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  • 505044

    us

    Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
    • 출원번호 : 18650790
    • 출원인 : ASML Netherlands B.V.
    • 특허번호 :
    • IPC : G03F-007/00(2006.01);G01B-011/02(2006.01);G01B-011/06(2006.01);G01N-021/47(2006.01);G01N-021/95(2006.01);G03F-009/00(2006.01);
  • 505043

    us

    Systems and methods are provided for generating microscale structures and/or nanoscale structures, surface profiles, and surface chemistries on medical devices. Embodiments disclosed herein utilize exposure of pulsed laser radiation on to a surface of a material by a pulsed laser. The pulsed laser according to embodiments disclosed herein is configured to emit at least one laser pulse toward the surface and thereby modify the profile of the surface in order to selectively promote or inhibit bioactivity and medical functionality of the material. By selectively promoting or inhibiting bioactivity of the material, enhanced biointegration at a cellular level may be achieved. For example, modifying the surface profile and/or surface chemistry of a first substrate material can improve adhesive and/or chemical bonding of the first material to a bioactive second coating material.
    • 출원번호 : 18651226
    • 출원인 : Kalishek, Jason
    • 특허번호 :
    • IPC : B23K-026/352(2006.01);A61F-002/30(2006.01);B23K-026/0622(2006.01);B23K-026/12(2006.01);
  • 505042

    us

    Technology described herein can be embodied in a method that includes obtaining, using an imaging device, a plurality of images of a surgical scene, each image in the plurality of images being obtained under illumination by electromagnetic radiation in one of a plurality of wavelength ranges. The plurality of wavelength ranges are at least partially non-overlapping. The method also includes identifying a set of pixel values across multiple images in the plurality of images, wherein each pixel value in the set of pixel values is substantially representative of a particular portion of the surgical scene and determining, based on the set of pixel values and a chromophore model, a concentration of a chromophore in the particular portion of the surgical scene, wherein the chromophore model represents relationships between combinations of pixel values and chromophore concentrations.
    • 출원번호 : 18650707
    • 출원인 : DiCarlo, Jeffrey M.
    • 특허번호 :
    • IPC : G06T-007/00(2006.01);A61B-001/00(2006.01);A61B-001/04(2006.01);A61B-001/05(2006.01);A61B-090/00(2006.01);
  • 505041

    us

    An optical system comprises: a plurality of optical components for guiding radiation in the optical system; a plurality of assemblies, each assembly comprising at least one actuator/sensor device assigned to one of the optical components; and a number of actuating units for actuating the plurality of assemblies. Each actuating unit is assigned at least two of the assemblies. An interface is provided for electrically coupling the respective actuating unit to the assemblies assigned to the actuating unit to transmit respective electrical signals between the actuating unit and the respective assemblies assigned to the actuating unit. The respective electrical signals comprise a data signal and/or electrical energy for operating the respective assembly. The interface for each assembly assigned to the actuating unit has a respective bundle of electrical cables.
    • 출원번호 : 18650441
    • 출원인 : Krone, Stefan
    • 특허번호 :
    • IPC : G03F-007/00(2006.01);G02B-026/08(2006.01);
  • 505040

    wo

    The invention concerns a method for measuring a topography of a welding zone (10) in a welding process, said method comprising: generating measuring laser radiation (40; 60) in a laser cavity, emitting the generated measuring laser radiation (40; 60) to a welding zone (10) of a workpiece (11), receiving measuring laser radiation (64), reflected back by the welding zone (10), in the laser cavity, measuring self-mixing interference so as to generate a self-mixing interference signal (70), wherein the self-mixing interference is caused by superimposition of measuring laser radiation (40; 60) which has been generated and measuring laser radiation (64) which has been reflected back in the laser cavity, and processing the self-mixing interference signal (70) to determine the topography of the welding zone (10). A welding system is also described which uses said method.
    • 출원번호 : EP2024/061964
    • 출원인 : TRUMPF PHOTONIC COMPONENTS GMBH
    • 특허번호 :
    • IPC : B23K-026/03(2006.01)
  • 505039

    wo

    The present invention relates to a system (1) for producing electricity from solar radiation, comprising a support structure (2) and a plurality of photovoltaic modules (11a, 11b, 12a, 12b, 13a, 13c) supported by the support structure (2), characterised in that the photovoltaic modules (11a, 11b, 12a, 12b, 13a, 13c) are arranged at a plurality of levels (21, 22, 23) of the support structure (2) so as to be stacked substantially vertically, the distance between two consecutive levels of the plurality of levels (21, 22, 23) being such that the photovoltaic module or modules (11a, 11b, 12a, 12b, 13a, 13c) of one level (21, 22, 23) are never in the shadow of the module or modules (11a, 11b, 12a, 12b, 13a, 13c) of the immediately higher level (21, 22, 23).
    • 출원번호 : FR2024/050553
    • 출원인 : CAP ENERGY
    • 특허번호 :
    • IPC : H02S-020/10(2014.01);F24S-030/45(2018.01);H02S-020/32(2014.01);
  • 505038

    wo

    Placement of dose vertices in a dose lattice for lattice radiation treatment (LRT) is automated using a series of dose vertex constraints and objectives. The dose vertex constraints place limitations on the spacing and other spatial arrangement of dose vertices in the dose lattice, relative to other dose vertices, tumor volume, and/or organs-at-risk. The dose vertex objectives give preference to spatial arrangements of dose vertices in the dose lattice, such as having more centrally located dose vertices.
    • 출원번호 : US2024/026861
    • 출원인 : MAYO FOUNDATION FOR MEDICAL EDUCATION AND RESEARCH
    • 특허번호 :
    • IPC : A61N-005/10(2006.01)
  • 505037

    wo

    The invention relates to a method (20) and apparatus (10) for combatting ozone depletion. The apparatus (10) takes the form of a satellite having a positioning system (13) and dispensing arrangement (12) for discharging radiation blocker when in an ozone depleted area. The method (20) includes placing (22) the satellite (10) in orbit around the earth and determining (24), using the positioning system (13), when the satellite is in an area where the ozone layer has been depleted. Finally, the method (20) includes dispensing (26), using the dispensing arrangement (12) of the satellite, the radiation blocker into atmosphere in order to compensate for ozone depletion in that area of the atmosphere.
    • 출원번호 : IB2024/054148
    • 출원인 : VAN ZYL, Hendrik, Jacobus
    • 특허번호 :
    • IPC : A01G-015/00(2006.01);B64G-001/10(2006.01);C01B-013/10(2006.01);
  • 505036

    wo

    Provided herein are compositions, kits, and methods for treating a human subject with cancer (e.g., brain cancer) with a composition comprising: a human delta Factor VII construct, or nucleic acid sequence encoding said human delta Factor VII construct. In certain embodiments, the human delta Factor VII construct comprises a Propeptide domain and EGF-1 domain, or portions thereof, and lacks a functioning Peptidase S1 domain. In some embodiments, the human subject has glioblastoma and has been previously treated with radiation therapy.
    • 출원번호 : US2024/026844
    • 출원인 : THE CLEVELAND CLINIC FOUNDATION
    • 특허번호 :
    • IPC : C07K-014/745(2006.01);A61K-038/36(2006.01);
  • 505035

    us

    A system for monitoring ultraviolet (UV) exposure of a wearer. The system comprises a wearable device operable to sense UV radiation levels to which the wearer is exposed, and to transmit UV radiation information. The system further comprises an external computing device in remote communication with the wearable device, operable to receive the UV radiation information from the wearable device and configured to determine the wearer's real-time UV index value and the wearer's daily cumulative percentage of minimal erythema dose based upon the UV radiation information.
    • 출원번호 : 18649220
    • 출원인 : Matthys, Brian M.
    • 특허번호 :
    • IPC : G01J-001/42(2006.01);G01J-001/02(2006.01);H04B-001/3827(2006.01);