The present invention is a sulfonium salt type monomer, wherein the sulfonium salt type monomer is represented by the following general formula (a). This can provide: a sulfonium salt type monomer used as a sulfonium salt type quencher that is a material for a polymer contained in a chemically amplified resist composition that has excellent solvent solubility, high sensitivity, high contrast, and excellent lithography performance in lithography using high-energy radiation, and is resistant to pattern collapse even in fine pattern formation and has excellent etching resistance; a sulfonium salt type quencher consisting of the sulfonium salt type monomer; a polymer containing a repeating unit derived from the sulfonium salt type quencher; a chemically amplified resist composition including a base polymer containing the polymer; and a pattern forming method using the chemically amplified resist composition.

• 출원번호 : 19293263
• 출원인 : SHIN-ETSU CHEMICAL CO., LTD.
• 특허번호 :
• IPC : C08F-220/22(2006.01);C08F-212/14(2006.01);C08F-212/34(2006.01);C08F-220/18(2006.01);C08F-220/30(2006.01);C08F-220/40(2006.01);G03F-007/004(2006.01);G03F-007/039(2006.01);

A method for manufacturing a deflection member is disclosed. The method may include the steps of providing an additive manufacturing apparatus that includes at least two radiation sources and photopolymer resin, providing a reinforcing member, contacting a surface of the reinforcing member with the photopolymer resin, and directing radiation from the radiation source(s) towards a surface(s) of the reinforcing member to at least partially cure photopolymer resin in contact with the surface of the reinforcing member.

• 출원번호 : 19293487
• 출원인 : Brent, JR., John Leslie
• 특허번호 :
• IPC : B29C-064/124(2017.01);B29C-064/129(2017.01);B29C-064/277(2017.01);B29C-064/321(2017.01);B29K-105/00(2006.01);B29K-105/08(2006.01);B29L-031/00(2006.01);B29L-031/48(2006.01);B33Y-010/00(2015.01);B33Y-030/00(2015.01);B33Y-070/10(2020.01);B33Y-080/00(2015.01);D21F-001/00(2006.01);D21F-011/00(2006.01);

Materials and methods for enhancing the effectiveness of proton radiation therapy (e.g., high linear energy transfer (LET) proton radiation therapy) against tumor cells are provided herein.

• 출원번호 : 19293679
• 출원인 : Harvey, Adam J.
• 특허번호 :
• IPC : A61K-041/00(2020.01);A61K-009/00(2006.01);A61K-009/10(2006.01);A61K-009/51(2006.01);A61K-031/353(2006.01);A61K-047/32(2006.01);A61N-005/10(2006.01);A61P-035/00(2006.01);

An apparatus for non-contact measuring temperature comprises: a stand, for securing a vapor chamber, wherein the vapor chamber comprises a condenser area and an evaporator area, wherein the evaporator area comprises a heating spot; a continuous-wave laser device, facing the stand, for irradiating the heating spot by providing a visible laser beam, wherein the visible laser beam comprises a visible wavelength range; a switch device, controlling an irradiating cycle of the visible laser beam, wherein the irradiating cycle comprises a irradiating time-interval and a non-irradiating time-interval; a first infrared sensor, facing the stand, for collecting a first thermal radiation data of the heating spot in a second infrared wavelength range; a data processing unit, only transferring the first thermal radiation data in the non-irradiating time-interval into a first temperature, wherein the irradiating time-interval is longer than the non-irradiating time-interval.

• 출원번호 : 19294184
• 출원인 : Hsiao, Ming-Hsien
• 특허번호 :
• IPC : G01J-005/00(2022.01);F28D-015/06(2006.01);G01J-005/08(2022.01);

A semiconductor device may be manufactured using a multiple-layer photoresist that is formed of one or more materials that reduce the likelihood and/or amount of residual material retained in the multiple-layer photoresist. A photoresist underlayer of the multiple-layer photoresist includes a polymer having a highly uniform distribution of polar group monomers. Additionally and/or alternatively, the photoresist underlayer includes a polymer that includes a main chain and a plurality of side chains coupled with the main chain. The side chains include an acid generator component. Since the acid generator component is coupled with the main chain of the polymer by the side chains as opposed to uncontrollably diffusing into the photoresist layer, the acid generated by the acid generator component upon exposure to radiation collects under the bottom of the photoresist layer in a uniform manner and enables the bottommost portions of the photoresist layer to be developed and removed.

• 출원번호 : 19293962
• 출원인 : SU, Yu-Chung
• 특허번호 :
• IPC : G03F-007/039(2006.01);G03F-007/09(2006.01);G03F-007/11(2006.01);G03F-007/20(2006.01);G03F-007/38(2006.01);H01L-021/027(2006.01);

Aspects of the disclosure provide a semiconductor package and a method for preparing the same. The disclosed semiconductor package includes a die disposed over and conductively coupled to a laminate; and a member (e.g., a lid) attached to the laminate via one or more conducting materials. The member includes a structure (e.g., an electromagnetic absorber structure) configured to absorb electromagnetic radiation. In one or more embodiments, a wireless device may include the semiconductor package produced via the method as disclosed herein.

• 출원번호 : 19293681
• 출원인 : Aviv Haviv, Assaf
• 특허번호 :
• IPC : H01L-023/552(2006.01);H01L-021/52(2006.01);

A detection apparatus and a battery production device are described. The detection apparatus includes a scanning frame, a radiation source, a detector, and a carrying platform. The radiation source and the detector are both connected to the scanning frame, and the detector is opposite an emission port of the radiation source. The carrying platform is located between the radiation source and the detector, where the radiation source and the detector can rotate around a same rotation axis, and a rotation direction of the radiation source is the same as a rotation direction of the detector, such that during rotation, the detector remains opposite the emission port of the radiation source, and the carrying platform is located between the radiation source and the detector. The carrying platform is configured to hold a to-be-tested battery. The detection apparatus can achieve detection of deformation of the to-be-tested battery.

• 출원번호 : 19294028
• 출원인 : CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
• 특허번호 :
• IPC : G01N-023/04(2018.01);G01B-015/06(2006.01);

A control circuit (which may comprise a graphics processing unit) accesses a plurality of radiation treatment planning objectives for a particular patient. The control circuit then optimizes a first candidate radiation treatment plan for the particular patient as a function of those objectives. The control circuit can then detect modification of at least one of those objectives to provide a corresponding one or more modified radiation treatment planning objective. The control circuit can then optimize a second candidate radiation treatment plan as a function of the at least one modified objective. The control circuit can then present, via a shared user display, at least a first dose volume histogram that corresponds to the first treatment plan and at least a second dose volume histogram that corresponds to the second treatment plan. The first and second dose volume histograms can be visually distinguished from one another by other than color.

• 출원번호 : 19293094
• 출원인 : Kihnia, Veli-Pekka
• 특허번호 :
• IPC : A61N-005/10(2006.01);G16H-010/60(2018.01);G16H-020/40(2018.01);G16H-050/20(2018.01);

The present invention is an onium salt composed of: an anion represented by general formula (1A); and a cation represented by general formula (1B). This can provide an onium salt used as a photoacid generator contained in a chemically amplified resist composition with excellent solvent solubility, high sensitivity, high contrast, and excellent lithography performance in photolithography using high-energy radiation; a photoacid generator composed of the onium salt; a chemically amplified resist composition containing the photoacid generator; and a patterning process using the chemically amplified resist composition.

• 출원번호 : 19293361
• 출원인 : SHIN-ETSU CHEMICAL CO., LTD.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C07C-381/12(2006.01);C08F-020/10(2006.01);G03F-007/00(2006.01);G03F-007/039(2006.01);

A three-dimensional product formed by additive manufacturing, the three-dimensional product includes a plurality of continuous filaments arranged in a geometric pattern, where the plurality of continuous filaments includes a radiation-cured component and a nonradiation-cured component. A concentration of the nonradiation-cured component is in a range of greater than 5 wt % to less than 95 wt % of total weight of the three-dimensional product. The three-dimensional product includes a plurality of non-random pores located between adjacent printed continuous filaments, where an average diameter of the non-random pores is in a range of greater than 0 microns to less than 50 microns.

• 출원번호 : 19293324
• 출원인 : Bukovsky, Eric
• 특허번호 :
• IPC : C09D-011/101(2014.01);B29C-064/106(2017.01);B33Y-010/00(2015.01);B33Y-070/00(2020.01);C08G-018/10(2006.01);C08G-018/67(2006.01);C09D-011/102(2014.01);