The invention relates to a photometer (30) for analysing the composition of a sample gas. The photometer comprises an infra-red (IR) source (20) configured to direct a first plurality of pulses (40) of IR radiation through the sample gas to an IR detector (26), at least two of the first plurality of pulses being of different wavelength. The photometer further comprises an ultraviolet (UV) source (32) configured to generate a second plurality of pulses (38) of UV radiation for conveyance to a UV detector (36), at least two of the second plurality of pulses being of different wavelength. A path selection arrangement (22, 42-50) is configured to selectively convey different ones of the second plurality of pulses (38) to one of the sample gas and the UV detector (36). The photometer further comprises processing circuitry coupled to the IR source (20), the UV source (32), the IR detector (26), the UV detector (36) and the path selection arrangement (22, 42-50). The processing circuitry is configured to (i) select the wavelength to be used for a given UV pulse of the second plurality of pulses (38), (ii) receive a plurality of detection signals from each of the IR detector (26) and the UV detector (36) and (iii) based on the detection signals, determine a concentration of at least one component of the sample gas. A method for analysing the composition of a sample gas is also disclosed.
- 출원번호 : 18804705
- 출원인 : DAW, Chris
- 특허번호 :
- IPC : G01J-003/427(2006.01);G01J-003/02(2006.01);G01J-003/10(2006.01);G01J-003/12(2006.01);G01N-021/31(2006.01);G01N-021/33(2006.01);G01N-021/3504(2006.01);G01N-033/00(2006.01);