Provided is a decorative sheet having excellent heat resistance, scratch resistance, and stain resistance. A decorative sheet (1) comprises a raw material layer (2) and a surface protection layer, wherein the surface protection layer is provided on the raw material layer (2), the decorative sheet (1) comprising: a first gloss adjustment layer (5) which includes a cured object of a first ionizing-radiation-curable resin; and a second gloss adjustment layer (6) which partly covers the upper surface of the first gloss adjustment layer (5), includes a cured object of a second ionizing-radiation-curable resin, and has, on the upper surface thereof, a rugged structure in which the ratio RSm/Ra of an average length RSm to an arithmetic average roughness Ra of roughness curve elements is in the range of 10-600, the rugged structure including a plurality of ridge portions each having a protruding ridge shape.

• 출원번호 : JP2024/027210
• 출원인 : TOPPAN HOLDINGS INC.
• 특허번호 :
• IPC : B32B-027/00(2006.01);B32B-027/30(2006.01);B32B-027/40(2006.01);E04F-013/08(2006.01);E04F-013/18(2006.01);

A deposition apparatus and a method are provided. A method includes placing a substrate over a platform in a chamber of a deposition system. A precursor material is introduced into the chamber. A first gas curtain is generated in front of a first electromagnetic (EM) radiation source coupled to the chamber. A plasma is generated from the precursor material in the chamber, wherein the plasma comprises dissociated components of the precursor material. The plasma is subjected to a first EM radiation from the first EM radiation source. The first EM radiation further dissociates the precursor material. A layer is deposited over the substrate. The layer includes a reaction product of the dissociated components of the precursor material.

• 출원번호 : 18788717
• 출원인 : Lee, Tze-Liang
• 특허번호 :
• IPC : C23C-016/455(2006.01);H01J-037/32(2006.01);

Systems and methods for mitigating interference from a satellite gateway antenna are disclosed herein. In an embodiment, a method for mitigating interference from a satellite gateway antenna includes determining a power flux density radiation from the satellite gateway antenna in at least one direction in a horizontal plane, mounting at least one panel at an area in the at least one direction in the horizontal plane, orienting the at least one panel to have an azimuthal rotation relative to a look direction of the satellite gateway antenna in the horizontal plane, and orienting the at least one panel to have an upward tilt such that any reflection of horizontal rays of the power flux density radiation off of the at least one panel is not in the horizontal plane.

• 출원번호 : 18789175
• 출원인 : BHASKAR, Udaya
• 특허번호 :
• IPC : H01Q-017/00(2006.01)

Provided in the embodiments of the present application are an antenna oscillator, an antenna, and a communication device. The antenna oscillator comprises four radiators and four feed structures, wherein the feed structures are connected to the radiators and are used for feeding the radiators; each radiator comprises a first transmission line, a first radiation arm, a second radiation arm and a second transmission line, which are connected in sequence, and the first transmission line and the second transmission line are respectively connected to the feed structures; the four radiators are a first radiator, a second radiator, a third radiator and a fourth radiator, the first radiator and the second radiator radiate signals in a first polarization direction, and the third radiator and the fourth radiator radiate signals in a second polarization direction, thus forming a dual-polarized antenna oscillator; and each feed structure is a one-to-two feed structure, and two radiators are connected in parallel and are connected to the same feed structure. By means of the solution, the aperture of an antenna can be reduced, and the gain of the antenna can be improved. Moreover, each radiator has two current distribution modes, and thus a bandwidth is relatively large.

• 출원번호 : CN2024/108585
• 출원인 : HUAWEI TECHNOLOGIES CO., LTD.
• 특허번호 :
• IPC : H01Q-001/50(2006.01)

A refrigerator is disclosed. The refrigerator comprises a main body formed of a vacuum insulator. The refrigerator comprises a block disposed at one side of the main body. The main body has a first space. The block divides the first space from a machine room. The block is formed of polyurethane foam, which is a non-vacuum insulator. An insulation reinforcing part protruding toward the machine room is provided at one side of the block. A condenser and a compressor, which are cycle components accommodated in the machine room, can be disposed at the central portion of the machine room so as not to interfere with the insulation reinforcing part. A first duct for accommodating the condenser and a second duct for accommodating the compressor extend in one direction inside the machine room. The first duct and the second duct isolate the condenser and the compressor from the inner space of the machine room, and guide the flow of air in one direction. Therefore, heat radiation performance of the condenser is improved.

• 출원번호 : KR2024/011172
• 출원인 : LG ELECTRONICS INC.
• 특허번호 :
• IPC : F25D-023/00(2006.01);F25D-023/06(2006.01);F25D-019/00(2006.01);F25D-011/00(2006.01);

A fluid treatment system for treating a fluid with ultraviolet (UV) radiation. The system includes a reactor vessel including a treatment chamber that includes an inlet where the fluid enters the treatment chamber and an outlet where the fluid exits the treatment chamber. Fluid flows within the treatment chamber from the inlet to the outlet generally along a longitudinal axis of the treatment chamber. The system further includes at least one light source assembly that is removably coupled to the reactor vessel so that the light source assembly can be inserted into the treatment chamber in a direction transverse to the longitudinal axis. The at least one light source assembly includes a light source unit including an array of light-emitting diodes (LEDs) for emitting UV radiation into the treatment chamber to treat the fluid.

• 출원번호 : IB2024/057364
• 출원인 : TROJAN TECHNOLOGIES GROUP ULC
• 특허번호 :
• IPC : A61L-002/10(2006.01)

An image sensor device is disclosed. The image sensor device includes: a substrate having a front surface and a back surface; two adjacent radiation-sensing regions formed in the substrate; and a trench isolation structure extending from the back surface of the substrate into the substrate between the two adjacent radiation-sensing regions. The trench isolation structure includes: a dielectric material; a first film being formed between the dielectric material and the substrate; a second film being formed between the first film and the dielectric material; and a third film being formed between the second film and the dielectric material. An electronegativity of the first film, an electronegativity of the second film and an electronegativity of the third film are different from each other.

• 출원번호 : 18788176
• 출원인 : LAI, CHIH-YU
• 특허번호 :
• IPC : H01L-027/146(2006.01)

Illuminator, preferably an illuminator for active range estimation device, comprising: a source of laser radiation (2-a,2-b); a conditioning optics (3-a,3-b) for the source of laser radiation (2-a,2-b); a first dot pattern generator (DPG-1) receiving laser light from the conditioning optics (3-a,3-b) and configured to produce a number N of first divergent rays r, r, …, r, …, r, forming a first pattern P1, and a second dot pattern generator (DPG-2) receiving laser radiation from the conditioning optics (3- a,3-b) and configured to produce a number N of second divergent rays forming a second pattern r, r, …, r, …, r,. The first and second dot pattern generators (DPG-1 and DPG-2) are configured to produce N couples of corresponding first and second rays r - r, r - r, … r - r, …r rNpdb that have substantially parallel axis and impact on a target to produce Npd pairs of dots D - D, D - D, …, D - D, …, D - D on the target.

• 출원번호 : PT2024/050030
• 출원인 : INSTITUTO DE TELECOMUNICACOES
• 특허번호 :
• IPC : G01S-007/481(2006.01);G01S-017/48(2006.01);G01S-007/4865(2020.01);G01S-007/497(2006.01);

A method of performing a lithography process includes providing a test pattern. The test pattern includes a first set of lines arranged at a first pitch, a second set of lines arranged at the first pitch, and further includes at least one reference line between the first set of lines and the second set of lines. The test pattern is exposed with a radiation source providing an asymmetric, monopole illumination profile to form a test pattern structure on a substrate. The test pattern structure is then measured and a measured distance correlated to an offset of a lithography parameter. A lithography process is adjusted based on the offset of the lithography parameter.

• 출원번호 : 18787004
• 출원인 : Lee, Chih-Jie
• 특허번호 :
• IPC : G03F-009/00(2006.01);G03F-007/20(2006.01);

A method of cleaning a reticle includes applying ozone fluid over a surface of the reticle, and while the ozone fluid is over the surface of the reticle, irradiating the surface of the reticle with ultraviolet (UV) radiation for an irradiation time to treat the surface of the reticle. The method of cleaning the reticle further includes adjusting the irradiation time based on a reflected UV beam from the surface of the reticle.

• 출원번호 : 18788007
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/00(2006.01)