The present invention provides a radiation-sensitive composition with which it is possible to from a resist film capable of exhibiting sensitivity, LWR performance, pattern rectangularity, CDU, pattern circularity, MEEF, and DOF at sufficient levels, and a pattern formation method. The radiation-sensitive composition contains: a first onium salt compound represented by formula (1); at least one type of second onium salt compound selected from the group consisting of a carboxylate compound represented by formula (2) and a carboxylic acid intramolecular salt compound represented by formula (3); a polymer including a structure unit having an acid dissociable group; and a solvent. (In formula (1), A is a (1+n)-valent organic group having 1 to 40 carbon atoms. R and R are each independently a hydrogen atom, a monovalent organic group, a fluorine atom, or a monovalent fluorinated hydrocarbon group. If a plurality of Rs and a plurality of Rs are present, the plurality of Rs and the plurality of Rs are respectively the same or different. m1 is an integer of 1 to 8. n is an integer of 1 to 3. Z is a radiation-sensitive onium cation.) (In formula (2), R is a monovalent organic group having 2 to 40 carbon atoms. Z is an organic cation.) (In formula (3), R is a single bond or a bivalent organic group having 1 to 40 carbon atoms. Z is a monovalent organic onium cation.)
- 출원번호 : JP2024/032863
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C08F-020/26(2006.01);G03F-007/20(2006.01);G03F-007/039(2006.01);