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  • 505604

    us

    A deposition apparatus and a method are provided. A method includes placing a substrate over a platform in a chamber of a deposition system. A precursor material is introduced into the chamber. A first gas curtain is generated in front of a first electromagnetic (EM) radiation source coupled to the chamber. A plasma is generated from the precursor material in the chamber, wherein the plasma comprises dissociated components of the precursor material. The plasma is subjected to a first EM radiation from the first EM radiation source. The first EM radiation further dissociates the precursor material. A layer is deposited over the substrate. The layer includes a reaction product of the dissociated components of the precursor material.
    • 출원번호 : 18788717
    • 출원인 : Lee, Tze-Liang
    • 특허번호 :
    • IPC : C23C-016/455(2006.01);H01J-037/32(2006.01);
  • 505603

    us

    An image sensor device is disclosed. The image sensor device includes: a substrate having a front surface and a back surface; two adjacent radiation-sensing regions formed in the substrate; and a trench isolation structure extending from the back surface of the substrate into the substrate between the two adjacent radiation-sensing regions. The trench isolation structure includes: a dielectric material; a first film being formed between the dielectric material and the substrate; a second film being formed between the first film and the dielectric material; and a third film being formed between the second film and the dielectric material. An electronegativity of the first film, an electronegativity of the second film and an electronegativity of the third film are different from each other.
    • 출원번호 : 18788176
    • 출원인 : LAI, CHIH-YU
    • 특허번호 :
    • IPC : H01L-027/146(2006.01)
  • 505602

    us

    Systems and methods for mitigating interference from a satellite gateway antenna are disclosed herein. In an embodiment, a method for mitigating interference from a satellite gateway antenna includes determining a power flux density radiation from the satellite gateway antenna in at least one direction in a horizontal plane, mounting at least one panel at an area in the at least one direction in the horizontal plane, orienting the at least one panel to have an azimuthal rotation relative to a look direction of the satellite gateway antenna in the horizontal plane, and orienting the at least one panel to have an upward tilt such that any reflection of horizontal rays of the power flux density radiation off of the at least one panel is not in the horizontal plane.
    • 출원번호 : 18789175
    • 출원인 : BHASKAR, Udaya
    • 특허번호 :
    • IPC : H01Q-017/00(2006.01)
  • 505601

    us

    A method of cleaning a reticle includes applying ozone fluid over a surface of the reticle, and while the ozone fluid is over the surface of the reticle, irradiating the surface of the reticle with ultraviolet (UV) radiation for an irradiation time to treat the surface of the reticle. The method of cleaning the reticle further includes adjusting the irradiation time based on a reflected UV beam from the surface of the reticle.
    • 출원번호 : 18788007
    • 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
    • 특허번호 :
    • IPC : G03F-007/00(2006.01)
  • 505600

    us

    A method of performing a lithography process includes providing a test pattern. The test pattern includes a first set of lines arranged at a first pitch, a second set of lines arranged at the first pitch, and further includes at least one reference line between the first set of lines and the second set of lines. The test pattern is exposed with a radiation source providing an asymmetric, monopole illumination profile to form a test pattern structure on a substrate. The test pattern structure is then measured and a measured distance correlated to an offset of a lithography parameter. A lithography process is adjusted based on the offset of the lithography parameter.
    • 출원번호 : 18787004
    • 출원인 : Lee, Chih-Jie
    • 특허번호 :
    • IPC : G03F-009/00(2006.01);G03F-007/20(2006.01);
  • 505599

    us

    A radiation device is wirelessly connected to a radiography device that generates dynamic image data and which controls sequential radiation. The radiation device includes a signal generator and a first determiner. The signal generator generates (i) first pulse signals emitted by the radiography device, (ii) second pulse signals synchronized with a first count value obtained by counting up the first pulse signals, and (iii) a second count value obtained by counting up the second pulse signals. The first determiner determines whether to start radiation based on a delay time which is a difference between a first time point count value and a second time point count value. The first time point count value indicates a time point at which a radiation permission signal is transmitted. The second time point count value indicates a time point at which the radiation permission signal is received.
    • 출원번호 : 18787201
    • 출원인 : HARA, Kentaro
    • 특허번호 :
    • IPC : A61B-006/00(2006.01);A61B-006/46(2006.01);A61G-003/00(2006.01);
  • 505598

    us

    A production method including: a step of forming, on a substrate layer containing a polypropylene resin or a polyester resin, a metal oxide layer by a vacuum film forming process; a step of applying a gas barrier coating layer-forming composition on the metal oxide layer to form a coating film; a step of preheating the coating film by infrared radiation; and a step of heating and thereby curing the coating film preheated by infrared radiation in an atmosphere at 50 to 120° C. to form a gas barrier coating layer, in which the gas barrier coating layer-forming composition contains at least one selected from the group consisting of an alkyl silicon alkoxide and its hydrolysate, and a water-soluble polymer.
    • 출원번호 : 18787875
    • 출원인 : TOPPAN HOLDINGS INC.
    • 특허번호 :
    • IPC : B05D-007/02(2006.01);B05D-003/02(2006.01);B05D-007/00(2006.01);B65D-065/42(2006.01);C23C-014/10(2006.01);C23C-014/24(2006.01);
  • 505597

    us

    An interactive object system includes an interactive object and a source of electromagnetic radiation, e.g., an external source. A power harvesting device of the interactive object receives and harvests power from the electromagnetic radiation to power a special effect system of the interactive object. In an embodiment, the interactive object includes a retroreflective material that reflects electromagnetic radiation, which may be of a same or different wavelength as the electromagnetic radiation from which power is harvested. The interactive object system detects the reflected electromagnetic radiation, which may be used to trigger one or more additional actions related to the interactive object.
    • 출원번호 : 18787756
    • 출원인 : Yeh, Wei Cheng
    • 특허번호 :
    • IPC : G02B-005/126(2006.01);A63G-031/00(2006.01);H02J-050/00(2006.01);H04N-005/33(2006.01);
  • 505596

    us

    A process for the treatment of a hydrocracking unit bottoms stream containing heavy poly-nuclear aromatic (HPNA) compounds and/or a fresh hydrocracking feedstock stream containing HPNA precursors to produce coke. The HPNA and/or HPNA precursors are removed from the hydrocracking unit bottoms stream and/or a fresh hydrocracking feedstock stream by solvent washing, and the HPNA and/or HPNA precursors are subjected to delayed coking for the production of coke.
    • 출원번호 : 18786961
    • 출원인 : SAUDI ARABIAN OIL COMPANY
    • 특허번호 :
    • IPC : C10B-057/06(2006.01);C10B-057/00(2006.01);C10B-057/04(2006.01);
  • 505595

    us

    A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.
    • 출원번호 : 18785179
    • 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);G03F-007/00(2006.01);H01L-021/033(2006.01);