The present application relates to the technical field of biology, in particular to a beauveria bassiana strain with high ultraviolet radiation resistance as well as a directional mutagenesis method therefor and use thereof. The beauveria bassiana strain with high ultraviolet radiation resistance of the present application has an accession number of CGMCC No.22466, and is deposited on Jul. 5, 2021. The strain is obtained by means of taking beauveria bassiana wild strain CGMCC No.13566 as an original strain and performing multiple rounds of repeated stress and directional screening under simulated sunlight UVB sub-lethal radiation, and has high resistance to ultraviolet radiation. A fungal insecticide prepared by adopting the strain can be well applied to pest green prevention and control in all weather.

• 출원번호 : 18800329
• 출원인 : YANG, Zhengyu
• 특허번호 :
• IPC : C12N-015/01(2006.01);A01N-063/30(2006.01);A01P-007/04(2006.01);C12N-001/14(2006.01);C12N-013/00(2006.01);C12R-001/645(2006.01);

A multi-bit, asynchronous e-fuse macro, the macro comprising: an input output enable, a power on reset, a write address, an input write enable, a ground clamp enable, and a write clock; a plurality of e-fuse bits; a supply voltage configured to allow programming at least one of the e-fuse bits; at least one fuse output; and self-timing and control circuitry configured to perform signaling, wherein each of the inputs is in electrical communication with the e-fuse macro.

• 출원번호 : 18800530
• 출원인 : BAE Systems Information and Electronic Systems Integration Inc.
• 특허번호 :
• IPC : G11C-011/56(2006.01);G11C-017/16(2006.01);G11C-017/18(2006.01);

An optical device includes a beam-forming element made of a first material with a base surface and a top surface, which are opposite one another, and with a surrounding lateral surface, which connects the base surface and the top surface to one another. The optical device includes a support body made of a second material, which is formed with a receptacle for the beam-forming element and has at least one common contact surface with the lateral surface. The first material and the second material are in direct contact with each other. The first material is permeable to, and the second material is absorbent to, a defined electromagnetic radiation. A defined refractive index (n2) of the second material is set in a defined ratio to a defined refractive index (n1) of the first material in order to set a specific transition characteristic for the defined electromagnetic radiation at the contact surface.

• 출원번호 : 18800100
• 출원인 : Ambuehl, Daniel
• 특허번호 :
• IPC : G02B-005/00(2006.01);G02B-003/08(2006.01);

PROBLEM TO BE SOLVED: To provide a device and a method that are improved for an acoustic optical deflection.SOLUTION: An optical device includes: an acoustic optical medium 24 that is configured so as to receive input radiation beams, attenuate the intensity of beams on a target to less than 50% of predetermined beam intensity, cause the beams to be spread by a rejection section, and deflect input beams toward a target while having predetermined beam intensity over an angle range for continuous pulse sections; a piezoelectric converter 26 mounted to the acoustic optical medium; and a drive circuit 28 that is coupled so as to apply a drive signal to the piezoelectric converter in which the drive signal has predetermined amplitude, has a frequency corresponding to a deflection angle of beams in respective pulse sections, and has a chirp type frequency spectrum in the respective rejection sections.SELECTED DRAWING: Figure 1

• 출원번호 : 2024134291
• 출원인 : ORBOTECH LTD
• 특허번호 :
• IPC : G02F-001/33(2006.01);G02F-001/01(2006.01);

A semiconductor integrated circuit evaluation method includes an initial setting flow for obtaining a difference correction value from a measured value and a calculated value of unwanted radiation in a semiconductor integrated circuit before implementation of an electromagnetic compatibility countermeasure, and a calculated prediction flow for obtaining a calculated value of unwanted radiation in a semiconductor integrated circuit after implementation of an electromagnetic compatibility countermeasure, correcting the calculated value with the difference correction value, and evaluating whether or not a corrected calculated value conforms to a standard. The initial setting flow and the calculated prediction flow respectively include a step of applying noise elimination processing to the measured value and the calculated value of the unwanted radiation.

• 출원번호 : 18799402
• 출원인 : INAGAKI, Ryosuke
• 특허번호 :
• IPC : G06F-030/367(2006.01);G06F-119/10(2006.01);

A loudspeaker system has a front loudspeaker housing with at least one first loudspeaker and a rear loudspeaker housing with at least one second loudspeaker. The rear loudspeaker housing is a bandpass housing with at least one first chamber and at least one second chamber. The first chamber has a first sound outlet, and the second chamber has a second sound outlet. The first sound outlet and the second sound outlet are arranged offset relative to one another with respect to a main radiation direction of the front loudspeaker housing.

• 출원번호 : 18798958
• 출원인 : PAUL, Nico
• 특허번호 :
• IPC : H04R-001/28(2006.01);H04R-001/02(2006.01);

A light-curable artificial nail includes an adhesive section having a light-curable composition in a semi-cured state. The light-curable composition is configured to transition from the semi-cured state to a cured state based on exposure to at least one wavelength of electromagnetic radiation.

• 출원번호 : 18799338
• 출원인 : Lotti, Sahara
• 특허번호 :
• IPC : A45D-031/00(2006.01);C09J-011/04(2006.01);C09J-011/06(2006.01);C09J-011/08(2006.01);

An apparatus for powder spheroidisation comprises a microwave cavity (20), a plasma chamber (35) that has an inner wall and is located in the microwave cavity, a confinement tube (3) connected to the plasma chamber, a receptacle for a mixture of a process gas and a powder precursor, the receptacle being connected to the confinement tube to feed said mixture as an incoming gas flow to the plasma chamber, in order to produce a plasma torch therein by coupling the gas flow with microwave radiation, and a flow divider (110) that is located within the confinement tube at the entrance of the plasma chamber, the flow divider providing a broad passageway (118) and a narrow passageway (113), and causing the incoming gas flow to separate into a central gas flow through the broad passageway, and a peripheral gas flow through the narrow passageway.

• 출원번호 : EP2024/072473
• 출원인 : FUNDACIÓEURECAT;
• 특허번호 :
• IPC : H05H-001/28(2006.01);H05H-001/42(2006.01);H05H-001/46(2006.01);

The disclosed and claimed subject matter relates to the use of a metal organic resist (MOR) resist in positive tone processing for high resolution patterning using actinic radiation, in particular EUV radiation of 13.5 nm wavelength.

• 출원번호 : EP2024/072441
• 출원인 : MERCK PATENT GMBH
• 특허번호 :
• IPC : G03F-007/004(2006.01)

The nuclear magnetic resonance system can include: a set of magnets, a housing, a set of coils (e.g., receive coil, transmit coil, gradient coil, active shim coil, etc.), and a processing system. The nuclear magnetic resonance method can include: applying a pulse sequence, acquiring a signal, and processing the signal (e.g., to determine blood analyte levels).

• 출원번호 : US2024/041497
• 출원인 : SYNEX MEDICAL INC.;MARTIN GAJDOSIK;
• 특허번호 :
• IPC : A61B-005/055(2006.01);A61B-005/145(2006.01);G01R-033/465(2006.01);G01R-033/341(2006.01);G01R-033/44(2006.01);