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  • 512291

    us

    A technique for controlling a compensation actuator system for compensating a shadow of an X-ray scattered radiation absorption grid in an X-ray image recorded with a pivotably mounted X-ray device, for example in real time, includes a method with a step of receiving motion state data indicative of a motion state of an X-ray device. The X-ray device is mounted on a pivotable arm. The motion state is assigned to a time of recording of an X-ray image by the X-ray device. A quality measure of the X-ray image with respect to a shadow of an X-ray scattered radiation absorption grid, which is arranged on the detector of the X-ray device, is determined. A control signal for a compensation actuator system for adjusting the position of the X-ray scattered radiation absorption grid is determined depending on the received motion state data and depending on the determined quality measure. Determining the control signal comprises optimizing the quality measure. The control signal determined is output to the compensation actuator system in order to compensate the shadow of the X-ray scattered radiation absorption grid.
    • 출원번호 : 18884582
    • 출원인 : Friedrich, Stefan
    • 특허번호 :
    • IPC : A61B-006/00(2024.01);A61B-006/58(2024.01);
  • 512290

    wo

    The invention relates to a device for noninvasive magnetic field therapy, comprising a therapy unit (1) with at least one periodically excitable electromagnet (2), a first radiation source which emits near-infrared radiation, and a heating element (4). In order to further improve the well-being of a patient using the device (1), the therapy unit additionally comprises a second radiation source which emits UVB radiation.
    • 출원번호 : EP2024/075589
    • 출원인 : NEBEL KRENZ HOLDING GMBH
    • 특허번호 :
    • IPC : A61N-002/02(2006.01);A61N-005/06(2006.01);
  • 512289

    wo


    • 출원번호 : JP2024/032946
    • 출원인 : KYOCERA CORPORATION;NARA INSTITUTE OF SCIENCE AND TECHNOLOGY;
    • 특허번호 :
    • IPC : C09K-011/79(2006.01);C09K-011/00(2006.01);G01T-001/202(2006.01);
  • 512288

    wo

    Provided are a radiation-sensitive composition, a pattern formation method, and an onium salt compound that make it possible to achieve sufficient sensitivity, CDU performance, pattern circularity, development defect suppression, depth of focus, LWR performance, pattern rectangularity, and exposure latitude when a pattern is formed. A radiation-sensitive composition according to the present invention includes: an onium salt compound represented by formula (1); a polymer that includes a structural unit (I) represented by formula (2); and a solvent. (In formula (1), A is a C3–40 (1+n)-valent organic group that includes a cyclic structure. When A includes a straight-chain alkanediyl group, the number of carbons in the straight-chain alkanediyl group is 1 or 2. A does not include a cyclohexylcarbonyloxy structure. R and R are each independently a hydrogen atom, a C1–20 monovalent organic group, a fluorine atom, or a monovalent fluorinated hydrocarbon group. When there are multiple R and R, the R and R are each the same or different. At least one of R and R is a fluorine atom or a monovalent fluorinated hydrocarbon group. m1 is an integer from 1 to 4, inclusive. m2 is 0 or 1. n is an integer from 1 to 3, inclusive. Z is a monovalent radiation-sensitive onium cation. The number of fluorine atoms in Z is no more than 8.) (In formula (2), R is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. L is a single bond or a divalent linking group. W is a monocyclic lactone structure, a monocyclic carbonate structure, a monocyclic sultone structure, a monocyclic sulfone structure, or a monocyclic ether structure. R is a C1–10 monovalent organic group, a cyano group, a nitro group, a hydroxy group, or an amino group. When there are multiple R, the R are each the same or different. p is an integer from 0 to 3, inclusive. q is 0 or 1.)
    • 출원번호 : JP2024/032894
    • 출원인 : JSR CORPORATION
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);C08F-020/26(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);
  • 512287

    ko

    금속 옥사이드 하이드록사이드 화학을 기초로 한 고해상도 리소그래피(lithography) 패터닝 코팅 형성을 위한 유기 금속 전구체가 기재되어 있다. 상기 전구체 조성물은 일반적으로 온화한 조건하에 수증기 또는 다른 OH 공급원 조성물에 의해 쉽게 가수분해될 수 있는 리간드를 포함한다. 상기 유기 금속 전구체는 일반적으로 비교적 낮은 방사선 선량(radiation dose)에서 고해상도 패터닝에 효과적일 수 있고 EUV 패터닝에 특히 유용한 코팅을 제공할 수 있는, 주석과의 방사선 민감성 유기 리간드를 포함한다. 상기 전구체 조성물은 상업적으로 적합한 조건하에서 쉽게 처리할 수 있다. 현장(in situ) 가수분해 또는 증기 기반 증착(deposition)을 이용한 용액 상(solution phase) 처리로 상기 코팅을 형성할 수 있다.
    • 출원번호 : 10-2024-7030752
    • 출원인 : 인프리아 코포레이션
    • 특허번호 :
    • IPC : G03F-007/16;C07F-007/22;G03F-007/004;G03F-007/20;
  • 512286

    wo


    • 출원번호 : US2024/046394
    • 출원인 : DEEP FISSION, INC.
    • 특허번호 :
    • IPC : E21B-043/24(2006.01);E21B-041/00(2006.01);G21D-001/00(2006.01);G21C-015/02(2006.01);E21B-033/14(2006.01);
  • 512285

    wo


    • 출원번호 : EP2024/075493
    • 출원인 : FRAMATOME
    • 특허번호 :
    • IPC : G21G-004/06(2006.01);G21G-001/02(2006.01);
  • 512284

    wo

    The invention relates to medicine, particularly clinical medicine, and can be used in medical diagnostics during surgical procedures on organs and tissues or when preserving an organ to assess its functional state and identify functional disorders. The method and the device implementing it both provide an evaluation by a non-invasive method. In some embodiments, the evaluated organ is affected by NADH-exciting radiation with wavelengths in the near ultraviolet range or the visible spectrum, followed by registration of the returned fluorescence, conversion of fluorescent data into digital form, and obtaining an assessment of ischemic damage to the organ tissue.
    • 출원번호 : US2024/046356
    • 출원인 : IVACHTCHENKO, Alexandre, Vasilievich;IVASHCHENKO, Andrey, Alexandrovich;SAVCHUK, Nikolay, Filippovich;VOLGUSHEV, Valentin;MERKIN, Nikolai;
    • 특허번호 :
    • IPC : G01N-021/64(2006.01);G01N-033/483(2006.01);A61B-001/04(2006.01);A61B-005/00(2006.01);G01J-003/44(2006.01);
  • 512283

    ja

    PROBLEM TO BE SOLVED: To reduce a deviation between a set dose target value which is set as a threshold value of radiation exposure and a dose index value at the time of actual imaging, and perform proper dose management.SOLUTION: A radiation imaging system comprises: a radiation imaging device including a dose detection pixel for detecting a dose of radiation radiated from a radiation source; and an imaging control device for controlling the radiation imaging device. The imaging control device identifies a position of the dose detection pixel in a region of interest for calculating a dose index value for a radiation image before radiation imaging, determines a threshold value dependent on the position of the dose detection pixel, and sends the position and the threshold value of the dose detection pixel to the radiation imaging device. The radiation imaging device sets the position and the threshold value of the dose detection pixel in the region of interest sent from the imaging control device, and performs imaging on the basis of the settings.SELECTED DRAWING: Figure 9
    • 출원번호 : 2024158479
    • 출원인 : CANON INC
    • 특허번호 :
    • IPC : A61B-006/00(2024.01)
  • 512282

    us

    A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L1 represents an ester group, —CO—NR3—, a (thio)ether group, or a sulfonyl group. R4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R5s. L2 represents a single bond or a divalent linking group.
    • 출원번호 : 18882982
    • 출원인 : JSR CORPORATION
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);C07C-069/75(2006.01);C07C-309/12(2006.01);C07C-309/17(2006.01);C07C-309/27(2006.01);C07D-207/416(2006.01);C07D-307/00(2006.01);C07D-307/94(2006.01);C07D-311/00(2006.01);C07D-313/06(2006.01);C07D-321/06(2006.01);C07D-327/04(2006.01);C07D-327/06(2006.01);G03F-007/039(2006.01);G03F-007/32(2006.01);