.01);B29C-049/64(2006.01);B29C-049/68(2006.01);B29C-049/78(2006.01);B29C-049/06(2006.01);B29K-067/00(2006.01);B29L-031/00(2006.01);

A method includes forming a plurality of first mandrels over a substrate, forming an overcoat layer over the plurality of first mandrels, and inducing a crosslinking reaction within the overcoat layer and form a crosslinked overcoat layer. The method further includes exposing the substrate to a radiation to generate a plurality of acid molecules within the plurality of first mandrels, diffusing a portion of the plurality of acid molecules from the plurality of first mandrels into portions of the crosslinked overcoat layer, and inducing a decrosslinking reaction within the portions of the crosslinked overcoat layer and form de-crosslinked regions. Unmodified regions of the crosslinked overcoat layer form a plurality of second mandrels. The method further includes selectively removing the de-crosslinked regions. The plurality of first mandrels and the plurality of second mandrels form a mandrel pattern over the substrate.

• 출원번호 : US2024/030882
• 출원인 : TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC.;
• 특허번호 :
• IPC : H01L-021/027(2006.01);G03F-007/00(2006.01);G03F-007/16(2006.01);G03F-007/26(2006.01);

The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a gate insulation film pattern (cured film) that is stretchable and is capable of exhibiting pattern formability, electric capacity, and chemical resistance at sufficient levels; a pattern (cured film) formed from the radiation-sensitive composition; a method for producing the pattern; a cured film for a gate insulation film; a semiconductor element provided with the cured film; an organic electrochemical transistor; an organic EL display device; a liquid crystal display device; a micro LED display device; a quantum dot light-emitting display device; a wearable device; an electronic skin device; a biological sensor; and a neuromorphic device.　The present invention relates to a radiation-sensitive composition for forming a gate insulation film (excluding any composition containing cresol novolac and a quinone diazide compound), the radiation-sensitive composition containing: at least one polymer (A) selected from the group consisting of polymers (A1) that contain structural units (I) having an acid group, siloxane polymers (A2), and polyamic acids or polyamic acid esters (A3); a radiation-sensitive compound (B); and an ionic liquid (C).

• 출원번호 : JP2024/019011
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/023(2006.01);G02F-001/1368(2006.01);G09F-009/30(2006.01);G09F-009/33(2006.01);G09F-009/35(2006.01);H01L-021/312(2006.01);H01L-029/786(2006.01);H05B-033/14(2006.01);H10K-059/12(2023.01);H10K-059/125(2023.01);H10K-071/20(2023.01);H10K-085/10(2023.01);H10K-085/40(2023.01);

• 출원번호 : 24177708.5
• 출원인 : Sidel Participations
• 특허번호 :
• IPC : B29C-049/42(2006.01);B29C-049/64(2006.01);B29C-049/68(2006.01);B29C-049/78(2006.01);B29C-049/06(2006.01);B29K-067/00(2006.01);B29L-031/00(2006.01);

System an apparatus for wavelength resolved beam profiling. The apparatus comprises a beam monitoring assembly configured to receive a radiation beam comprising a plurality of wavelengths, and to provide a diffracted radiation of the plurality of wavelengths, wherein each of the plurality of wavelengths is spatially separated in the diffracted radiation. The apparatus comprises a color selector configured to select a portion of the diffracted radiation. The apparatus comprises a detector configured to detect the selected diffracted radiation and to generate beam profile data of the selected radiation. The color selector is movable to select each of the plurality of diffracted wavelengths of the diffracted radiation such that the plurality of wavelengths do not overlap when incident on the detector.

• 출원번호 : EP2024/064064
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/20(2006.01);G01J-003/18(2006.01);G01J-003/32(2006.01);G01J-003/02(2006.01);

An intravenous (IV) medication filter device can include a housing having a medication inlet, a medication outlet, and a gas vent. The filter device can include a hydrophobic gas filter inside the housing between the inlet and the gas vent and between the gas vent and the outlet. The hydrophobic gas filter can prevent medication received into the housing via the inlet from existing the housing via the gas vent. The hydrophobic gas filter can permit gas in the housing to exit the housing through the hydrophobic gas filter via the gas vent. The vent hole can have a shape that prevents sterilizing radiation directed at the gas vent from reaching the hydrophobic gas filter. Optionally, a porous plug may be inserted into the gas vent and/or a radiation shroud may be positioned over the gas vent to protect the gas vent from being damaged by the sterilizing radiation.

• 출원번호 : 24177321.7
• 출원인 : Illinois Tool Works Inc.
• 특허번호 :
• IPC : A61M-005/38(2006.01)