A lithographic apparatus including: a patterning device; a first positioner to position the patterning device support; a substrate support; a second positioner to position the substrate support; and a projection system configured to project a radiation beam from a patterning device onto a substrate, wherein the patterning device support, the first positioner, the substrate support, and/or the second positioner has, during use, a plurality of superconductive coils that are configured to generate a magnetic field, wherein the plurality of superconductive coils are grouped in a plurality of separable and discrete modules which, when assembled, form the assembly, each module including a subset of one or more coils of the plurality of coils and including an electrical interface to provide electricity to the subset of one or more coils and a cooling interface to provide cooling for the superconductivity of the subset of one or more coils.
- 출원번호 : EP2024/068993
- 출원인 : ASML NETHERLANDS B.V.
- 특허번호 :
- IPC : G03F-007/00(2006.01)