A radiation-sensitive resin composition, includes: a base resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds selected from the group consisting of a compound represented by formula (1), a compound represented by formula (2), and a compound represented by formula (3), provided that the compound represented by the formula (1) and the compound represented by the formula (3) within the scope of the compound represented by the formula (2) are excluded. R1, R2 and R3 are each independently a group having a cyclic structure provided that at least one of R1, R2 and R3 is a hetero atom-containing alicyclic group in which a carbon ring atom of an alicyclic hydrocarbon group is replaced with a hetero atom, and the hereto atom-containing alicyclic group comprises a cyclic acetal structure.
- 출원번호 : 19299451
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C07C-303/32(2006.01);C07C-309/06(2006.01);C07C-309/12(2006.01);C07C-309/19(2006.01);C07C-309/24(2006.01);C07C-381/12(2006.01);G03F-007/039(2006.01);G03F-007/16(2006.01);G03F-007/20(2006.01);G03F-007/30(2006.01);G03F-007/32(2006.01);G03F-007/38(2006.01);G03F-007/40(2006.01);