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  • 506488

    us

    A radiation facility including a radiation assembly, preferably for irradiating a patient is provided. The radiation assembly includes a radiation device and a moveable radiation device gantry whereupon the radiation device is mounted. The radiation device includes an accelerator and a projector for irradiating patients. The radiation assembly is movable relative to multiple patient preparation rooms.
    • 출원번호 : 18781768
    • 출원인 : ITREC B.V.
    • 특허번호 :
    • IPC : A61N-005/10(2006.01)
  • 506487

    us

    A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
    • 출원번호 : 18781567
    • 출원인 : CHEN, Tai-Yu
    • 특허번호 :
    • IPC : G03F-007/00(2006.01);G21K-001/06(2006.01);H05G-002/00(2006.01);
  • 506486

    us

    A system includes a wedge and an optical unit mounted on the wedge such that the optical unit is directed obliquely upward. The optical unit includes a radiation source. A controller is configured to treat an eye of a patient by causing the radiation source to irradiate respective target regions of the eye with a plurality of treatment beams while the eye gazes obliquely downward toward the optical unit.
    • 출원번호 : 18780546
    • 출원인 : Sacks, Zachary
    • 특허번호 :
    • IPC : A61F-009/008(2006.01);A61B-090/00(2006.01);A61F-009/007(2006.01);
  • 506485

    us

    A dry storage systems for radioactive nuclear waste materials may include a double-walled canister system. The canister system may include a canister having a tubular inner shell defining an internal cavity for storing nuclear waste material, a first lid sealably welded to a first end of the inner shell, a primary base plate defining a peripheral edge portion and having an annular closure flange, and an annular full thickness butt weld formed at an abutment joint between the annular closure flange and a second end of the inner shell. The inner shell, first lid, and first end closure may collectively define a sealed primary pressure retention barrier. A tubular outer shell may adjoin the inner shell. The outer shell may be welded to the canister to form a hermetically sealed secondary pressure retention barrier.
    • 출원번호 : 18780814
    • 출원인 : SINGH, Krishna P.
    • 특허번호 :
    • IPC : G21F-005/12(2006.01);B23K-005/02(2006.01);G21F-005/005(2006.01);G21F-005/012(2006.01);G21F-005/10(2006.01);G21F-009/34(2006.01);G21F-009/36(2006.01);
  • 506484

    us

    Dioptric projection lens for imaging a pattern in an object plane into an image plane via electromagnetic radiation at an operating wavelength in the ultraviolet range of longer than 280 nm comprises a multiplicity of lens elements between the object plane and the image plane along an optical axis configured so that a pattern in the object plane is able to be imaged into the image plane via the lens elements, with a stop plane suitable for attaching an aperture stop between the object plane and the image plane, a chief ray of the imaging intersecting the optical axis in the stop plane. The projection lens is designed as a large field lens with an object field radius of at least 52 mm and has a structure with an imaging scale of 1:1 which is mirror symmetric with respect to the stop plane.
    • 출원번호 : 18781500
    • 출원인 : Epple, Alexander
    • 특허번호 :
    • IPC : G03F-007/00(2006.01)
  • 506483

    us

    Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.
    • 출원번호 : 18779539
    • 출원인 : Cardineau, Brian J.
    • 특허번호 :
    • IPC : C07F-007/22(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);
  • 506482

    us

    A system for measuring radiation activity of a target radioisotope being produced in a reactor core is disclosed. The system includes a cable assembly and a radiation detector. The cable assembly includes a housing, a target cable configured to position the housing, and a drive cable couplable and decouplable with the target cable. The target radioisotope is positioned within the housing. The drive cable is configured to drive the target cable. The radiation detector configured to periodically measure the radiation activity of the target radioisotope being produced.
    • 출원번호 : 18780238
    • 출원인 : Westinghouse Electric Company LLC
    • 특허번호 :
    • IPC : G21G-001/02(2006.01);G01T-001/167(2006.01);G21C-017/108(2006.01);G21C-019/22(2006.01);G21C-023/00(2006.01);
  • 506481

    us

    A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system that shapes laser light such that a first laser light irradiated region of a mask blocking part of the laser light has a rectangular shape having short edges and long edges, the beam shaping optical system capable of causing one of a first radiation width of the first irradiated region in the direction parallel to the short edges and a second radiation width of the first irradiated region in the direction parallel to the long edges to be fixed and causing the other to be changed, a projection optical system that projects a pattern on the mask onto the workpiece, and a mover that moves the first irradiated region at least in the direction parallel to the short edges to move a second laser light irradiated region of the workpiece.
    • 출원번호 : 18779447
    • 출원인 : Gigaphoton Inc.
    • 특허번호 :
    • IPC : B23K-026/073(2006.01);B23K-026/06(2006.01);B23K-026/0622(2006.01);B23K-026/066(2006.01);B23K-026/082(2006.01);
  • 506480

    us

    Described herein, are methods for providing a protective coating to a storage container for storing nuclear material, the method comprising depositing nickel particles on at least one surface of the substrate to produce the protective coating, wherein the nickel particles are deposited by cold spraying a composition comprising nickel particles and a carrier gas comprising nitrogen. In one aspect, the carrier gas consists essentially or consists only of nitrogen. The methods do not require pretreatment or modification of the nickel particles prior to cold spraying, which makes the methods described herein economically practical. The coatings produced by the methods described herein possess several advantageous properties including, but not limited to, high adhesion strength to the storage system and low porosity. The coatings produced by the methods described herein are effective against chemical attack such as, for example, CISCC.
    • 출원번호 : 18779178
    • 출원인 : Wellwood, Jay G.
    • 특허번호 :
    • IPC : B05D-001/12(2006.01);B05B-007/14(2006.01);C23C-024/04(2006.01);
  • 506479

    us

    This document describes radiation channels filled with a dielectric using a surface with a pattern of radiation elements to allow electromagnetic energy to enter or escape the dielectric. An absorption channel is paired with the radiation channel. The absorption channel is loaded with an absorber material to allow for a transfer of electromagnetic energy between the radiation channels and the respective absorption channel. A surface of each of the absorption channels has a pattern of absorbing elements that allows the electromagnetic energy that enters or exits the dielectric to be absorbed by the absorber material.
    • 출원번호 : 18780049
    • 출원인 : Aptiv Technologies AG
    • 특허번호 :
    • IPC : H01Q-021/00(2006.01);G01S-013/931(2006.01);H01Q-001/32(2006.01);H01Q-001/52(2006.01);H01Q-021/06(2006.01);