Disclosed herein are systems, methods, and devices for rapid synthesis of materials. In some embodiments, a system may comprise a material processing apparatus for processing a material, the material processing apparatus comprising a material passage structure in communication with a material feeding inlet, the material passage structure located within a reaction chamber, and the material feeding inlet configured to receive a material and transfer the material to the material passage structure; and a heat source in communication with the reaction chamber, the heat source comprising one or more of: plasma, flame, combustion sources, resistive heaters, heated liquid baths, electromagnetic radiation, and/or induction heaters, wherein the material passage structure is located within, surrounding, or adjacent to the heat source, such that the material passage structure is heated by the heat source and the material is converted to a product within the material passage structure.
- 출원번호 : US2024/027277
- 출원인 : 6K INC.
- 특허번호 :
- IPC : H05H-001/46(2006.01)