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  • 524980

    us

    Provided is a low-odor, high-stability ergothioneine crystal, which belongs to the field of compound crystals The powder X-ray diffraction pattern of the ergothioneine crystal, measured using Cu-Kα radiation and expressed in terms of 2θ, has characteristic peaks at least at 9.50±0.2°, 15.52±0.2°, 19.06±0.2°, 24.88±0.2°, 25.48±0.2°, 28.74±0.2°, 29.22±0.2°, and 35.10±0.2°. The new crystal form of ergothioneine has excellent photostability, good resistance to hygroscopicity, and a high decomposition temperature tolerance.
    • 출원번호 : 19298619
    • 출원인 : GENE III BIOTECHNOLOGY CO., LTD.
    • 특허번호 :
    • IPC : C07D-233/84(2006.01)
  • 524979

    us

    A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a narrow space width at which bridge defects start to occur when an L/S pattern is formed. A second object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin having a group that is decomposed by an action of an acid to generate a polar group, a photoacid generator, and a boron-containing compound and satisfies a requirement 1. Requirement 1: A value A determined by an equation (1) is 0.120 or more.
    • 출원번호 : 19298449
    • 출원인 : Hiura, Nobuhiro
    • 특허번호 :
    • IPC : G03F-007/039(2006.01);C07F-005/02(2006.01);G03F-007/004(2006.01);G03F-007/038(2006.01);G03F-007/32(2006.01);
  • 524978

    us

    A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a damper arranged between a first extraction member and a second extraction member both configured to extract fluid, wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.
    • 출원번호 : 19298918
    • 출원인 : ASML NETHERLANDS B.V.
    • 특허번호 :
    • IPC : G03F-007/00(2006.01)
  • 524977

    ja

    PROBLEM TO BE SOLVED: To provide a radiation image photographing device, a program, an information processing device, and a radiation image photographing method capable of identifying a lesioned part during the operation.SOLUTION: In one embodiment, a radiation image photographing device is provided. This radiation image photographing device includes a first detector, a second detector, and an information processing device. The first detector is a portable type and is configured to be able to detect one of a pair of radiations emitted in different directions from a subject by radioactive decay. The second detector is a stationary type and is configured to be able to detect the other of the pair of radiations. The information processing device includes a first detection processing unit and a second detection processing unit. The first detection processing unit is configured to be able to generate first detection information including positional information of an emission source of a radiation on the basis of the detection result from the first detector. The second detection processing unit is configured to be able to generate second detection information including the positional information of the emission source on the basis of the detection result from the first detector and the detection result from the second detector.SELECTED DRAWING: Figure 3
    • 출원번호 : 2025134614
    • 출원인 : UNIV OF TOKYO;NATIONAL INSTITUTES FOR QUANTUM & RADIOLOGICAL SCIENCE & TECHNOLOGY;
    • 특허번호 :
    • IPC : G01T-001/161(2006.01)
  • 524976

    wo

    An optoelectronic component (100, 200, 300, 400, 500, 600, 700) comprises at least one light emitting diode (101). The light emitting diode (101) comprises a substrate (102), an optoelectronic semiconductor chip (105) and a wavelength converting element (108). The substrate (102) comprises a top side (103) and a bottom side (104) opposite the top side (103). The optoelectronic semiconductor chip (105) is arranged with its mount face (106) at the top side (103) of the substrate (102) and designed to emit electromagnetic radiation at an emission face (107) opposite the mount face (106). The wavelength converting element (108) is arranged at the emission face (107) of the optoelectronic semiconductor chip (105) and tapering towards the emission face (107). The wavelength converting element (108) protrudes over the optoelectronic semiconductor chip (105) in a direction parallel to the top side (103) of the substrate (102).
    • 출원번호 : EP2025/073222
    • 출원인 : AMS-OSRAM INTERNATIONAL GMBH
    • 특허번호 :
    • IPC : H10H-020/851(2025.01)
  • 524975

    wo

    A heat insulation material 3 is used in a battery pack including a battery group in which unit cells and heat insulation materials are alternately laminated, and comprises: a radiation shielding member 31 that is sheet-like and suppresses radiation; a plate-like member 32 that is arranged on at least one side of two main surfaces of the radiation shielding member 31 and has heat insulation properties; and a cushion member 34 that is disposed on the same side and/or the opposite side of the one side of the two main surfaces of the radiation shielding member 31 and absorbs expansion when the unit cells expand. As a result, it is possible to provide a heat insulating material 3 and a heat insulating material manufacturing method with which it is possible to suppress heating of an adjacent unit cell when the unit cell abnormally generates heat, as compared to a case in which the configuration of the present invention is not provided.
    • 출원번호 : JP2025/028650
    • 출원인 : NGK INSULATORS, LTD.
    • 특허번호 :
    • IPC : H01M-010/658(2014.01);H01M-050/291(2021.01);H01M-050/293(2021.01);
  • 524974

    us

    A radiation apparatus including a support column, a rotatable arm that is configured to rotate around a first pivot relative to the support column, a first arm rotatably attached to one side of the rotatable arm to rotate about a second pivot, the first arm holding a imaging device, and a second arm rotatably attached to an other side of the rotatable arm to rotate about a third pivot, the second arm holding a radiation source, wherein radiation axis of the radiation source is configured to irradiate an imaging plane of the imaging device.
    • 출원번호 : 19298971
    • 출원인 : GABELLA, Thomas
    • 특허번호 :
    • IPC : A61B-006/00(2024.01);A61B-006/10(2006.01);
  • 524973

    us

    Provided is a method and apparatus of intelligent analysis for liver tumors, including an analysis module for receiving YOLOR-based training to acquire sufficient intelligence to detect and locate liver tumor automatically and attain a mAP score as high as 0.56 required to distinguish lesions of benignant and malignant liver tumors in medical images from each other, attaining a mAP score of 0.628 for tumors at least 5 cm in size or a mAP score of 0.33 for tumors less than 5 cm in size. Thus, the area under the liver tumor differentiation curve of the analysis module and the mAP score reach 0.9 and 0.56 respectively. The values equal those of the effect of the diagnosis rate of liver tumors with CT and MRI in practice. The method is advantageous in terms of higher speed and thus can diagnose liver tumors earlier, preclude delays and radiation, but incur low cost.
    • 출원번호 : 19298422
    • 출원인 : Nien, Hsiao-Ching
    • 특허번호 :
    • IPC : A61B-008/08(2006.01);A61B-008/00(2006.01);G06T-007/00(2017.01);G06V-010/764(2022.01);G06V-010/774(2022.01);G06V-020/70(2022.01);G16H-015/00(2018.01);G16H-030/40(2018.01);G16H-050/30(2018.01);
  • 524972

    ko

    (과제) 본 발명은, 방사선 감도, 현상 밀착성이 우수한 경화막을 형성할 수 있고, 또한, 현상 시의 거품 일어남이나 이물 석출을 억제할 수 있는 감방사선성 조성물을 제공하는 것을 목적으로 한다.또한, 본 발명은, 본 발명의 감방사선성 조성물을 이용하여 형성된 경화막 및, 상기 경화막을 구비하는 표시 소자를 제공하는 것도 목적으로 한다.또한, 본 발명은, 현상 시의 거품 일어남이나 이물 석출을 억제할 수 있고, 또한, 방사선 감도, 현상 밀착성이 우수한 패턴(경화막)을 형성할 수 있는 패턴 형성 방법을 제공하는 것도 목적으로 한다.(해결 수단) 본 발명은, 중합체 (A)와, 광 산 발생제 (B)와, 계면 활성제 (C)와, 용제 (S)를 함유하고, 상기 계면 활성제 (C)가, HLB값이 0 이상 3.5 이하인 폴리옥시알킬렌계 계면 활성제 (C1), 또는, 폴리(메타)아크릴산 에스테르, 폴리비닐에테르, 폴리올레핀 및, 변성 혹은 비변성의 폴리디메틸실록산으로 이루어지는 군으로부터 선택되는 1개 이상을 포함하는 소포제 (C2)를 함유하는, 포지티브형 감방사선성 조성물에 관한 것이다.
    • 출원번호 : 10-2025-0112160
    • 출원인 : 제이에스알 가부시키가이샤
    • 특허번호 :
    • IPC : G03F-007/039;G03F-007/075;G03F-007/20;G03F-007/26;
  • 524971

    wo

    A laser apparatus for generating a sub- 190 nanometer laser beam includes a deep-ultraviolet solid-state laser source to generate an initial deep-ultraviolet laser beam, at least one mid-infrared solid-state laser source to generate at least one respective mid-infrared laser beam, and at least one lithium triborate crystal to generate an output deep-ultraviolet laser beam from the initial deep-ultraviolet and mid-infrared laser beams via sum-frequency generation. Each mid-infrared solid- state laser source includes (a) a holmium-, thulium-, or chromium-doped gain crystal or gain fiber or (b) an optically-pumped semiconductor gain material to generate the respective mid-infrared laser beam. The laser apparatus may be configured for continuous-wave and pulsed operation, thus offering versatile solutions for applications requiring DUV laser radiation below 190 nanometers. Advantageously, the present approach relies on lithium triborate. Lithium triborate crystals can be grown with the quality and dimensions needed for industrial applications.
    • 출원번호 : US2025/041799
    • 출원인 : COHERENT, INC.
    • 특허번호 :
    • IPC : H01S-003/00(2006.01);H01S-003/108(2006.01);H01S-003/23(2006.01);G02F-001/35(2006.01);H01S-003/081(2006.01);H01S-003/083(2006.01);H01S-003/16(2006.01);