An organotin photoresist composition for actinic radiation and a method of stabilization are described. The organotin photoresist composition comprises an organotin compound represented by chemical formulas [RSnOO]Sn, [RSnOO]SnR, [RSnOO]SnR, [RSnOO]SnR, [RSnO]Sn, [RSnO]SnR, [RSnO]SnR, [RSnO]SnR, or RSn(µ-O)Sn(µ-O)SnR, a solvent and an additive, wherein R, R are each independently a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, or an amine, cyclic amine, cyano, ether, cyclic ether, ester, cyclic ester, halide, nitro, silyl, thiol, or carbonyl group. A method of stabilization of organotin photoresist composition comprises adding an organic additive.
- 출원번호 : US2024/028746
- 출원인 : LU, Feng
- 특허번호 :
- IPC : C07F-007/22(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);G03F-007/30(2006.01);G03F-007/36(2006.01);