A composition for forming a colored layer contains a dye, an active energy radiation-curable resin, a photoinitiator, a solvent, and an additive. The dye contains at least one of a first coloring material, a second coloring material, and a third coloring material, with the wavelength of maximum absorption within the range of 470 to 530 nm and the full width at half maximum of the absorption spectrum is 15 to 45 nm. The wavelength of maximum absorption of the second coloring material is within the range of 560 to 620 nm and the full width at half maximum of the absorption spectrum is 15 to 55 nm. Within the wavelength range of 380 to 780 nm, the third coloring material exhibits the lowest transmittance in the range of 650 to 780 nm. The additive includes a compound A and a sulfur antioxidant.

• 출원번호 : 18936412
• 출원인 : Toppan Holdings Inc.
• 특허번호 :
• IPC : C09D-007/41(2006.01);C08K-005/00(2006.01);C08K-005/5397(2006.01);C09D-007/48(2006.01);C09D-133/14(2006.01);G02B-001/16(2006.01);G02B-001/18(2006.01);G02B-005/22(2006.01);G02B-005/28(2006.01);

Interstitial brachytherapy is a cancer treatment in which radioactive material is placed directly in the target tissue of the affected site using an afterloader. The accuracy of this placement is monitored in real time using a urinary catheter that locates the radioactive material according to the radiation levels measured by sensors in the walls of the urinary catheter. A scintillator that is embedded in the walls of the urinary catheter produces light when irradiated by the radioactive material. This light is proportional to the level of radiation at each location. The light produced by each scintillator is carried through optical fibers and then converted to an electrical signal that is proportional to the light and the radiation level at each location. The radioactive material is located according to the plurality of electrical signals. This location can be used as quality control feedback to the afterloader.

• 출원번호 : 18935793
• 출원인 : da Conceição Moutinho, Luis Miguel
• 특허번호 :
• IPC : A61B-005/00(2006.01);A61B-005/055(2006.01);A61M-025/10(2006.01);A61N-005/10(2006.01);G01T-001/20(2006.01);

A substrate processing method and apparatus to create a sacrificial masking layer is disclosed. The layer is created by providing a first precursor selected to react with one of a radiation modified and unmodified layer portion and to not react with the other one of the radiation modified and unmodified layer portion on a substrate in a reaction chamber to selectively grow the sacrificial masking layer.

• 출원번호 : 18936501
• 출원인 : Raaijmakers, Ivo
• 특허번호 :
• IPC : G03F-007/16(2006.01)

An image processing system includes a processor configured to receive heat radiation from a scene by a spectropolarimetric imaging system adapted to generate a plurality of spectral frames, generate the plurality of spectral frames associated with the scene, each frame having a plurality of pixels, for each pixel from the generated plurality of spectral frames, extract scene associated spectral information, including pixel-specific temperature representing an object's temperature, and thermal texture factor representing the object's texture, for each of a plurality of materials having a specific emissivity in a library, generate reference spectral information as a function of temperature and thermal texture, match the extracted spectral information for each pixel from the generated plurality of spectral frames to the generated reference spectral information using a statistical method to minimize the associated variation, and extract spectral metadata from the matched reference spectral information for the associated material based on the match.

• 출원번호 : 18935719
• 출원인 : Purdue Research Foundation
• 특허번호 :
• IPC : G01J-003/28(2006.01);G01J-003/00(2006.01);G01J-003/10(2006.01);G01J-003/447(2006.01);G01J-004/00(2006.01);G01J-004/04(2006.01);G01J-005/00(2006.01);G01J-005/48(2006.01);G01J-005/59(2006.01);G01N-021/21(2006.01);G01N-021/25(2006.01);G01N-021/35(2006.01);G06F-018/22(2006.01);G06V-010/143(2006.01);G06V-010/30(2006.01);G06V-010/40(2006.01);G06V-010/54(2006.01);G06V-010/75(2006.01);

The invention relates to a method for machining a transparent workpiece (4) by generating non-linear absorption of laser radiation in a laser beam focus located in a volume of the workpiece (4). The object of the invention is that of providing a method of improved precision and quality, and a corresponding device, for laser machining of workpieces. In particular, it is also intended for it to be possible for workpieces made of composite materials or of other special materials, such as filter glass, to be machined at an improved level of quality. For this purpose, the method according to the invention comprises the following steps: spectroscopic measurement of the linear absorption of the laser radiation in the workpiece (4),selecting a working wavelength at which the linear absorption is low, andmachining the workpiece (4) by means of the application laser radiation at the working wavelength. The invention furthermore relates to a corresponding device for machining a transparent workpiece (4).

• 출원번호 : 18936774
• 출원인 : Bergner, Klaus
• 특허번호 :
• IPC : B23K-026/00(2006.01);B23K-026/03(2006.01);B23K-026/06(2006.01);B23K-026/062(2006.01);B23K-026/0622(2006.01);B23K-026/064(2006.01);B23K-026/50(2006.01);B23K-026/53(2006.01);B23K-103/00(2006.01);C03C-015/00(2006.01);G01N-021/39(2006.01);

One or more embodiments of the present disclosure provide an acoustic output device, comprising a housing; a first loudspeaker disposed in the housing, the first loudspeaker being acoustically coupled with a first hole portion and a second hole portion disposed on the housing, respectively, and the first loudspeaker being driven by a first electrical signal to output a first sound wave and a second sound wave having a phase difference through the first hole portion and the second hole portion, respectively; and a second loudspeaker disposed in the housing, the second loudspeaker being driven by a second electrical signal to output a third sound wave. In a target frequency range, the superposition of the first sound wave, the second sound wave, and the third sound wave generates a directional far-field radiation from the acoustic output device.

• 출원번호 : 18935637
• 출원인 : SHENZHEN SHOKZ CO., LTD.
• 특허번호 :
• IPC : H04R-001/32(2006.01)

Photocurable compositions are provided herein, which provide a balance of fast curing properties at exposure to radiation in the electromagnetic spectrum and impressive cure through depth.

• 출원번호 : 18934853
• 출원인 : Messana, Andrew D.
• 특허번호 :
• IPC : C09J-004/00(2006.01);C08K-005/45(2006.01);C09J-005/00(2006.01);C09J-011/06(2006.01);C09J-133/06(2006.01);C09J-133/14(2006.01);C09J-133/26(2006.01);

The invention provides a method for treating a tumor excise site defined by a center and edges, and includes simultaneously exposing the tumor site to radiation and pulsating heat. The invention also provides a device for treating tumors at a target site, the including a first balloon containing a radio isotope; a second balloon encasing the first balloon wherein the second balloon comprises structures to create a void between the first balloon and the second balloon; wherein the void is adapted to receive pulsing, temperature treated fluid.

• 출원번호 : 18935287
• 출원인 : Herskovic, Arnold M.
• 특허번호 :
• IPC : A61N-005/10(2006.01)

In an embodiment, a method includes liberating feed atoms and forming at least one nanotube from the liberated feed atoms. Feed atoms disposed over a front side of a substrate are liberated in response to electromagnetic radiation that propagates from the back side of the substrate, through the substrate, to the front side of the substrate. And, from the liberated feed atoms, at least one nanotube is formed over the front side of the substrate in response to at least one catalyst separate from the substrate and disposed over the front side of the substrate and over the feed atoms.

• 출원번호 : 18934870
• 출원인 : Odysseus Technologies, Inc.
• 특허번호 :
• IPC : C01B-021/064(2006.01);C01B-021/072(2006.01);C01B-032/16(2017.01);C23C-026/00(2006.01);C23C-028/00(2006.01);

본 발명에 따른 피시험 반도체 소자의 내방사선 평가 방법은, 피시험 반도체 소자를 중이온 장비에 제공하여 베이스 구간의 선형에너지전달(LET, linear energy transfer) 값에 따른 상기 피시험 반도체 소자의 단면적(cross section, σ) 값을 측정하는 단계, 상기 피시험 반도체 소자를 펄스 레이저 장비에 제공하고, 레이저 에너지 값에 따른 상기 피시험 반도체 소자의 단면적 값을 측정하는 단계, 및 상기 펄스 레이저 장비에 제공된 상기 레이저 에너지 값을 상기 선형에너지전달 값으로 변환시켜, 상기 베이스 구간을 제외한 나머지 구간의 선형에너지전달 값에 따른 상기 피시험 반도체 소자의 단면적 값을 유추하는 단계를 포함할 수 있다.

• 출원번호 : 10-2024-0151268
• 출원인 : 큐알티 주식회사
• 특허번호 : 10-2748332-0000
• IPC : G01R-031/311;G01R-031/00;H01S-003/00;